JPWO2023074629A1 - - Google Patents
Info
- Publication number
- JPWO2023074629A1 JPWO2023074629A1 JP2023556429A JP2023556429A JPWO2023074629A1 JP WO2023074629 A1 JPWO2023074629 A1 JP WO2023074629A1 JP 2023556429 A JP2023556429 A JP 2023556429A JP 2023556429 A JP2023556429 A JP 2023556429A JP WO2023074629 A1 JPWO2023074629 A1 JP WO2023074629A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2021/039426 WO2023073799A1 (ja) | 2021-10-26 | 2021-10-26 | 感光性樹脂組成物、感光性エレメント、及び、積層体の製造方法 |
| PCT/JP2022/039545 WO2023074629A1 (ja) | 2021-10-26 | 2022-10-24 | 感光性樹脂組成物、感光性エレメント、及び、積層体の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2023074629A1 true JPWO2023074629A1 (https=) | 2023-05-04 |
Family
ID=84336329
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023556430A Pending JPWO2023074630A1 (https=) | 2021-10-26 | 2022-10-24 | |
| JP2023556429A Pending JPWO2023074629A1 (https=) | 2021-10-26 | 2022-10-24 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023556430A Pending JPWO2023074630A1 (https=) | 2021-10-26 | 2022-10-24 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20250004369A1 (https=) |
| JP (2) | JPWO2023074630A1 (https=) |
| KR (2) | KR20240090270A (https=) |
| CN (2) | CN115469510A (https=) |
| TW (1) | TW202323309A (https=) |
| WO (3) | WO2023073799A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023073799A1 (ja) * | 2021-10-26 | 2023-05-04 | 株式会社レゾナック | 感光性樹脂組成物、感光性エレメント、及び、積層体の製造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010249884A (ja) * | 2009-04-10 | 2010-11-04 | Dupont Mrc Dryfilm Ltd | 光重合性樹脂組成物およびこれを用いた感光性フィルム |
| WO2015016362A1 (ja) * | 2013-08-02 | 2015-02-05 | 日立化成株式会社 | 感光性樹脂組成物 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4935833B2 (ja) * | 2009-01-23 | 2012-05-23 | 日立化成工業株式会社 | 感光性樹脂組成物、これを用いた感光性エレメント、画像表示装置の隔壁の形成方法及び画像表示装置の製造方法 |
| JP5327310B2 (ja) * | 2009-02-26 | 2013-10-30 | 日立化成株式会社 | 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP5387896B2 (ja) * | 2009-06-05 | 2014-01-15 | 日立化成株式会社 | 感光性樹脂組成物及びこれを用いた感光性エレメント |
| WO2012067107A1 (ja) * | 2010-11-17 | 2012-05-24 | 日立化成工業株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| US9482946B2 (en) * | 2011-03-30 | 2016-11-01 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition, photosensitive element using same, method for forming partition wall of image display device, and method for manufacturing image display device |
| JP2015152854A (ja) * | 2014-02-18 | 2015-08-24 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物、感光性樹脂積層体及びレジストパターン形成方法 |
| JP2016031413A (ja) * | 2014-07-28 | 2016-03-07 | 日立化成株式会社 | レーザー直描露光用感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造法 |
| WO2017043544A1 (ja) * | 2015-09-11 | 2017-03-16 | 旭化成株式会社 | 感光性樹脂組成物 |
| JP6828546B2 (ja) * | 2017-03-23 | 2021-02-10 | 昭和電工マテリアルズ株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP2019028398A (ja) | 2017-08-03 | 2019-02-21 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターン付き基板の製造方法、及び、プリント配線板の製造方法 |
| JP2020076945A (ja) * | 2018-09-21 | 2020-05-21 | 旭化成株式会社 | 感光性樹脂組成物 |
| WO2021137467A1 (ko) * | 2019-12-31 | 2021-07-08 | 코오롱인더스트리 주식회사 | 감광성 수지층, 이를 이용한 드라이 필름 포토레지스트, 및 감광성 엘리먼트 |
| CN112433445B (zh) * | 2020-11-06 | 2023-12-26 | 福斯特(安吉)新材料有限公司 | 一种用于uv led光源打标的感光性树脂组合物及干膜抗蚀剂 |
| WO2023073799A1 (ja) * | 2021-10-26 | 2023-05-04 | 株式会社レゾナック | 感光性樹脂組成物、感光性エレメント、及び、積層体の製造方法 |
-
2021
- 2021-10-26 WO PCT/JP2021/039426 patent/WO2023073799A1/ja not_active Ceased
-
2022
- 2022-10-24 CN CN202211303910.8A patent/CN115469510A/zh active Pending
- 2022-10-24 CN CN202211301744.8A patent/CN115524924A/zh active Pending
- 2022-10-24 WO PCT/JP2022/039545 patent/WO2023074629A1/ja not_active Ceased
- 2022-10-24 US US18/703,643 patent/US20250004369A1/en active Pending
- 2022-10-24 JP JP2023556430A patent/JPWO2023074630A1/ja active Pending
- 2022-10-24 KR KR1020247014269A patent/KR20240090270A/ko active Pending
- 2022-10-24 WO PCT/JP2022/039546 patent/WO2023074630A1/ja not_active Ceased
- 2022-10-24 KR KR1020247014270A patent/KR20240090271A/ko active Pending
- 2022-10-24 JP JP2023556429A patent/JPWO2023074629A1/ja active Pending
- 2022-10-25 TW TW111140381A patent/TW202323309A/zh unknown
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010249884A (ja) * | 2009-04-10 | 2010-11-04 | Dupont Mrc Dryfilm Ltd | 光重合性樹脂組成物およびこれを用いた感光性フィルム |
| WO2015016362A1 (ja) * | 2013-08-02 | 2015-02-05 | 日立化成株式会社 | 感光性樹脂組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20240090271A (ko) | 2024-06-21 |
| WO2023073799A1 (ja) | 2023-05-04 |
| TW202323309A (zh) | 2023-06-16 |
| WO2023074630A1 (ja) | 2023-05-04 |
| CN115469510A (zh) | 2022-12-13 |
| WO2023074629A1 (ja) | 2023-05-04 |
| CN115524924A (zh) | 2022-12-27 |
| JPWO2023074630A1 (https=) | 2023-05-04 |
| KR20240090270A (ko) | 2024-06-21 |
| US20250004369A1 (en) | 2025-01-02 |
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