TW202234157A - 感光性樹脂組成物、硬化物、層間絕緣膜、覆蓋塗層、表面保護膜及電子零件 - Google Patents

感光性樹脂組成物、硬化物、層間絕緣膜、覆蓋塗層、表面保護膜及電子零件 Download PDF

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Publication number
TW202234157A
TW202234157A TW110147963A TW110147963A TW202234157A TW 202234157 A TW202234157 A TW 202234157A TW 110147963 A TW110147963 A TW 110147963A TW 110147963 A TW110147963 A TW 110147963A TW 202234157 A TW202234157 A TW 202234157A
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TW
Taiwan
Prior art keywords
group
general formula
photosensitive resin
resin composition
solvent
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Application number
TW110147963A
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English (en)
Chinese (zh)
Inventor
吉澤篤太郎
斉藤伸行
水野康平
松川大作
板橋俊明
Original Assignee
日商艾曲迪微系統股份有限公司
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Application filed by 日商艾曲迪微系統股份有限公司 filed Critical 日商艾曲迪微系統股份有限公司
Publication of TW202234157A publication Critical patent/TW202234157A/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Paints Or Removers (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
TW110147963A 2020-12-21 2021-12-21 感光性樹脂組成物、硬化物、層間絕緣膜、覆蓋塗層、表面保護膜及電子零件 TW202234157A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/JP2020/047736 WO2022137294A1 (ja) 2020-12-21 2020-12-21 感光性樹脂組成物、硬化物及び電子部品
WOPCT/JP2020/047736 2020-12-21

Publications (1)

Publication Number Publication Date
TW202234157A true TW202234157A (zh) 2022-09-01

Family

ID=82159091

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110147963A TW202234157A (zh) 2020-12-21 2021-12-21 感光性樹脂組成物、硬化物、層間絕緣膜、覆蓋塗層、表面保護膜及電子零件

Country Status (3)

Country Link
JP (1) JPWO2022138674A1 (ja)
TW (1) TW202234157A (ja)
WO (2) WO2022137294A1 (ja)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4761989B2 (ja) * 2006-02-02 2011-08-31 旭化成イーマテリアルズ株式会社 ポリアミド酸エステル組成物
JP6168884B2 (ja) * 2013-07-05 2017-07-26 東京応化工業株式会社 ネガ型感光性樹脂組成物
CN115755526A (zh) * 2016-08-22 2023-03-07 旭化成株式会社 感光性树脂组合物和固化浮雕图案的制造方法

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Publication number Publication date
WO2022137294A1 (ja) 2022-06-30
JPWO2022138674A1 (ja) 2022-06-30
WO2022138674A1 (ja) 2022-06-30

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