JPWO2023176259A5 - - Google Patents

Download PDF

Info

Publication number
JPWO2023176259A5
JPWO2023176259A5 JP2023528273A JP2023528273A JPWO2023176259A5 JP WO2023176259 A5 JPWO2023176259 A5 JP WO2023176259A5 JP 2023528273 A JP2023528273 A JP 2023528273A JP 2023528273 A JP2023528273 A JP 2023528273A JP WO2023176259 A5 JPWO2023176259 A5 JP WO2023176259A5
Authority
JP
Japan
Prior art keywords
photosensitive resin
integer
resin composition
insulating film
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023528273A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2023176259A1 (enrdf_load_stackoverflow
JP7332076B1 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2023/005180 external-priority patent/WO2023176259A1/ja
Priority to JP2023086262A priority Critical patent/JP2023138499A/ja
Application granted granted Critical
Publication of JP7332076B1 publication Critical patent/JP7332076B1/ja
Publication of JPWO2023176259A1 publication Critical patent/JPWO2023176259A1/ja
Publication of JPWO2023176259A5 publication Critical patent/JPWO2023176259A5/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2023528273A 2022-03-18 2023-02-15 絶縁膜形成用感光性樹脂組成物 Active JP7332076B1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023086262A JP2023138499A (ja) 2022-03-18 2023-05-25 絶縁膜形成用感光性樹脂組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022043595 2022-03-18
JP2022043595 2022-03-18
PCT/JP2023/005180 WO2023176259A1 (ja) 2022-03-18 2023-02-15 絶縁膜形成用感光性樹脂組成物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023086262A Division JP2023138499A (ja) 2022-03-18 2023-05-25 絶縁膜形成用感光性樹脂組成物

Publications (3)

Publication Number Publication Date
JP7332076B1 JP7332076B1 (ja) 2023-08-23
JPWO2023176259A1 JPWO2023176259A1 (enrdf_load_stackoverflow) 2023-09-21
JPWO2023176259A5 true JPWO2023176259A5 (enrdf_load_stackoverflow) 2024-02-22

Family

ID=87576957

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2023528273A Active JP7332076B1 (ja) 2022-03-18 2023-02-15 絶縁膜形成用感光性樹脂組成物
JP2023086262A Pending JP2023138499A (ja) 2022-03-18 2023-05-25 絶縁膜形成用感光性樹脂組成物

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023086262A Pending JP2023138499A (ja) 2022-03-18 2023-05-25 絶縁膜形成用感光性樹脂組成物

Country Status (3)

Country Link
JP (2) JP7332076B1 (enrdf_load_stackoverflow)
KR (2) KR102628683B1 (enrdf_load_stackoverflow)
CN (1) CN117099046A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025134897A1 (ja) * 2023-12-18 2025-06-26 株式会社レゾナック 感光性樹脂組成物、硬化物及び半導体素子

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05295115A (ja) 1992-04-24 1993-11-09 Sumitomo Bakelite Co Ltd 低熱膨張性ポリイミド樹脂およびその製造方法
JP2000347404A (ja) 1999-06-02 2000-12-15 Hitachi Chemical Dupont Microsystems Ltd 感光性重合体組成物並びにこれを用いた電子部品及びその製造法
KR101010036B1 (ko) 2009-08-28 2011-01-21 주식회사 엘지화학 신규한 폴리아믹산, 이를 포함하는 감광성 수지 조성물 및 이로부터 제조된 드라이 필름
CN104136978A (zh) * 2011-12-28 2014-11-05 日产化学工业株式会社 液晶取向剂、液晶显示元件、液晶显示元件的制造方法及聚合性化合物
WO2014092126A1 (ja) * 2012-12-12 2014-06-19 日産化学工業株式会社 組成物、液晶配向処理剤、液晶配向膜および液晶表示素子
KR102540243B1 (ko) * 2015-04-21 2023-06-02 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. 감광성 폴리이미드 조성물
TWI728137B (zh) * 2016-06-29 2021-05-21 日商富士軟片股份有限公司 負型感光性樹脂組成物、硬化膜、硬化膜的製造方法、半導體裝置、積層體的製造方法、半導體裝置的製造方法及聚醯亞胺前驅物

Similar Documents

Publication Publication Date Title
JP2019163463A5 (enrdf_load_stackoverflow)
TWI665238B (zh) 含有聚矽氧骨架的高分子化合物、負型光阻材料、光硬化性乾膜、圖型形成方法及電氣.電子零件保護用皮膜
TW201819475A (zh) 含有聚矽氧骨架之高分子化合物、光硬化性樹脂組成物、光硬化性乾薄膜、層合體及圖型形成方法
JP6502754B2 (ja) 光硬化性樹脂組成物及びこれを用いた光硬化性ドライフィルム
JPWO2020031958A5 (enrdf_load_stackoverflow)
JPWO2022244682A5 (enrdf_load_stackoverflow)
TWI833044B (zh) 感光性樹脂組成物、感光性乾薄膜及圖型形成方法
JPWO2023106101A5 (enrdf_load_stackoverflow)
JPWO2022202098A5 (enrdf_load_stackoverflow)
JP6065789B2 (ja) 化学増幅ポジ型レジスト材料及びパターン形成方法
TW202034085A (zh) 感光性樹脂組成物,感光性乾膜及圖案形成方法
JP2016125032A (ja) シリコーン骨格含有高分子化合物、化学増幅型ネガ型レジスト材料、光硬化性ドライフィルム及びその製造方法、パターン形成方法、積層体、基板、及び半導体装置
US11370888B2 (en) Silicon-rich silsesquioxane resins
JPWO2023176259A5 (enrdf_load_stackoverflow)
JP2007529037A5 (enrdf_load_stackoverflow)
JPWO2020255984A5 (enrdf_load_stackoverflow)
JPWO2020255985A5 (enrdf_load_stackoverflow)
JPWO2022054853A5 (enrdf_load_stackoverflow)
JP2023184588A5 (enrdf_load_stackoverflow)
JP7584562B2 (ja) 半導体フォトレジスト用組成物およびこれを用いたパターン形成方法
JPWO2024090486A5 (enrdf_load_stackoverflow)
JPWO2020111086A5 (enrdf_load_stackoverflow)
JPWO2022045002A5 (enrdf_load_stackoverflow)
JPWO2023120035A5 (enrdf_load_stackoverflow)
JPWO2022163673A5 (enrdf_load_stackoverflow)