JPWO2022239597A5 - - Google Patents

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Publication number
JPWO2022239597A5
JPWO2022239597A5 JP2023520934A JP2023520934A JPWO2022239597A5 JP WO2022239597 A5 JPWO2022239597 A5 JP WO2022239597A5 JP 2023520934 A JP2023520934 A JP 2023520934A JP 2023520934 A JP2023520934 A JP 2023520934A JP WO2022239597 A5 JPWO2022239597 A5 JP WO2022239597A5
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JP
Japan
Prior art keywords
group
aliphatic hydrocarbon
formula
hydrocarbon group
carbon atoms
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JP2023520934A
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English (en)
Japanese (ja)
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JPWO2022239597A1 (https=
JP7380951B2 (ja
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Priority claimed from PCT/JP2022/017764 external-priority patent/WO2022239597A1/ja
Publication of JPWO2022239597A1 publication Critical patent/JPWO2022239597A1/ja
Publication of JPWO2022239597A5 publication Critical patent/JPWO2022239597A5/ja
Application granted granted Critical
Publication of JP7380951B2 publication Critical patent/JP7380951B2/ja
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JP2023520934A 2021-05-14 2022-04-14 フェノール性水酸基含有樹脂 Active JP7380951B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021082506 2021-05-14
JP2021082506 2021-05-14
PCT/JP2022/017764 WO2022239597A1 (ja) 2021-05-14 2022-04-14 フェノール性水酸基含有樹脂

Publications (3)

Publication Number Publication Date
JPWO2022239597A1 JPWO2022239597A1 (https=) 2022-11-17
JPWO2022239597A5 true JPWO2022239597A5 (https=) 2023-06-22
JP7380951B2 JP7380951B2 (ja) 2023-11-15

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ID=84028213

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023520934A Active JP7380951B2 (ja) 2021-05-14 2022-04-14 フェノール性水酸基含有樹脂

Country Status (5)

Country Link
JP (1) JP7380951B2 (https=)
KR (1) KR102804147B1 (https=)
CN (1) CN117321109A (https=)
TW (1) TWI864366B (https=)
WO (1) WO2022239597A1 (https=)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2231860A (en) * 1937-09-27 1941-02-11 Monsanto Chemicals Phenol-butyraldehyde-formaldehyde resins
JP2559245B2 (ja) * 1987-10-14 1996-12-04 富士写真フイルム株式会社 ハロゲン化銀写真感光材料
FR2642078B1 (fr) * 1989-01-25 1992-08-28 Ceca Sa Resines formophenoliques de type novolaque resultant de la condensation de phenols et d'aldehydes lourds. leur preparation. leur application au renforcement du caoutchouc
FR2665165B1 (fr) * 1990-07-25 1995-02-24 Ceca Sa Nouvelles resines novolaques de para-alkylphenols. leur procede de preparation.
JP3710717B2 (ja) 2001-03-06 2005-10-26 東京応化工業株式会社 厚膜用ポジ型ホトレジスト組成物、ホトレジスト膜およびこれを用いたバンプ形成方法
US7074861B2 (en) * 2003-02-18 2006-07-11 Indspec Chemical Corporation Modified resorcinol resins and applications thereof
JP2008088197A (ja) 2006-09-29 2008-04-17 Sumitomo Bakelite Co Ltd フォトレジスト用フェノール樹脂とその製造方法、及びフォトレジスト用樹脂組成物
FR2951451B1 (fr) 2009-10-20 2012-10-19 Rhodia Operations Composition polyamide modifiee comprenant au moins un compose phenolique
US10577449B2 (en) 2015-05-20 2020-03-03 Dic Corporation Phenolic-hydroxyl-group-containing novolac resin and resist film
CN107848926B (zh) 2015-08-18 2021-04-20 Dic株式会社 酚醛清漆型含酚性羟基树脂以及抗蚀膜
MX2018005209A (es) * 2015-10-29 2018-08-01 Hexion Inc Nuevas resinas de alquilfenol y metodo para prepararlas.
KR102652307B1 (ko) 2019-01-21 2024-03-29 디아이씨 가부시끼가이샤 페놀성 수산기 함유 수지, 감광성 조성물, 레지스트막, 경화성 조성물 및 경화물

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