JPWO2022138674A1 - - Google Patents

Info

Publication number
JPWO2022138674A1
JPWO2022138674A1 JP2022571523A JP2022571523A JPWO2022138674A1 JP WO2022138674 A1 JPWO2022138674 A1 JP WO2022138674A1 JP 2022571523 A JP2022571523 A JP 2022571523A JP 2022571523 A JP2022571523 A JP 2022571523A JP WO2022138674 A1 JPWO2022138674 A1 JP WO2022138674A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022571523A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022138674A1 publication Critical patent/JPWO2022138674A1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Paints Or Removers (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
JP2022571523A 2020-12-21 2021-12-21 Pending JPWO2022138674A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/JP2020/047736 WO2022137294A1 (ja) 2020-12-21 2020-12-21 感光性樹脂組成物、硬化物及び電子部品
PCT/JP2021/047425 WO2022138674A1 (ja) 2020-12-21 2021-12-21 感光性樹脂組成物、硬化物、層間絶縁膜、カバーコート層、表面保護膜及び電子部品

Publications (1)

Publication Number Publication Date
JPWO2022138674A1 true JPWO2022138674A1 (ja) 2022-06-30

Family

ID=82159091

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022571523A Pending JPWO2022138674A1 (ja) 2020-12-21 2021-12-21

Country Status (3)

Country Link
JP (1) JPWO2022138674A1 (ja)
TW (1) TW202234157A (ja)
WO (2) WO2022137294A1 (ja)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4761989B2 (ja) * 2006-02-02 2011-08-31 旭化成イーマテリアルズ株式会社 ポリアミド酸エステル組成物
JP6168884B2 (ja) * 2013-07-05 2017-07-26 東京応化工業株式会社 ネガ型感光性樹脂組成物
JP6368066B2 (ja) * 2016-08-22 2018-08-01 旭化成株式会社 感光性樹脂組成物及び硬化レリーフパターンの製造方法

Also Published As

Publication number Publication date
WO2022137294A1 (ja) 2022-06-30
TW202234157A (zh) 2022-09-01
WO2022138674A1 (ja) 2022-06-30

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Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20230614