JPWO2023074844A5 - - Google Patents

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Publication number
JPWO2023074844A5
JPWO2023074844A5 JP2023556667A JP2023556667A JPWO2023074844A5 JP WO2023074844 A5 JPWO2023074844 A5 JP WO2023074844A5 JP 2023556667 A JP2023556667 A JP 2023556667A JP 2023556667 A JP2023556667 A JP 2023556667A JP WO2023074844 A5 JPWO2023074844 A5 JP WO2023074844A5
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JP
Japan
Prior art keywords
composition according
oxygen
hydrophobic silica
silica
mass
Prior art date
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Pending
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JP2023556667A
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English (en)
Japanese (ja)
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JPWO2023074844A1 (https=
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Priority claimed from PCT/JP2022/040348 external-priority patent/WO2023074844A1/ja
Publication of JPWO2023074844A1 publication Critical patent/JPWO2023074844A1/ja
Publication of JPWO2023074844A5 publication Critical patent/JPWO2023074844A5/ja
Pending legal-status Critical Current

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JP2023556667A 2021-11-01 2022-10-28 Pending JPWO2023074844A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021178789 2021-11-01
PCT/JP2022/040348 WO2023074844A1 (ja) 2021-11-01 2022-10-28 脱酸素剤組成物及びその製造方法、並びに該脱酸素剤組成物を備える脱酸素剤包装体及びその製造方法

Publications (2)

Publication Number Publication Date
JPWO2023074844A1 JPWO2023074844A1 (https=) 2023-05-04
JPWO2023074844A5 true JPWO2023074844A5 (https=) 2024-07-19

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ID=86160000

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JP2023556667A Pending JPWO2023074844A1 (https=) 2021-11-01 2022-10-28

Country Status (7)

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US (1) US20250001389A1 (https=)
EP (1) EP4427834A4 (https=)
JP (1) JPWO2023074844A1 (https=)
KR (1) KR20240089012A (https=)
CN (1) CN118234556A (https=)
TW (1) TW202333856A (https=)
WO (1) WO2023074844A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119817630A (zh) * 2025-02-11 2025-04-15 东莞市欣荣天丽科技实业有限公司 一种卡片型脱氧剂制备方法及产品

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5435883A (en) 1977-08-26 1979-03-16 Mitsubishi Gas Chem Co Inc Oxygen absorber
JP2001265063A (ja) * 2000-03-17 2001-09-28 Dainippon Ink & Chem Inc 静電荷像現像用黄色トナー及び現像方法
DE10138491A1 (de) * 2001-08-04 2003-02-13 Degussa Verfahren zur Herstellung einer hydrophoben Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme
JP2003171117A (ja) * 2001-11-30 2003-06-17 Shin Etsu Chem Co Ltd 疎水性シリカ微粉末及びその製造方法
JP4821692B2 (ja) * 2007-04-19 2011-11-24 三菱瓦斯化学株式会社 脱酸素剤組成物の製造法
WO2015115184A1 (ja) * 2014-01-31 2015-08-06 サンノプコ株式会社 疎水性微粒湿式シリカ、その製造方法及び消泡剤
US11077424B2 (en) 2016-03-30 2021-08-03 Mitsubishi Gas Chemical Company, Inc. Oxygen scavenger composition
EP3900811A4 (en) * 2018-12-18 2022-01-12 Mitsubishi Gas Chemical Company, Inc. DEOXIDIZING COMPOSITION
JP7363099B2 (ja) * 2019-05-24 2023-10-18 三菱瓦斯化学株式会社 脱酸素剤組成物及びその製造方法
JP7459595B2 (ja) * 2020-03-19 2024-04-02 三菱瓦斯化学株式会社 脱酸素剤組成物
JP7046399B2 (ja) * 2021-02-19 2022-04-04 パウダーテック株式会社 有機系脱酸素剤

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