JP2025517914A5 - - Google Patents
Info
- Publication number
- JP2025517914A5 JP2025517914A5 JP2024568226A JP2024568226A JP2025517914A5 JP 2025517914 A5 JP2025517914 A5 JP 2025517914A5 JP 2024568226 A JP2024568226 A JP 2024568226A JP 2024568226 A JP2024568226 A JP 2024568226A JP 2025517914 A5 JP2025517914 A5 JP 2025517914A5
- Authority
- JP
- Japan
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202263343331P | 2022-05-18 | 2022-05-18 | |
| US63/343,331 | 2022-05-18 | ||
| PCT/US2023/022478 WO2023225046A1 (en) | 2022-05-18 | 2023-05-17 | Radiation sensitive organotin compositions having oxygen heteroatoms in hydrocarbyl ligand |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2025517914A JP2025517914A (ja) | 2025-06-12 |
| JPWO2023225046A5 JPWO2023225046A5 (https=) | 2026-03-31 |
| JP2025517914A5 true JP2025517914A5 (https=) | 2026-03-31 |
Family
ID=88792199
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024568226A Pending JP2025517914A (ja) | 2022-05-18 | 2023-05-17 | ヒドロカルビル配位子に酸素ヘテロ原子を有する放射線感受性有機スズ組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20230374338A1 (https=) |
| EP (1) | EP4526734A1 (https=) |
| JP (1) | JP2025517914A (https=) |
| KR (1) | KR20250011129A (https=) |
| TW (1) | TW202402768A (https=) |
| WO (1) | WO2023225046A1 (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019246254A1 (en) * | 2018-06-21 | 2019-12-26 | Inpria Corporation | Stable solutions of monoalkyl tin alkoxides and their hydrolysis and condensation products |
| WO2023235534A1 (en) | 2022-06-02 | 2023-12-07 | Gelest, Inc. | High purity alkyl tin compounds and manufacturing methods thereof |
| KR102703674B1 (ko) * | 2022-08-02 | 2024-09-04 | 삼성에스디아이 주식회사 | 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
| KR20250040045A (ko) | 2022-08-12 | 2025-03-21 | 젤리스트 인코퍼레이티드 | 불포화 치환기를 함유하는 고순도 주석 화합물 및 이의 제조 방법 |
| US12607929B2 (en) * | 2022-08-29 | 2026-04-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist and formation method thereof |
| US12606577B2 (en) | 2022-09-28 | 2026-04-21 | Gelest, Inc. | Iodoalkyl tin compounds and preparation methods thereof |
| WO2025056568A1 (en) | 2023-09-13 | 2025-03-20 | Merck Patent Gmbh | Intramolecular stabilized mono alkyl metal compounds with improved thermal and light stability and their use thereof |
| KR20250106992A (ko) * | 2024-01-04 | 2025-07-11 | 삼성에스디아이 주식회사 | 패턴 형성 방법 및 포토레지스트 막 |
| KR20250125796A (ko) * | 2024-02-15 | 2025-08-22 | 삼성에스디아이 주식회사 | 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
| WO2026052767A1 (en) | 2024-09-09 | 2026-03-12 | Merck Patent Gmbh | Intramolecular stabilized mono alkyl metal alkoxides and their use thereof |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9310684B2 (en) * | 2013-08-22 | 2016-04-12 | Inpria Corporation | Organometallic solution based high resolution patterning compositions |
| CA2975104A1 (en) * | 2017-08-02 | 2019-02-02 | Seastar Chemicals Inc. | Organometallic compounds and methods for the deposition of high purity tin oxide |
| US10787466B2 (en) * | 2018-04-11 | 2020-09-29 | Inpria Corporation | Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods |
| US12211691B2 (en) * | 2018-12-20 | 2025-01-28 | Lam Research Corporation | Dry development of resists |
| JP2023539735A (ja) * | 2020-08-25 | 2023-09-19 | インプリア・コーポレイション | 反応物の供給に好都合な配位子を持つ有機スズ組成物の製造方法 |
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2023
- 2023-05-17 TW TW112118297A patent/TW202402768A/zh unknown
- 2023-05-17 JP JP2024568226A patent/JP2025517914A/ja active Pending
- 2023-05-17 EP EP23808215.0A patent/EP4526734A1/en active Pending
- 2023-05-17 KR KR1020247040538A patent/KR20250011129A/ko active Pending
- 2023-05-17 US US18/198,360 patent/US20230374338A1/en active Pending
- 2023-05-17 WO PCT/US2023/022478 patent/WO2023225046A1/en not_active Ceased