JPWO2022084800A5 - - Google Patents

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Publication number
JPWO2022084800A5
JPWO2022084800A5 JP2022557216A JP2022557216A JPWO2022084800A5 JP WO2022084800 A5 JPWO2022084800 A5 JP WO2022084800A5 JP 2022557216 A JP2022557216 A JP 2022557216A JP 2022557216 A JP2022557216 A JP 2022557216A JP WO2022084800 A5 JPWO2022084800 A5 JP WO2022084800A5
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JP
Japan
Prior art keywords
transistor
memory cell
drain
source
electrically connected
Prior art date
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Application number
JP2022557216A
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English (en)
Japanese (ja)
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JP7723677B2 (ja
JPWO2022084800A1 (https=
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Priority claimed from PCT/IB2021/059303 external-priority patent/WO2022084800A1/ja
Publication of JPWO2022084800A1 publication Critical patent/JPWO2022084800A1/ja
Publication of JPWO2022084800A5 publication Critical patent/JPWO2022084800A5/ja
Priority to JP2025129098A priority Critical patent/JP7854098B2/ja
Application granted granted Critical
Publication of JP7723677B2 publication Critical patent/JP7723677B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2022557216A 2020-10-20 2021-10-12 半導体装置、及び電子機器 Active JP7723677B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025129098A JP7854098B2 (ja) 2020-10-20 2025-08-01 半導体装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020176312 2020-10-20
JP2020176312 2020-10-20
PCT/IB2021/059303 WO2022084800A1 (ja) 2020-10-20 2021-10-12 半導体装置、及び電子機器

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025129098A Division JP7854098B2 (ja) 2020-10-20 2025-08-01 半導体装置

Publications (3)

Publication Number Publication Date
JPWO2022084800A1 JPWO2022084800A1 (https=) 2022-04-28
JPWO2022084800A5 true JPWO2022084800A5 (https=) 2024-10-17
JP7723677B2 JP7723677B2 (ja) 2025-08-14

Family

ID=81289711

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022557216A Active JP7723677B2 (ja) 2020-10-20 2021-10-12 半導体装置、及び電子機器
JP2025129098A Active JP7854098B2 (ja) 2020-10-20 2025-08-01 半導体装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025129098A Active JP7854098B2 (ja) 2020-10-20 2025-08-01 半導体装置

Country Status (5)

Country Link
US (1) US20230337439A1 (https=)
JP (2) JP7723677B2 (https=)
KR (1) KR20230088692A (https=)
CN (1) CN116601707A (https=)
WO (1) WO2022084800A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230268355A1 (en) * 2022-02-23 2023-08-24 Taiwan Semiconductor Manufacturing Company, Ltd. Integrated circuit device and method for fabricating the same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2692610B2 (ja) * 1994-09-28 1997-12-17 日本電気株式会社 半導体不揮発性メモリセル及びその動作方法
JP3960030B2 (ja) * 2001-12-11 2007-08-15 富士通株式会社 強誘電体メモリ
JP2008140220A (ja) * 2006-12-04 2008-06-19 Nec Corp 半導体装置
CN102742003B (zh) 2010-01-15 2015-01-28 株式会社半导体能源研究所 半导体器件
JP6173007B2 (ja) * 2012-04-27 2017-08-02 株式会社半導体エネルギー研究所 半導体集積回路
EP3304554A4 (en) * 2015-05-28 2019-01-09 INTEL Corporation MEMORY CELL BASED ON FERROELECTRIC MATERIAL WITH NON-VOLATILE RETENTION
US9773787B2 (en) * 2015-11-03 2017-09-26 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, memory device, electronic device, or method for driving the semiconductor device
WO2018073708A1 (en) * 2016-10-20 2018-04-26 Semiconductor Energy Laboratory Co., Ltd. Storage device, driving method thereof, semiconductor device, electronic component, and electronic device
US10679688B2 (en) * 2018-04-16 2020-06-09 Samsung Electronics Co., Ltd. Ferroelectric-based memory cell usable in on-logic chip memory
US11631447B2 (en) * 2019-07-25 2023-04-18 Taiwan Semiconductor Manufacturing Co., Ltd. Memory circuit and manufacturing method thereof
TWI865775B (zh) * 2020-05-15 2024-12-11 日商半導體能源研究所股份有限公司 半導體裝置及電子裝置

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