JP2022021215A5 - - Google Patents
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- JP2022021215A5 JP2022021215A5 JP2020124684A JP2020124684A JP2022021215A5 JP 2022021215 A5 JP2022021215 A5 JP 2022021215A5 JP 2020124684 A JP2020124684 A JP 2020124684A JP 2020124684 A JP2020124684 A JP 2020124684A JP 2022021215 A5 JP2022021215 A5 JP 2022021215A5
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- 230000003287 optical effect Effects 0.000 claims 8
- 230000017525 heat dissipation Effects 0.000 claims 1
- 230000010287 polarization Effects 0.000 claims 1
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020124684A JP7542352B2 (ja) | 2020-07-21 | 2020-07-21 | アッテネータ装置及びレーザ加工装置 |
| KR1020227038238A KR102946766B1 (ko) | 2020-07-21 | 2021-04-19 | 어테뉴에이터 장치 및 레이저 가공 장치 |
| CN202180060829.9A CN116157224A (zh) | 2020-07-21 | 2021-04-19 | 衰减器装置及激光加工装置 |
| EP21845529.3A EP4113190A4 (en) | 2020-07-21 | 2021-04-19 | DAMPING DEVICE AND LASER PROCESSING DEVICE |
| US18/010,272 US20240033849A1 (en) | 2020-07-21 | 2021-04-19 | Attenuator device and laser processing apparatus |
| PCT/JP2021/015881 WO2022018917A1 (ja) | 2020-07-21 | 2021-04-19 | アッテネータ装置及びレーザ加工装置 |
| TW110115747A TWI888546B (zh) | 2020-07-21 | 2021-04-30 | 衰減器裝置及雷射加工裝置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020124684A JP7542352B2 (ja) | 2020-07-21 | 2020-07-21 | アッテネータ装置及びレーザ加工装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022021215A JP2022021215A (ja) | 2022-02-02 |
| JP2022021215A5 true JP2022021215A5 (https=) | 2023-03-28 |
| JP7542352B2 JP7542352B2 (ja) | 2024-08-30 |
Family
ID=79729321
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020124684A Active JP7542352B2 (ja) | 2020-07-21 | 2020-07-21 | アッテネータ装置及びレーザ加工装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20240033849A1 (https=) |
| EP (1) | EP4113190A4 (https=) |
| JP (1) | JP7542352B2 (https=) |
| KR (1) | KR102946766B1 (https=) |
| CN (1) | CN116157224A (https=) |
| TW (1) | TWI888546B (https=) |
| WO (1) | WO2022018917A1 (https=) |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4916000Y1 (https=) * | 1970-03-09 | 1974-04-22 | ||
| US3655268A (en) | 1970-06-01 | 1972-04-11 | Sylvania Electric Prod | Laser beam attenuator |
| DE3319151A1 (de) * | 1983-05-26 | 1984-11-29 | Mergenthaler Linotype Gmbh, 6236 Eschborn | Einstellbarer laserlicht-abschwaecher fuer typografische setz- und druckgeraete |
| ATE134927T1 (de) * | 1992-09-28 | 1996-03-15 | Schablonentechnik Kufstein Ag | Verfahren und vorrichtung zum gravieren von rundschablonen |
| JPH11258526A (ja) * | 1998-03-16 | 1999-09-24 | Hamamatsu Photonics Kk | 光量調整方法及びその装置 |
| AUPS023002A0 (en) | 2002-01-31 | 2002-02-21 | Q-Vis Limited | Variable attenuator |
| JP3655268B2 (ja) | 2002-08-26 | 2005-06-02 | 株式会社東芝 | 燃料電池発電プラント |
| JP4923615B2 (ja) | 2006-02-23 | 2012-04-25 | 旭硝子株式会社 | 光アイソレータおよび双方向光送受信装置 |
| CN203705729U (zh) * | 2014-01-28 | 2014-07-09 | 上海海固电器设备有限公司 | 激光偏振衰减器 |
| CN103984112A (zh) | 2014-04-23 | 2014-08-13 | 深圳市大族激光科技股份有限公司 | 反射式光学隔离器及采用该反射式光学隔离器的激光加工设备 |
-
2020
- 2020-07-21 JP JP2020124684A patent/JP7542352B2/ja active Active
-
2021
- 2021-04-19 KR KR1020227038238A patent/KR102946766B1/ko active Active
- 2021-04-19 CN CN202180060829.9A patent/CN116157224A/zh active Pending
- 2021-04-19 WO PCT/JP2021/015881 patent/WO2022018917A1/ja not_active Ceased
- 2021-04-19 US US18/010,272 patent/US20240033849A1/en active Pending
- 2021-04-19 EP EP21845529.3A patent/EP4113190A4/en active Pending
- 2021-04-30 TW TW110115747A patent/TWI888546B/zh active
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