JPWO2022186269A1 - - Google Patents

Info

Publication number
JPWO2022186269A1
JPWO2022186269A1 JP2023503905A JP2023503905A JPWO2022186269A1 JP WO2022186269 A1 JPWO2022186269 A1 JP WO2022186269A1 JP 2023503905 A JP2023503905 A JP 2023503905A JP 2023503905 A JP2023503905 A JP 2023503905A JP WO2022186269 A1 JPWO2022186269 A1 JP WO2022186269A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023503905A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022186269A1 publication Critical patent/JPWO2022186269A1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
    • C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C235/00—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms
    • C07C235/02—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C235/04—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton being acyclic and saturated
    • C07C235/06—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton being acyclic and saturated having the nitrogen atoms of the carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
    • C08G65/329—Polymers modified by chemical after-treatment with organic compounds
    • C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2650/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G2650/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterized by the type of post-polymerisation functionalisation
    • C08G2650/04—End-capping
JP2023503905A 2021-03-05 2022-03-02 Pending JPWO2022186269A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021034907 2021-03-05
PCT/JP2022/008843 WO2022186269A1 (ja) 2021-03-05 2022-03-02 含フッ素エーテル化合物、表面処理剤、含フッ素エーテル組成物、コーティング液、物品、物品の製造方法、及び化合物

Publications (1)

Publication Number Publication Date
JPWO2022186269A1 true JPWO2022186269A1 (ja) 2022-09-09

Family

ID=83154632

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023503905A Pending JPWO2022186269A1 (ja) 2021-03-05 2022-03-02

Country Status (5)

Country Link
US (1) US20230407003A1 (ja)
JP (1) JPWO2022186269A1 (ja)
KR (1) KR20230154891A (ja)
CN (1) CN117043227A (ja)
WO (1) WO2022186269A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230110907A (ko) * 2022-01-17 2023-07-25 동우 화인켐 주식회사 표면 처리용 조성물 및 이로부터 코팅된 광학 부재

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6127992A (ja) * 1984-07-17 1986-02-07 Seiko Epson Corp 芳香環を含有する有機シラン化合物の製造方法
JPH11116943A (ja) * 1997-10-20 1999-04-27 Asahi Glass Co Ltd 表面処理剤、処理基材、物品、および含フッ素有機ケイ素化合物
JP4115673B2 (ja) * 2001-02-06 2008-07-09 信越化学工業株式会社 プライマー組成物
JP4114062B2 (ja) * 2003-04-30 2008-07-09 信越化学工業株式会社 プライマー組成物
JP4691332B2 (ja) * 2004-07-14 2011-06-01 富士フイルム株式会社 含フッ素多官能モノマー、含フッ素重合体、反射防止膜、反射防止フィルムおよび画像表示装置
JP4725730B2 (ja) * 2006-03-01 2011-07-13 信越化学工業株式会社 シリコーンゴム成形品とフッ素系エラストマーとが一体化されたゴム物品の製造方法
JP2009098658A (ja) * 2007-09-25 2009-05-07 Fujifilm Corp 光学フィルム、偏光板、及び画像表示装置
JP6159054B2 (ja) * 2011-09-30 2017-07-05 日本ゼオン株式会社 重合体、複合体および重合体の製造方法
JP2013177503A (ja) * 2012-02-28 2013-09-09 Fujifilm Corp 被覆用組成物、透明被覆成形品及びその製造方法
JP6248858B2 (ja) 2014-08-07 2017-12-20 信越化学工業株式会社 フッ素系表面処理剤及び該表面処理剤で表面処理された物品
JP6398500B2 (ja) * 2014-09-10 2018-10-03 信越化学工業株式会社 含フッ素コーティング剤及び該コーティング剤で処理された物品
JP2016150996A (ja) * 2015-02-18 2016-08-22 旭硝子株式会社 離型フィルム用塗料組成物および離型フィルム
CN107922445B (zh) 2015-09-01 2020-07-28 Ａｇｃ株式会社 含氟醚化合物、含氟醚组合物、涂布液和物品
JP6724952B2 (ja) * 2017-08-18 2020-07-15 Ａｇｃ株式会社 含フッ素エーテル化合物の製造方法、物品の製造方法
WO2019039083A1 (ja) * 2017-08-22 2019-02-28 Ａｇｃ株式会社 含フッ素化合物、組成物、コーティング液、および含フッ素化合物の製造方法
JP6690675B2 (ja) * 2017-09-05 2020-04-28 Ａｇｃ株式会社 化合物、組成物、表面処理剤、物品および化合物の製造方法
JPWO2019049754A1 (ja) * 2017-09-05 2020-10-08 Ａｇｃ株式会社 含フッ素化合物、組成物および物品

Also Published As

Publication number Publication date
US20230407003A1 (en) 2023-12-21
KR20230154891A (ko) 2023-11-09
CN117043227A (zh) 2023-11-10
WO2022186269A1 (ja) 2022-09-09

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