JPWO2022196716A5 - - Google Patents
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- Publication number
- JPWO2022196716A5 JPWO2022196716A5 JP2023507148A JP2023507148A JPWO2022196716A5 JP WO2022196716 A5 JPWO2022196716 A5 JP WO2022196716A5 JP 2023507148 A JP2023507148 A JP 2023507148A JP 2023507148 A JP2023507148 A JP 2023507148A JP WO2022196716 A5 JPWO2022196716 A5 JP WO2022196716A5
- Authority
- JP
- Japan
- Prior art keywords
- salt
- ruthenium
- composition
- composition according
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 16
- 229910052707 ruthenium Inorganic materials 0.000 claims 16
- 239000000758 substrate Substances 0.000 claims 12
- 150000003839 salts Chemical class 0.000 claims 7
- 239000000126 substance Substances 0.000 claims 5
- 125000005270 trialkylamine group Chemical group 0.000 claims 5
- 239000000463 material Substances 0.000 claims 4
- 150000003242 quaternary ammonium salts Chemical class 0.000 claims 4
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 150000001450 anions Chemical class 0.000 claims 3
- 125000004432 carbon atom Chemical group C* 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 3
- KHIWWQKSHDUIBK-UHFFFAOYSA-N periodic acid Chemical class OI(=O)(=O)=O KHIWWQKSHDUIBK-UHFFFAOYSA-N 0.000 claims 3
- 125000001424 substituent group Chemical group 0.000 claims 3
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- -1 periodic acid compound Chemical class 0.000 claims 2
- 238000005498 polishing Methods 0.000 claims 2
- 150000003863 ammonium salts Chemical class 0.000 claims 1
- VBQDSLGFSUGBBE-UHFFFAOYSA-N benzyl(triethyl)azanium Chemical class CC[N+](CC)(CC)CC1=CC=CC=C1 VBQDSLGFSUGBBE-UHFFFAOYSA-N 0.000 claims 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical class C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- ZJHQDSMOYNLVLX-UHFFFAOYSA-N diethyl(dimethyl)azanium Chemical class CC[N+](C)(C)CC ZJHQDSMOYNLVLX-UHFFFAOYSA-N 0.000 claims 1
- WQHRRUZRGXLCGL-UHFFFAOYSA-N dimethyl(dipropyl)azanium Chemical class CCC[N+](C)(C)CCC WQHRRUZRGXLCGL-UHFFFAOYSA-N 0.000 claims 1
- 238000001312 dry etching Methods 0.000 claims 1
- YOMFVLRTMZWACQ-UHFFFAOYSA-N ethyltrimethylammonium Chemical class CC[N+](C)(C)C YOMFVLRTMZWACQ-UHFFFAOYSA-N 0.000 claims 1
- TWLXDPFBEPBAQB-UHFFFAOYSA-N orthoperiodic acid Chemical compound OI(O)(O)(O)(O)=O TWLXDPFBEPBAQB-UHFFFAOYSA-N 0.000 claims 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical class CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 claims 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical class CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 claims 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical class C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 claims 1
- HJHUXWBTVVFLQI-UHFFFAOYSA-N tributyl(methyl)azanium Chemical class CCCC[N+](C)(CCCC)CCCC HJHUXWBTVVFLQI-UHFFFAOYSA-N 0.000 claims 1
- SEACXNRNJAXIBM-UHFFFAOYSA-N triethyl(methyl)azanium Chemical class CC[N+](C)(CC)CC SEACXNRNJAXIBM-UHFFFAOYSA-N 0.000 claims 1
- GZBUMTPCIKCWFW-UHFFFAOYSA-N triethylcholine Chemical class CC[N+](CC)(CC)CCO GZBUMTPCIKCWFW-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021043957 | 2021-03-17 | ||
| PCT/JP2022/011812 WO2022196716A1 (ja) | 2021-03-17 | 2022-03-16 | 組成物、基板の処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2022196716A1 JPWO2022196716A1 (https=) | 2022-09-22 |
| JPWO2022196716A5 true JPWO2022196716A5 (https=) | 2023-12-14 |
Family
ID=83321028
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023507148A Pending JPWO2022196716A1 (https=) | 2021-03-17 | 2022-03-16 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20240002725A1 (https=) |
| JP (1) | JPWO2022196716A1 (https=) |
| KR (1) | KR20230142800A (https=) |
| CN (1) | CN117062940A (https=) |
| TW (1) | TW202240027A (https=) |
| WO (1) | WO2022196716A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7290195B1 (ja) * | 2022-10-19 | 2023-06-13 | Jsr株式会社 | 半導体処理用組成物及び処理方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS553666A (en) | 1978-06-22 | 1980-01-11 | Mitsubishi Electric Corp | Preparation of semiconductor device |
| US20140054266A1 (en) * | 2012-08-24 | 2014-02-27 | Wiechang Jin | Compositions and methods for selective polishing of platinum and ruthenium materials |
| JP6460729B2 (ja) * | 2014-10-31 | 2019-01-30 | 富士フイルム株式会社 | 基板処理方法、及び、半導体素子の製造方法 |
| KR102113463B1 (ko) * | 2016-01-22 | 2020-05-21 | 후지필름 가부시키가이샤 | 처리액 |
| SG11202006176YA (en) * | 2018-01-12 | 2020-07-29 | Fujifilm Corp | Chemical solution and method for treating substrate |
| WO2020054291A1 (ja) * | 2018-09-13 | 2020-03-19 | 富士フイルム株式会社 | 薬液 |
| JP6670917B1 (ja) * | 2018-12-18 | 2020-03-25 | 東京応化工業株式会社 | エッチング液、被処理体の処理方法、及び半導体素子の製造方法。 |
-
2022
- 2022-03-16 CN CN202280021260.XA patent/CN117062940A/zh active Pending
- 2022-03-16 WO PCT/JP2022/011812 patent/WO2022196716A1/ja not_active Ceased
- 2022-03-16 TW TW111109632A patent/TW202240027A/zh unknown
- 2022-03-16 JP JP2023507148A patent/JPWO2022196716A1/ja active Pending
- 2022-03-16 KR KR1020237031438A patent/KR20230142800A/ko not_active Ceased
-
2023
- 2023-09-15 US US18/468,123 patent/US20240002725A1/en active Pending
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