JP2024525339A5 - - Google Patents

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Publication number
JP2024525339A5
JP2024525339A5 JP2023577346A JP2023577346A JP2024525339A5 JP 2024525339 A5 JP2024525339 A5 JP 2024525339A5 JP 2023577346 A JP2023577346 A JP 2023577346A JP 2023577346 A JP2023577346 A JP 2023577346A JP 2024525339 A5 JP2024525339 A5 JP 2024525339A5
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JP
Japan
Prior art keywords
carbon atoms
photosensitive composition
coating
composition according
ligand
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023577346A
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English (en)
Japanese (ja)
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JP2024525339A (ja
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Publication date
Priority claimed from US17/682,639 external-priority patent/US12032291B2/en
Application filed filed Critical
Publication of JP2024525339A publication Critical patent/JP2024525339A/ja
Publication of JP2024525339A5 publication Critical patent/JP2024525339A5/ja
Pending legal-status Critical Current

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JP2023577346A 2021-06-15 2022-05-18 シリコン/ゲルマニウムを有する配位子を有する有機スズパターニング材料、前駆体組成物及び合成方法 Pending JP2024525339A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US202163210769P 2021-06-15 2021-06-15
US63/210,769 2021-06-15
US17/682,639 US12032291B2 (en) 2021-06-15 2022-02-28 Organotin patterning materials with ligands having silicon/germanium; precursor compositions; and synthesis methods
US17/682,639 2022-02-28
PCT/US2022/029747 WO2022265792A1 (en) 2021-06-15 2022-05-18 Organotin patterning materials with ligands having silicon/germanium; precursor compositions; and synthesis methods

Publications (2)

Publication Number Publication Date
JP2024525339A JP2024525339A (ja) 2024-07-12
JP2024525339A5 true JP2024525339A5 (https=) 2025-05-23

Family

ID=84389774

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023577346A Pending JP2024525339A (ja) 2021-06-15 2022-05-18 シリコン/ゲルマニウムを有する配位子を有する有機スズパターニング材料、前駆体組成物及び合成方法

Country Status (6)

Country Link
US (3) US12032291B2 (https=)
EP (1) EP4356198A4 (https=)
JP (1) JP2024525339A (https=)
KR (1) KR20240019779A (https=)
TW (1) TW202300497A (https=)
WO (1) WO2022265792A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022046736A1 (en) * 2020-08-25 2022-03-03 Inpria Corporation Methods to produce organotin compositions with convenient ligand providing reactants

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6238734B1 (en) 1999-07-08 2001-05-29 Air Products And Chemicals, Inc. Liquid precursor mixtures for deposition of multicomponent metal containing materials
US9310684B2 (en) 2013-08-22 2016-04-12 Inpria Corporation Organometallic solution based high resolution patterning compositions
EP3100299A1 (en) * 2014-01-31 2016-12-07 Merck Patent GmbH Preparation of semiconductor films
KR102508142B1 (ko) 2015-10-13 2023-03-08 인프리아 코포레이션 유기주석 옥사이드 하이드록사이드 패터닝 조성물, 전구체 및 패터닝
WO2018063382A1 (en) * 2016-09-30 2018-04-05 Intel Corporation Ligand-capped main group nanoparticles as high absorption extreme ultraviolet lithography resists
US11673903B2 (en) 2018-04-11 2023-06-13 Inpria Corporation Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
KR20200144580A (ko) 2018-05-11 2020-12-29 램 리써치 코포레이션 Euv 패터닝 가능한 하드 마스크들을 제조하기 위한 방법들
US11966158B2 (en) 2019-01-30 2024-04-23 Inpria Corporation Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with low metal contamination and/or particulate contamination, and corresponding methods
TWI837391B (zh) 2019-06-26 2024-04-01 美商蘭姆研究公司 利用鹵化物化學品的光阻顯影
CN115768777A (zh) 2020-07-03 2023-03-07 恩特格里斯公司 制备有机锡化合物的方法
WO2022046736A1 (en) 2020-08-25 2022-03-03 Inpria Corporation Methods to produce organotin compositions with convenient ligand providing reactants

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