JPWO2022202080A1 - - Google Patents
Info
- Publication number
- JPWO2022202080A1 JPWO2022202080A1 JP2022542044A JP2022542044A JPWO2022202080A1 JP WO2022202080 A1 JPWO2022202080 A1 JP WO2022202080A1 JP 2022542044 A JP2022542044 A JP 2022542044A JP 2022542044 A JP2022542044 A JP 2022542044A JP WO2022202080 A1 JPWO2022202080 A1 JP WO2022202080A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/34—Applying different liquids or other fluent materials simultaneously
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/14—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to metal, e.g. car bodies
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
Landscapes
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021050882 | 2021-03-25 | ||
JP2021050881 | 2021-03-25 | ||
JP2021050882 | 2021-03-25 | ||
JP2021050881 | 2021-03-25 | ||
PCT/JP2022/007678 WO2022202080A1 (ja) | 2021-03-25 | 2022-02-24 | フレキシブルプリント基板の製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JPWO2022202080A1 true JPWO2022202080A1 (ko) | 2022-09-29 |
JP7153167B1 JP7153167B1 (ja) | 2022-10-13 |
JPWO2022202080A5 JPWO2022202080A5 (ko) | 2023-02-21 |
Family
ID=83397044
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022542044A Active JP7153167B1 (ja) | 2021-03-25 | 2022-02-24 | フレキシブルプリント基板の製造方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7153167B1 (ko) |
KR (1) | KR102516437B1 (ko) |
CN (1) | CN115918275B (ko) |
WO (1) | WO2022202080A1 (ko) |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1065348A (ja) * | 1996-08-21 | 1998-03-06 | Ibiden Co Ltd | 多層プリント配線板の製造方法 |
JP2000156556A (ja) * | 1998-11-20 | 2000-06-06 | Kansai Paint Co Ltd | スルーホール部を有する基板へのレジスト層形成方法及びプリント配線基板の製造方法 |
EP1009206A3 (en) * | 1998-12-02 | 2003-01-15 | Ajinomoto Co., Inc. | Method of vacuum-laminating adhesive film |
JP2002306998A (ja) * | 2001-04-16 | 2002-10-22 | Sumitomo Chem Co Ltd | 板状塗工物の製造方法とそのための塗布装置 |
JP2004071825A (ja) * | 2002-08-06 | 2004-03-04 | Taiyo Ink Mfg Ltd | 多層プリント配線板の製造方法 |
CN100342983C (zh) * | 2005-03-18 | 2007-10-17 | 叶步章 | 可限制pcb油墨涂覆范围的滚筒装置 |
US9835942B2 (en) * | 2010-12-14 | 2017-12-05 | Kaneka Corporation | Photosensitive resin composition and use thereof |
TW201524288A (zh) | 2013-12-11 | 2015-06-16 | Microcosm Technology Co Ltd | 塗佈設備及塗佈方法 |
JP6345947B2 (ja) | 2014-02-27 | 2018-06-20 | 株式会社タムラ製作所 | 感光性樹脂組成物 |
KR102366946B1 (ko) | 2016-11-18 | 2022-02-25 | 가부시키가이샤 아리사와 세이사쿠쇼 | 감광성 수지 조성물, 해당 감광성 수지 조성물을 사용한 솔더 레지스트 필름, 플렉시블 프린트 배선판 및 화상 표시 장치 |
WO2019160126A1 (ja) * | 2018-02-19 | 2019-08-22 | 株式会社カネカ | 感光性樹脂組成物、硬化膜、プリント配線板およびその製造方法、ならびに感光性樹脂組成物作製キット |
JP2020148971A (ja) | 2019-03-14 | 2020-09-17 | 株式会社タムラ製作所 | 感光性樹脂組成物 |
-
2022
- 2022-02-24 CN CN202280005219.3A patent/CN115918275B/zh active Active
- 2022-02-24 KR KR1020227044408A patent/KR102516437B1/ko active IP Right Grant
- 2022-02-24 WO PCT/JP2022/007678 patent/WO2022202080A1/ja active Application Filing
- 2022-02-24 JP JP2022542044A patent/JP7153167B1/ja active Active
Also Published As
Publication number | Publication date |
---|---|
CN115918275B (zh) | 2023-10-27 |
KR20230005409A (ko) | 2023-01-09 |
CN115918275A (zh) | 2023-04-04 |
JP7153167B1 (ja) | 2022-10-13 |
WO2022202080A1 (ja) | 2022-09-29 |
KR102516437B1 (ko) | 2023-03-31 |
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