JPWO2023228691A1 - - Google Patents
Info
- Publication number
- JPWO2023228691A1 JPWO2023228691A1 JP2024522996A JP2024522996A JPWO2023228691A1 JP WO2023228691 A1 JPWO2023228691 A1 JP WO2023228691A1 JP 2024522996 A JP2024522996 A JP 2024522996A JP 2024522996 A JP2024522996 A JP 2024522996A JP WO2023228691 A1 JPWO2023228691 A1 JP WO2023228691A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022087228 | 2022-05-27 | ||
| JP2022190754 | 2022-11-29 | ||
| PCT/JP2023/017090 WO2023228691A1 (ja) | 2022-05-27 | 2023-05-01 | ポジ型レジスト組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023228691A1 true JPWO2023228691A1 (https=) | 2023-11-30 |
| JPWO2023228691A5 JPWO2023228691A5 (https=) | 2026-04-13 |
Family
ID=88919008
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024522996A Pending JPWO2023228691A1 (https=) | 2022-05-27 | 2023-05-01 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2023228691A1 (https=) |
| TW (1) | TW202349123A (https=) |
| WO (1) | WO2023228691A1 (https=) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6029745A (ja) * | 1983-07-28 | 1985-02-15 | Fujitsu Ltd | パタ−ン形成方法 |
| JPS6064432A (ja) * | 1983-09-19 | 1985-04-13 | Fujitsu Ltd | パタ−ン形成方法 |
| JPH01217020A (ja) * | 1988-02-26 | 1989-08-30 | Tosoh Corp | ポリアクリル酸誘導体 |
| US11644752B2 (en) * | 2016-12-27 | 2023-05-09 | Zeon Corporation | Polymer, positive resist composition, and method of forming resist pattern |
| JP7196496B2 (ja) * | 2018-09-25 | 2022-12-27 | 日本ゼオン株式会社 | レジストパターン形成方法 |
| JP7508805B2 (ja) * | 2020-02-27 | 2024-07-02 | 日本ゼオン株式会社 | 共重合体の製造方法およびポジ型レジスト組成物の製造方法 |
-
2023
- 2023-05-01 JP JP2024522996A patent/JPWO2023228691A1/ja active Pending
- 2023-05-01 WO PCT/JP2023/017090 patent/WO2023228691A1/ja not_active Ceased
- 2023-05-19 TW TW112118770A patent/TW202349123A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202349123A (zh) | 2023-12-16 |
| WO2023228691A1 (ja) | 2023-11-30 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20260403 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20260403 |