JPWO2021235283A5 - - Google Patents

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Publication number
JPWO2021235283A5
JPWO2021235283A5 JP2022524405A JP2022524405A JPWO2021235283A5 JP WO2021235283 A5 JPWO2021235283 A5 JP WO2021235283A5 JP 2022524405 A JP2022524405 A JP 2022524405A JP 2022524405 A JP2022524405 A JP 2022524405A JP WO2021235283 A5 JPWO2021235283 A5 JP WO2021235283A5
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JP
Japan
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group
carbon atoms
radiation
atom
salt compound
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JP2022524405A
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English (en)
Japanese (ja)
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JPWO2021235283A1 (https=
JP7717060B2 (ja
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Priority claimed from PCT/JP2021/017999 external-priority patent/WO2021235283A1/ja
Publication of JPWO2021235283A1 publication Critical patent/JPWO2021235283A1/ja
Publication of JPWO2021235283A5 publication Critical patent/JPWO2021235283A5/ja
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JP2022524405A 2020-05-18 2021-05-12 感放射線性樹脂組成物、パターン形成方法及びオニウム塩化合物 Active JP7717060B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020086750 2020-05-18
JP2020086750 2020-05-18
PCT/JP2021/017999 WO2021235283A1 (ja) 2020-05-18 2021-05-12 感放射線性樹脂組成物、パターン形成方法及びオニウム塩化合物

Publications (3)

Publication Number Publication Date
JPWO2021235283A1 JPWO2021235283A1 (https=) 2021-11-25
JPWO2021235283A5 true JPWO2021235283A5 (https=) 2023-02-01
JP7717060B2 JP7717060B2 (ja) 2025-08-01

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ID=78707859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022524405A Active JP7717060B2 (ja) 2020-05-18 2021-05-12 感放射線性樹脂組成物、パターン形成方法及びオニウム塩化合物

Country Status (3)

Country Link
JP (1) JP7717060B2 (https=)
TW (1) TW202146390A (https=)
WO (1) WO2021235283A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202402722A (zh) * 2022-07-14 2024-01-16 美商羅門哈斯電子材料有限公司 光活性化合物、包含其之光阻劑組成物及圖案形成方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006083687A1 (en) * 2005-01-28 2006-08-10 Cardiome Pharma Corp. Crystal salt of xanthine oxidase inhibitors
JP5568532B2 (ja) * 2011-09-22 2014-08-06 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、並びに、これを用いたレジスト膜、パターン形成方法、電子デバイスの製造方法、及び、電子デバイス
CN111919174A (zh) * 2018-03-27 2020-11-10 东京应化工业株式会社 镀敷造形物的制造方法

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