JPWO2022131059A1 - - Google Patents

Info

Publication number
JPWO2022131059A1
JPWO2022131059A1 JP2022569881A JP2022569881A JPWO2022131059A1 JP WO2022131059 A1 JPWO2022131059 A1 JP WO2022131059A1 JP 2022569881 A JP2022569881 A JP 2022569881A JP 2022569881 A JP2022569881 A JP 2022569881A JP WO2022131059 A1 JPWO2022131059 A1 JP WO2022131059A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022569881A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022131059A1 publication Critical patent/JPWO2022131059A1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • H10D8/01Manufacture or treatment
    • H10D8/051Manufacture or treatment of Schottky diodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/113Isolations within a component, i.e. internal isolations
    • H10D62/115Dielectric isolations, e.g. air gaps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/117Shapes of semiconductor bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/85Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
    • H10D62/8503Nitride Group III-V materials, e.g. AlN or GaN
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/111Field plates
    • H10D64/117Recessed field plates, e.g. trench field plates or buried field plates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/60Electrodes characterised by their materials
    • H10D64/64Electrodes comprising a Schottky barrier to a semiconductor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • H10D8/60Schottky-barrier diodes 
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • H10D8/60Schottky-barrier diodes 
    • H10D8/605Schottky-barrier diodes  of the trench conductor-insulator-semiconductor barrier type, e.g. trench MOS barrier Schottky rectifiers [TMBS]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/103Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
    • H10D62/104Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices having particular shapes of the bodies at or near reverse-biased junctions, e.g. having bevels or moats
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/103Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
    • H10D62/105Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] 
    • H10D62/106Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]  having supplementary regions doped oppositely to or in rectifying contact with regions of the semiconductor bodies, e.g. guard rings with PN or Schottky junctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/23Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
JP2022569881A 2020-12-17 2021-12-06 Pending JPWO2022131059A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020209672 2020-12-17
PCT/JP2021/044789 WO2022131059A1 (ja) 2020-12-17 2021-12-06 半導体素子の製造方法、半導体素子及び半導体装置

Publications (1)

Publication Number Publication Date
JPWO2022131059A1 true JPWO2022131059A1 (https=) 2022-06-23

Family

ID=82057670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022569881A Pending JPWO2022131059A1 (https=) 2020-12-17 2021-12-06

Country Status (5)

Country Link
US (1) US20230326993A1 (https=)
EP (1) EP4266350A1 (https=)
JP (1) JPWO2022131059A1 (https=)
CN (1) CN116569338A (https=)
WO (1) WO2022131059A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012114263A (ja) * 2010-11-25 2012-06-14 Pawdec:Kk 半導体素子およびその製造方法
JP2012124268A (ja) * 2010-12-07 2012-06-28 Nippon Inter Electronics Corp 半導体装置
JP2015056471A (ja) * 2013-09-11 2015-03-23 株式会社東芝 半導体装置及びその製造方法
JP2015099903A (ja) * 2013-10-17 2015-05-28 ローム株式会社 窒化物半導体装置およびその製造方法
WO2019232230A1 (en) * 2018-05-30 2019-12-05 The Regents Of The University Of California Method of removing semiconducting layers from a semiconducting substrate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4667556B2 (ja) * 2000-02-18 2011-04-13 古河電気工業株式会社 縦型GaN系電界効果トランジスタ、バイポーラトランジスタと縦型GaN系電界効果トランジスタの製造方法
JP2009076866A (ja) * 2007-08-31 2009-04-09 Sumitomo Electric Ind Ltd ショットキーバリアダイオード
JP5888214B2 (ja) * 2012-11-30 2016-03-16 富士電機株式会社 窒化物系化合物半導体装置およびその製造方法
JP6070422B2 (ja) 2013-05-31 2017-02-01 豊田合成株式会社 半導体素装置の製造方法及び半導体装置
JP2016031953A (ja) * 2014-07-25 2016-03-07 株式会社タムラ製作所 半導体素子及びその製造方法、半導体基板、並びに結晶積層構造体

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012114263A (ja) * 2010-11-25 2012-06-14 Pawdec:Kk 半導体素子およびその製造方法
JP2012124268A (ja) * 2010-12-07 2012-06-28 Nippon Inter Electronics Corp 半導体装置
JP2015056471A (ja) * 2013-09-11 2015-03-23 株式会社東芝 半導体装置及びその製造方法
JP2015099903A (ja) * 2013-10-17 2015-05-28 ローム株式会社 窒化物半導体装置およびその製造方法
WO2019232230A1 (en) * 2018-05-30 2019-12-05 The Regents Of The University Of California Method of removing semiconducting layers from a semiconducting substrate

Also Published As

Publication number Publication date
WO2022131059A1 (ja) 2022-06-23
EP4266350A1 (en) 2023-10-25
CN116569338A (zh) 2023-08-08
US20230326993A1 (en) 2023-10-12

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