JP2025517914A - ヒドロカルビル配位子に酸素ヘテロ原子を有する放射線感受性有機スズ組成物 - Google Patents

ヒドロカルビル配位子に酸素ヘテロ原子を有する放射線感受性有機スズ組成物 Download PDF

Info

Publication number
JP2025517914A
JP2025517914A JP2024568226A JP2024568226A JP2025517914A JP 2025517914 A JP2025517914 A JP 2025517914A JP 2024568226 A JP2024568226 A JP 2024568226A JP 2024568226 A JP2024568226 A JP 2024568226A JP 2025517914 A JP2025517914 A JP 2025517914A
Authority
JP
Japan
Prior art keywords
carbon atoms
organotin
optional
formula
represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024568226A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2023225046A5 (https=
JP2025517914A5 (https=
Inventor
イー ジレク，ロバート
ジェイ カルディノー，ブライアン
スー シャオ ハフマン，ルーシー
ティ－ マイヤーズ，スティーブン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inpria Corp
Original Assignee
Inpria Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inpria Corp filed Critical Inpria Corp
Publication of JP2025517914A publication Critical patent/JP2025517914A/ja
Publication of JPWO2023225046A5 publication Critical patent/JPWO2023225046A5/ja
Publication of JP2025517914A5 publication Critical patent/JP2025517914A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/22—Tin compounds
    • C07F7/2208—Compounds having tin linked only to carbon, hydrogen and/or halogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/22—Tin compounds
    • C07F7/2224—Compounds having one or more tin-oxygen linkages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP2024568226A 2022-05-18 2023-05-17 ヒドロカルビル配位子に酸素ヘテロ原子を有する放射線感受性有機スズ組成物 Pending JP2025517914A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202263343331P 2022-05-18 2022-05-18
US63/343,331 2022-05-18
PCT/US2023/022478 WO2023225046A1 (en) 2022-05-18 2023-05-17 Radiation sensitive organotin compositions having oxygen heteroatoms in hydrocarbyl ligand

Publications (3)

Publication Number Publication Date
JP2025517914A true JP2025517914A (ja) 2025-06-12
JPWO2023225046A5 JPWO2023225046A5 (https=) 2026-03-31
JP2025517914A5 JP2025517914A5 (https=) 2026-03-31

Family

ID=88792199

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024568226A Pending JP2025517914A (ja) 2022-05-18 2023-05-17 ヒドロカルビル配位子に酸素ヘテロ原子を有する放射線感受性有機スズ組成物

Country Status (6)

Country Link
US (1) US20230374338A1 (https=)
EP (1) EP4526734A1 (https=)
JP (1) JP2025517914A (https=)
KR (1) KR20250011129A (https=)
TW (1) TW202402768A (https=)
WO (1) WO2023225046A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019246254A1 (en) * 2018-06-21 2019-12-26 Inpria Corporation Stable solutions of monoalkyl tin alkoxides and their hydrolysis and condensation products
WO2023235534A1 (en) 2022-06-02 2023-12-07 Gelest, Inc. High purity alkyl tin compounds and manufacturing methods thereof
KR102703674B1 (ko) * 2022-08-02 2024-09-04 삼성에스디아이 주식회사 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법
KR20250040045A (ko) 2022-08-12 2025-03-21 젤리스트 인코퍼레이티드 불포화 치환기를 함유하는 고순도 주석 화합물 및 이의 제조 방법
US12607929B2 (en) * 2022-08-29 2026-04-21 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist and formation method thereof
US12606577B2 (en) 2022-09-28 2026-04-21 Gelest, Inc. Iodoalkyl tin compounds and preparation methods thereof
WO2025056568A1 (en) 2023-09-13 2025-03-20 Merck Patent Gmbh Intramolecular stabilized mono alkyl metal compounds with improved thermal and light stability and their use thereof
KR20250106992A (ko) * 2024-01-04 2025-07-11 삼성에스디아이 주식회사 패턴 형성 방법 및 포토레지스트 막
KR20250125796A (ko) * 2024-02-15 2025-08-22 삼성에스디아이 주식회사 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법
WO2026052767A1 (en) 2024-09-09 2026-03-12 Merck Patent Gmbh Intramolecular stabilized mono alkyl metal alkoxides and their use thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9310684B2 (en) * 2013-08-22 2016-04-12 Inpria Corporation Organometallic solution based high resolution patterning compositions
CA2975104A1 (en) * 2017-08-02 2019-02-02 Seastar Chemicals Inc. Organometallic compounds and methods for the deposition of high purity tin oxide
US10787466B2 (en) * 2018-04-11 2020-09-29 Inpria Corporation Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
US12211691B2 (en) * 2018-12-20 2025-01-28 Lam Research Corporation Dry development of resists
JP2023539735A (ja) * 2020-08-25 2023-09-19 インプリア・コーポレイション 反応物の供給に好都合な配位子を持つ有機スズ組成物の製造方法

Also Published As

Publication number Publication date
KR20250011129A (ko) 2025-01-21
US20230374338A1 (en) 2023-11-23
TW202402768A (zh) 2024-01-16
WO2023225046A9 (en) 2024-11-28
EP4526734A1 (en) 2025-03-26
WO2023225046A1 (en) 2023-11-23

Similar Documents

Publication Publication Date Title
JP2025517914A (ja) ヒドロカルビル配位子に酸素ヘテロ原子を有する放射線感受性有機スズ組成物
US12522621B2 (en) Tin dodecamers and radiation patternable coatings with strong euv absorption
US12129271B2 (en) Organotin clusters, solutions of organotin clusters, and application to high resolution patterning
CN108351594A (zh) 有机锡氧化物氢氧化物图案化组合物、前驱物及图案化
TW202233640A (zh) 有機錫化合物、其製造方法、使用其之ｅｕｖ光阻膜形成用液組成物及ｅｕｖ光阻膜之形成方法
TW202300498A (zh) 氘代有機錫化合物及其應用、以及合成氘代有機錫組成物及合成氘代單有機錫三胺化合物的方法
JP2025540117A (ja) オルガノスズアルコキシドの直接合成
US20250258432A1 (en) Organotin patterning materials with ligands having silicon/germanium; precursor compositions; and synthesis methods
WO2025179152A1 (en) Organometallic compositions with polyene ligands, radiation sensitive coatings with bridging organic ligands and patterning
US20250074930A1 (en) Organotin compositions having ligands with acetal functional groups, patterning compositions with organotin blends and positive tone patterning

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20260323

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20260323