KR102946766B1 - 어테뉴에이터 장치 및 레이저 가공 장치 - Google Patents

어테뉴에이터 장치 및 레이저 가공 장치

Info

Publication number
KR102946766B1
KR102946766B1 KR1020227038238A KR20227038238A KR102946766B1 KR 102946766 B1 KR102946766 B1 KR 102946766B1 KR 1020227038238 A KR1020227038238 A KR 1020227038238A KR 20227038238 A KR20227038238 A KR 20227038238A KR 102946766 B1 KR102946766 B1 KR 102946766B1
Authority
KR
South Korea
Prior art keywords
pair
windows
optical axis
window
laser light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020227038238A
Other languages
English (en)
Korean (ko)
Other versions
KR20230039597A (ko
Inventor
하루야스 이토
Original Assignee
하마마츠 포토닉스 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 하마마츠 포토닉스 가부시키가이샤 filed Critical 하마마츠 포토닉스 가부시키가이샤
Publication of KR20230039597A publication Critical patent/KR20230039597A/ko
Application granted granted Critical
Publication of KR102946766B1 publication Critical patent/KR102946766B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/023—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/281—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for attenuating light intensity, e.g. comprising rotatable polarising elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3066—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state involving the reflection of light at a particular angle of incidence, e.g. Brewster's angle
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Lasers (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
KR1020227038238A 2020-07-21 2021-04-19 어테뉴에이터 장치 및 레이저 가공 장치 Active KR102946766B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020124684A JP7542352B2 (ja) 2020-07-21 2020-07-21 アッテネータ装置及びレーザ加工装置
JPJP-P-2020-124684 2020-07-21
PCT/JP2021/015881 WO2022018917A1 (ja) 2020-07-21 2021-04-19 アッテネータ装置及びレーザ加工装置

Publications (2)

Publication Number Publication Date
KR20230039597A KR20230039597A (ko) 2023-03-21
KR102946766B1 true KR102946766B1 (ko) 2026-04-02

Family

ID=79729321

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227038238A Active KR102946766B1 (ko) 2020-07-21 2021-04-19 어테뉴에이터 장치 및 레이저 가공 장치

Country Status (7)

Country Link
US (1) US20240033849A1 (https=)
EP (1) EP4113190A4 (https=)
JP (1) JP7542352B2 (https=)
KR (1) KR102946766B1 (https=)
CN (1) CN116157224A (https=)
TW (1) TWI888546B (https=)
WO (1) WO2022018917A1 (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103984112A (zh) * 2014-04-23 2014-08-13 深圳市大族激光科技股份有限公司 反射式光学隔离器及采用该反射式光学隔离器的激光加工设备

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4916000Y1 (https=) * 1970-03-09 1974-04-22
US3655268A (en) 1970-06-01 1972-04-11 Sylvania Electric Prod Laser beam attenuator
DE3319151A1 (de) * 1983-05-26 1984-11-29 Mergenthaler Linotype Gmbh, 6236 Eschborn Einstellbarer laserlicht-abschwaecher fuer typografische setz- und druckgeraete
ATE134927T1 (de) * 1992-09-28 1996-03-15 Schablonentechnik Kufstein Ag Verfahren und vorrichtung zum gravieren von rundschablonen
JPH11258526A (ja) * 1998-03-16 1999-09-24 Hamamatsu Photonics Kk 光量調整方法及びその装置
AUPS023002A0 (en) 2002-01-31 2002-02-21 Q-Vis Limited Variable attenuator
JP3655268B2 (ja) 2002-08-26 2005-06-02 株式会社東芝 燃料電池発電プラント
JP4923615B2 (ja) 2006-02-23 2012-04-25 旭硝子株式会社 光アイソレータおよび双方向光送受信装置
CN203705729U (zh) * 2014-01-28 2014-07-09 上海海固电器设备有限公司 激光偏振衰减器

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103984112A (zh) * 2014-04-23 2014-08-13 深圳市大族激光科技股份有限公司 反射式光学隔离器及采用该反射式光学隔离器的激光加工设备

Also Published As

Publication number Publication date
TW202205766A (zh) 2022-02-01
TWI888546B (zh) 2025-07-01
WO2022018917A1 (ja) 2022-01-27
KR20230039597A (ko) 2023-03-21
CN116157224A (zh) 2023-05-23
JP7542352B2 (ja) 2024-08-30
EP4113190A1 (en) 2023-01-04
JP2022021215A (ja) 2022-02-02
US20240033849A1 (en) 2024-02-01
EP4113190A4 (en) 2024-04-10

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