JPWO2023225046A5 - - Google Patents

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Publication number
JPWO2023225046A5
JPWO2023225046A5 JP2024568226A JP2024568226A JPWO2023225046A5 JP WO2023225046 A5 JPWO2023225046 A5 JP WO2023225046A5 JP 2024568226 A JP2024568226 A JP 2024568226A JP 2024568226 A JP2024568226 A JP 2024568226A JP WO2023225046 A5 JPWO2023225046 A5 JP WO2023225046A5
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JP
Japan
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carbon atoms
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formula
group
represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024568226A
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English (en)
Japanese (ja)
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JP2025517914A (ja
JP2025517914A5 (https=
Publication date
Application filed filed Critical
Priority claimed from PCT/US2023/022478 external-priority patent/WO2023225046A1/en
Publication of JP2025517914A publication Critical patent/JP2025517914A/ja
Publication of JPWO2023225046A5 publication Critical patent/JPWO2023225046A5/ja
Publication of JP2025517914A5 publication Critical patent/JP2025517914A5/ja
Pending legal-status Critical Current

Links

JP2024568226A 2022-05-18 2023-05-17 ヒドロカルビル配位子に酸素ヘテロ原子を有する放射線感受性有機スズ組成物 Pending JP2025517914A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202263343331P 2022-05-18 2022-05-18
US63/343,331 2022-05-18
PCT/US2023/022478 WO2023225046A1 (en) 2022-05-18 2023-05-17 Radiation sensitive organotin compositions having oxygen heteroatoms in hydrocarbyl ligand

Publications (3)

Publication Number Publication Date
JP2025517914A JP2025517914A (ja) 2025-06-12
JPWO2023225046A5 true JPWO2023225046A5 (https=) 2026-03-31
JP2025517914A5 JP2025517914A5 (https=) 2026-03-31

Family

ID=88792199

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024568226A Pending JP2025517914A (ja) 2022-05-18 2023-05-17 ヒドロカルビル配位子に酸素ヘテロ原子を有する放射線感受性有機スズ組成物

Country Status (6)

Country Link
US (1) US20230374338A1 (https=)
EP (1) EP4526734A1 (https=)
JP (1) JP2025517914A (https=)
KR (1) KR20250011129A (https=)
TW (1) TW202402768A (https=)
WO (1) WO2023225046A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019246254A1 (en) * 2018-06-21 2019-12-26 Inpria Corporation Stable solutions of monoalkyl tin alkoxides and their hydrolysis and condensation products
WO2023235534A1 (en) 2022-06-02 2023-12-07 Gelest, Inc. High purity alkyl tin compounds and manufacturing methods thereof
KR102703674B1 (ko) * 2022-08-02 2024-09-04 삼성에스디아이 주식회사 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법
KR20250040045A (ko) 2022-08-12 2025-03-21 젤리스트 인코퍼레이티드 불포화 치환기를 함유하는 고순도 주석 화합물 및 이의 제조 방법
US12607929B2 (en) * 2022-08-29 2026-04-21 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist and formation method thereof
US12606577B2 (en) 2022-09-28 2026-04-21 Gelest, Inc. Iodoalkyl tin compounds and preparation methods thereof
WO2025056568A1 (en) 2023-09-13 2025-03-20 Merck Patent Gmbh Intramolecular stabilized mono alkyl metal compounds with improved thermal and light stability and their use thereof
KR20250106992A (ko) * 2024-01-04 2025-07-11 삼성에스디아이 주식회사 패턴 형성 방법 및 포토레지스트 막
KR20250125796A (ko) * 2024-02-15 2025-08-22 삼성에스디아이 주식회사 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법
WO2026052767A1 (en) 2024-09-09 2026-03-12 Merck Patent Gmbh Intramolecular stabilized mono alkyl metal alkoxides and their use thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9310684B2 (en) * 2013-08-22 2016-04-12 Inpria Corporation Organometallic solution based high resolution patterning compositions
CA2975104A1 (en) * 2017-08-02 2019-02-02 Seastar Chemicals Inc. Organometallic compounds and methods for the deposition of high purity tin oxide
US10787466B2 (en) * 2018-04-11 2020-09-29 Inpria Corporation Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
US12211691B2 (en) * 2018-12-20 2025-01-28 Lam Research Corporation Dry development of resists
JP2023539735A (ja) * 2020-08-25 2023-09-19 インプリア・コーポレイション 反応物の供給に好都合な配位子を持つ有機スズ組成物の製造方法

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