JPWO2022004051A5 - - Google Patents

Download PDF

Info

Publication number
JPWO2022004051A5
JPWO2022004051A5 JP2022533675A JP2022533675A JPWO2022004051A5 JP WO2022004051 A5 JPWO2022004051 A5 JP WO2022004051A5 JP 2022533675 A JP2022533675 A JP 2022533675A JP 2022533675 A JP2022533675 A JP 2022533675A JP WO2022004051 A5 JPWO2022004051 A5 JP WO2022004051A5
Authority
JP
Japan
Prior art keywords
intensity
optical element
laser beam
incident laser
changing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022533675A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2022004051A1 (https=
JP7444258B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2021/007284 external-priority patent/WO2022004051A1/ja
Publication of JPWO2022004051A1 publication Critical patent/JPWO2022004051A1/ja
Publication of JPWO2022004051A5 publication Critical patent/JPWO2022004051A5/ja
Application granted granted Critical
Publication of JP7444258B2 publication Critical patent/JP7444258B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2022533675A 2020-07-02 2021-02-26 レーザ光強度調整方法及びレーザ光強度調整装置 Active JP7444258B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020114969 2020-07-02
JP2020114969 2020-07-02
PCT/JP2021/007284 WO2022004051A1 (ja) 2020-07-02 2021-02-26 レーザ光強度調整方法及びレーザ光強度調整装置

Publications (3)

Publication Number Publication Date
JPWO2022004051A1 JPWO2022004051A1 (https=) 2022-01-06
JPWO2022004051A5 true JPWO2022004051A5 (https=) 2023-03-03
JP7444258B2 JP7444258B2 (ja) 2024-03-06

Family

ID=79315265

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022533675A Active JP7444258B2 (ja) 2020-07-02 2021-02-26 レーザ光強度調整方法及びレーザ光強度調整装置

Country Status (4)

Country Link
US (1) US20230241713A1 (https=)
JP (1) JP7444258B2 (https=)
CN (1) CN115702376A (https=)
WO (1) WO2022004051A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022066435A1 (en) * 2020-09-28 2022-03-31 Corning Incorporated Methods for adjusting beam properties for laser processing coated substrates

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4161136B2 (ja) * 2005-09-26 2008-10-08 オムロン株式会社 光レベル制御器とその制御方法並びにこれを用いたレーザ応用装置
JP5081711B2 (ja) 2008-04-30 2012-11-28 パナソニック デバイスＳｕｎｘ株式会社 レーザ加工装置
US20140091198A1 (en) * 2011-10-11 2014-04-03 Mitsubishi Electric Corporation Laser output measurement mechanism
TW201521306A (zh) * 2013-11-28 2015-06-01 U & U Engineering Inc 雷射輸出能量控制裝置與其方法
JP6699770B2 (ja) * 2019-02-21 2020-05-27 株式会社島津製作所 Ｍａｌｄｉイオン源及び質量分析装置

Similar Documents

Publication Publication Date Title
US6805496B2 (en) Optical communication module, manufacturing method thereof and wavelength selective filter
TWI457601B (zh) 偏光方位角調整裝置及雷射加工裝置
TWI665470B (zh) 用於極化控制之系統，方法及裝置
JP2011505593A5 (ja) 立体視用システム、立体視用ディジタル画像プロジェクタ及びカラー投射装置
TW201640210A (zh) 照明系統以及投影裝置
US20170343716A1 (en) System and Method for Polarization Compensation
JPWO2022004051A5 (https=)
TWI738675B (zh) 偏振器配置、極紫外線輻射產生裝置及用於雷射光束之線性偏振之方法
TW201920918A (zh) 可變光圈遮罩
CN111856768A (zh) 一种基于双色镜的双光同轴模组
JP5923132B2 (ja) レーザ加工装置用の偏光状態変換素子
CN107589622B (zh) 零级衍射可调的激光投影装置
CN105552713A (zh) 用于无荧光拉曼光谱仪的多波长外腔激光器
CN111562002B (zh) 高通量高分辨率高对比度的偏振干涉光谱成像装置及方法
JP7444258B2 (ja) レーザ光強度調整方法及びレーザ光強度調整装置
CN1769840A (zh) 激光光线出射装置
JP2001066124A (ja) 三次元表面形状測定装置
US12099286B2 (en) Projection display system and method
CN112236958B (zh) 光学滤波器控制
KR102294883B1 (ko) 박막 두께 측정 센서
JPS58132722A (ja) 光アイソレ−タ装置
JP2006216199A (ja) 光源および製造方法
JP2022021215A5 (https=)
JP2003291153A (ja) 照射装置
TWI595255B (zh) 鐳射尺校準系統