JPWO2023228692A5 - - Google Patents
Info
- Publication number
- JPWO2023228692A5 JPWO2023228692A5 JP2024522997A JP2024522997A JPWO2023228692A5 JP WO2023228692 A5 JPWO2023228692 A5 JP WO2023228692A5 JP 2024522997 A JP2024522997 A JP 2024522997A JP 2024522997 A JP2024522997 A JP 2024522997A JP WO2023228692 A5 JPWO2023228692 A5 JP WO2023228692A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- copolymer
- alkyl group
- formula
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022087229 | 2022-05-27 | ||
| JP2022190753 | 2022-11-29 | ||
| PCT/JP2023/017091 WO2023228692A1 (ja) | 2022-05-27 | 2023-05-01 | 共重合体、共重合体混合物、及びポジ型レジスト組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023228692A1 JPWO2023228692A1 (https=) | 2023-11-30 |
| JPWO2023228692A5 true JPWO2023228692A5 (https=) | 2026-04-13 |
Family
ID=88919010
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024522997A Pending JPWO2023228692A1 (https=) | 2022-05-27 | 2023-05-01 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2023228692A1 (https=) |
| TW (1) | TW202348648A (https=) |
| WO (1) | WO2023228692A1 (https=) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6935669B2 (ja) * | 2016-12-27 | 2021-09-15 | 日本ゼオン株式会社 | レジストパターン形成方法 |
| US11644752B2 (en) * | 2016-12-27 | 2023-05-09 | Zeon Corporation | Polymer, positive resist composition, and method of forming resist pattern |
| JP2018154754A (ja) * | 2017-03-17 | 2018-10-04 | 日本ゼオン株式会社 | 共重合体およびポジ型レジスト組成物 |
-
2023
- 2023-05-01 JP JP2024522997A patent/JPWO2023228692A1/ja active Pending
- 2023-05-01 WO PCT/JP2023/017091 patent/WO2023228692A1/ja not_active Ceased
- 2023-05-19 TW TW112118771A patent/TW202348648A/zh unknown
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPWO2022244586A5 (https=) | ||
| JPH10254133A5 (https=) | ||
| JPWO2022130990A5 (https=) | ||
| JP2018200471A5 (https=) | ||
| KR910015884A (ko) | 할로메틸-1,3,5-트리아진 부분을 함유하는 중합체 | |
| JP2018123332A5 (https=) | ||
| JP2021515084A5 (https=) | ||
| KR950009362A (ko) | 포토레지스트 조성물 | |
| JP2020518685A5 (https=) | ||
| JPWO2022059492A5 (https=) | ||
| JP2008239416A5 (https=) | ||
| JPWO2022050062A5 (https=) | ||
| JPWO2023228692A5 (https=) | ||
| JP2010276989A5 (https=) | ||
| JPWO2023228691A5 (https=) | ||
| JPWO2024106158A5 (https=) | ||
| KR870007447A (ko) | 유기금속중합체 | |
| JP2003055408A5 (https=) | ||
| KR880009056A (ko) | 스티렌계 공중합체 및 그 제조방법 | |
| JP2004062049A5 (https=) | ||
| RU2002112329A (ru) | Новые фторалкилзамещенные циклотрисилоксаны, их использование для получения новых полимеров и новые полимеры | |
| JPWO2024237237A5 (https=) | ||
| JP2010503755A5 (https=) | ||
| KR970703551A (ko) | 건식 현상가능한 포지티브 레지스트(dry-developable positive resist) | |
| JPH1138613A5 (https=) |