JP2025517914A - ヒドロカルビル配位子に酸素ヘテロ原子を有する放射線感受性有機スズ組成物 - Google Patents

ヒドロカルビル配位子に酸素ヘテロ原子を有する放射線感受性有機スズ組成物 Download PDF

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Publication number
JP2025517914A
JP2025517914A JP2024568226A JP2024568226A JP2025517914A JP 2025517914 A JP2025517914 A JP 2025517914A JP 2024568226 A JP2024568226 A JP 2024568226A JP 2024568226 A JP2024568226 A JP 2024568226A JP 2025517914 A JP2025517914 A JP 2025517914A
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Japan
Prior art keywords
carbon atoms
organotin
optional
formula
represented
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Pending
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JP2024568226A
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English (en)
Japanese (ja)
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JP2025517914A5 (https=
Inventor
イー ジレク，ロバート
ジェイ カルディノー，ブライアン
スー シャオ ハフマン，ルーシー
ティ－ マイヤーズ，スティーブン
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Inpria Corp
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Inpria Corp
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Publication of JP2025517914A publication Critical patent/JP2025517914A/ja
Publication of JP2025517914A5 publication Critical patent/JP2025517914A5/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/22—Tin compounds
    • C07F7/2208—Compounds having tin linked only to carbon, hydrogen and/or halogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/22—Tin compounds
    • C07F7/2224—Compounds having one or more tin-oxygen linkages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
JP2024568226A 2022-05-18 2023-05-17 ヒドロカルビル配位子に酸素ヘテロ原子を有する放射線感受性有機スズ組成物 Pending JP2025517914A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202263343331P 2022-05-18 2022-05-18
US63/343,331 2022-05-18
PCT/US2023/022478 WO2023225046A1 (en) 2022-05-18 2023-05-17 Radiation sensitive organotin compositions having oxygen heteroatoms in hydrocarbyl ligand

Publications (2)

Publication Number Publication Date
JP2025517914A true JP2025517914A (ja) 2025-06-12
JP2025517914A5 JP2025517914A5 (https=) 2026-03-31

Family

ID=88792199

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024568226A Pending JP2025517914A (ja) 2022-05-18 2023-05-17 ヒドロカルビル配位子に酸素ヘテロ原子を有する放射線感受性有機スズ組成物

Country Status (6)

Country Link
US (1) US20230374338A1 (https=)
EP (1) EP4526734A1 (https=)
JP (1) JP2025517914A (https=)
KR (1) KR20250011129A (https=)
TW (1) TW202402768A (https=)
WO (1) WO2023225046A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI796816B (zh) * 2018-06-21 2023-03-21 美商英培雅股份有限公司 單烷基錫烷氧化物的穩定溶液及其水解與縮合產物
WO2023235534A1 (en) 2022-06-02 2023-12-07 Gelest, Inc. High purity alkyl tin compounds and manufacturing methods thereof
KR102703674B1 (ko) * 2022-08-02 2024-09-04 삼성에스디아이 주식회사 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법
EP4568977A1 (en) 2022-08-12 2025-06-18 Gelest, Inc. High purity tin compounds containing unsaturated substituent and method for preparation thereof
US12607929B2 (en) * 2022-08-29 2026-04-21 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist and formation method thereof
US12606577B2 (en) 2022-09-28 2026-04-21 Gelest, Inc. Iodoalkyl tin compounds and preparation methods thereof
CN121866261A (zh) 2023-09-13 2026-04-14 默克专利有限公司 具有改善的热和光稳定性的分子内稳定化单烷基金属化合物及其用途
KR20250106992A (ko) * 2024-01-04 2025-07-11 삼성에스디아이 주식회사 패턴 형성 방법 및 포토레지스트 막
KR20250125796A (ko) * 2024-02-15 2025-08-22 삼성에스디아이 주식회사 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법
WO2026052767A1 (en) 2024-09-09 2026-03-12 Merck Patent Gmbh Intramolecular stabilized mono alkyl metal alkoxides and their use thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9310684B2 (en) * 2013-08-22 2016-04-12 Inpria Corporation Organometallic solution based high resolution patterning compositions
CA2975104A1 (en) * 2017-08-02 2019-02-02 Seastar Chemicals Inc. Organometallic compounds and methods for the deposition of high purity tin oxide
US10787466B2 (en) * 2018-04-11 2020-09-29 Inpria Corporation Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
US12211691B2 (en) * 2018-12-20 2025-01-28 Lam Research Corporation Dry development of resists
WO2022046736A1 (en) * 2020-08-25 2022-03-03 Inpria Corporation Methods to produce organotin compositions with convenient ligand providing reactants

Also Published As

Publication number Publication date
WO2023225046A1 (en) 2023-11-23
WO2023225046A9 (en) 2024-11-28
US20230374338A1 (en) 2023-11-23
EP4526734A1 (en) 2025-03-26
KR20250011129A (ko) 2025-01-21
TW202402768A (zh) 2024-01-16

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