JPWO2022259885A5 - - Google Patents

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Publication number
JPWO2022259885A5
JPWO2022259885A5 JP2023527612A JP2023527612A JPWO2022259885A5 JP WO2022259885 A5 JPWO2022259885 A5 JP WO2022259885A5 JP 2023527612 A JP2023527612 A JP 2023527612A JP 2023527612 A JP2023527612 A JP 2023527612A JP WO2022259885 A5 JPWO2022259885 A5 JP WO2022259885A5
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JP
Japan
Prior art keywords
forming
composition
underlayer film
resist underlayer
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023527612A
Other languages
English (en)
Japanese (ja)
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JPWO2022259885A1 (https=
JP7841535B2 (ja
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Publication date
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Priority claimed from PCT/JP2022/021673 external-priority patent/WO2022259885A1/ja
Publication of JPWO2022259885A1 publication Critical patent/JPWO2022259885A1/ja
Publication of JPWO2022259885A5 publication Critical patent/JPWO2022259885A5/ja
Application granted granted Critical
Publication of JP7841535B2 publication Critical patent/JP7841535B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2023527612A 2021-06-07 2022-05-27 半導体基板の製造方法及びレジスト下層膜形成用組成物 Active JP7841535B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021095000 2021-06-07
JP2021095000 2021-06-07
PCT/JP2022/021673 WO2022259885A1 (ja) 2021-06-07 2022-05-27 半導体基板の製造方法及びレジスト下層膜形成用組成物

Publications (3)

Publication Number Publication Date
JPWO2022259885A1 JPWO2022259885A1 (https=) 2022-12-15
JPWO2022259885A5 true JPWO2022259885A5 (https=) 2025-10-20
JP7841535B2 JP7841535B2 (ja) 2026-04-07

Family

ID=84424887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023527612A Active JP7841535B2 (ja) 2021-06-07 2022-05-27 半導体基板の製造方法及びレジスト下層膜形成用組成物

Country Status (5)

Country Link
US (1) US20240142876A1 (https=)
JP (1) JP7841535B2 (https=)
KR (1) KR20240018455A (https=)
TW (1) TW202314387A (https=)
WO (1) WO2022259885A1 (https=)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3852107B2 (ja) 2000-11-14 2006-11-29 Ｊｓｒ株式会社 反射防止膜形成組成物
JP2005309141A (ja) * 2004-04-22 2005-11-04 Jsr Corp レジストパターン形成方法および回路素子の製造方法
WO2013141015A1 (ja) 2012-03-23 2013-09-26 日産化学工業株式会社 Ｅｕｖリソグラフィー用レジスト下層膜形成組成物
KR102038942B1 (ko) * 2015-06-24 2019-10-31 후지필름 가부시키가이샤 패턴 형성 방법, 적층체, 및 유기 용제 현상용 레지스트 조성물

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