JPWO2023074630A1 - - Google Patents
Info
- Publication number
- JPWO2023074630A1 JPWO2023074630A1 JP2023556430A JP2023556430A JPWO2023074630A1 JP WO2023074630 A1 JPWO2023074630 A1 JP WO2023074630A1 JP 2023556430 A JP2023556430 A JP 2023556430A JP 2023556430 A JP2023556430 A JP 2023556430A JP WO2023074630 A1 JPWO2023074630 A1 JP WO2023074630A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2021/039426 WO2023073799A1 (ja) | 2021-10-26 | 2021-10-26 | 感光性樹脂組成物、感光性エレメント、及び、積層体の製造方法 |
PCT/JP2022/039546 WO2023074630A1 (ja) | 2021-10-26 | 2022-10-24 | 感光性樹脂組成物、感光性エレメント、及び、積層体の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2023074630A1 true JPWO2023074630A1 (ja) | 2023-05-04 |
Family
ID=84336329
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023556429A Pending JPWO2023074629A1 (ja) | 2021-10-26 | 2022-10-24 | |
JP2023556430A Pending JPWO2023074630A1 (ja) | 2021-10-26 | 2022-10-24 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023556429A Pending JPWO2023074629A1 (ja) | 2021-10-26 | 2022-10-24 |
Country Status (4)
Country | Link |
---|---|
JP (2) | JPWO2023074629A1 (ja) |
CN (2) | CN115524924A (ja) |
TW (1) | TW202323309A (ja) |
WO (3) | WO2023073799A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023073799A1 (ja) * | 2021-10-26 | 2023-05-04 | 株式会社レゾナック | 感光性樹脂組成物、感光性エレメント、及び、積層体の製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4935833B2 (ja) * | 2009-01-23 | 2012-05-23 | 日立化成工業株式会社 | 感光性樹脂組成物、これを用いた感光性エレメント、画像表示装置の隔壁の形成方法及び画像表示装置の製造方法 |
JP2010249884A (ja) * | 2009-04-10 | 2010-11-04 | Dupont Mrc Dryfilm Ltd | 光重合性樹脂組成物およびこれを用いた感光性フィルム |
JP5387896B2 (ja) * | 2009-06-05 | 2014-01-15 | 日立化成株式会社 | 感光性樹脂組成物及びこれを用いた感光性エレメント |
KR20130088166A (ko) * | 2010-11-17 | 2013-08-07 | 히타치가세이가부시끼가이샤 | 감광성 수지 조성물, 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 프린트 배선판의 제조 방법 |
US9482946B2 (en) * | 2011-03-30 | 2016-11-01 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition, photosensitive element using same, method for forming partition wall of image display device, and method for manufacturing image display device |
CN105431778A (zh) * | 2013-08-02 | 2016-03-23 | 日立化成株式会社 | 感光性树脂组合物 |
JP2015152854A (ja) * | 2014-02-18 | 2015-08-24 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物、感光性樹脂積層体及びレジストパターン形成方法 |
JP2016031413A (ja) * | 2014-07-28 | 2016-03-07 | 日立化成株式会社 | レーザー直描露光用感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造法 |
JP6828546B2 (ja) * | 2017-03-23 | 2021-02-10 | 昭和電工マテリアルズ株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
WO2023073799A1 (ja) * | 2021-10-26 | 2023-05-04 | 株式会社レゾナック | 感光性樹脂組成物、感光性エレメント、及び、積層体の製造方法 |
-
2021
- 2021-10-26 WO PCT/JP2021/039426 patent/WO2023073799A1/ja unknown
-
2022
- 2022-10-24 CN CN202211301744.8A patent/CN115524924A/zh active Pending
- 2022-10-24 CN CN202211303910.8A patent/CN115469510A/zh active Pending
- 2022-10-24 WO PCT/JP2022/039546 patent/WO2023074630A1/ja unknown
- 2022-10-24 JP JP2023556429A patent/JPWO2023074629A1/ja active Pending
- 2022-10-24 JP JP2023556430A patent/JPWO2023074630A1/ja active Pending
- 2022-10-24 WO PCT/JP2022/039545 patent/WO2023074629A1/ja unknown
- 2022-10-25 TW TW111140381A patent/TW202323309A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
CN115524924A (zh) | 2022-12-27 |
WO2023074630A1 (ja) | 2023-05-04 |
WO2023074629A1 (ja) | 2023-05-04 |
WO2023073799A1 (ja) | 2023-05-04 |
TW202323309A (zh) | 2023-06-16 |
JPWO2023074629A1 (ja) | 2023-05-04 |
CN115469510A (zh) | 2022-12-13 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240404 |