CN116157224A - 衰减器装置及激光加工装置 - Google Patents

衰减器装置及激光加工装置 Download PDF

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Publication number
CN116157224A
CN116157224A CN202180060829.9A CN202180060829A CN116157224A CN 116157224 A CN116157224 A CN 116157224A CN 202180060829 A CN202180060829 A CN 202180060829A CN 116157224 A CN116157224 A CN 116157224A
Authority
CN
China
Prior art keywords
pair
windows
optical axis
laser light
window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202180060829.9A
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English (en)
Chinese (zh)
Inventor
伊藤晴康
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hamamatsu Photonics KK
Original Assignee
Hamamatsu Photonics KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics KK filed Critical Hamamatsu Photonics KK
Publication of CN116157224A publication Critical patent/CN116157224A/zh
Pending legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0648Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/023Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/281Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for attenuating light intensity, e.g. comprising rotatable polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3066Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state involving the reflection of light at a particular angle of incidence, e.g. Brewster's angle
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3083Birefringent or phase retarding elements

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Lasers (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
CN202180060829.9A 2020-07-21 2021-04-19 衰减器装置及激光加工装置 Pending CN116157224A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020124684A JP7542352B2 (ja) 2020-07-21 2020-07-21 アッテネータ装置及びレーザ加工装置
JP2020-124684 2020-07-21
PCT/JP2021/015881 WO2022018917A1 (ja) 2020-07-21 2021-04-19 アッテネータ装置及びレーザ加工装置

Publications (1)

Publication Number Publication Date
CN116157224A true CN116157224A (zh) 2023-05-23

Family

ID=79729321

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180060829.9A Pending CN116157224A (zh) 2020-07-21 2021-04-19 衰减器装置及激光加工装置

Country Status (7)

Country Link
US (1) US20240033849A1 (https=)
EP (1) EP4113190A4 (https=)
JP (1) JP7542352B2 (https=)
KR (1) KR102946766B1 (https=)
CN (1) CN116157224A (https=)
TW (1) TWI888546B (https=)
WO (1) WO2022018917A1 (https=)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4916000Y1 (https=) * 1970-03-09 1974-04-22
US3655268A (en) 1970-06-01 1972-04-11 Sylvania Electric Prod Laser beam attenuator
DE3319151A1 (de) * 1983-05-26 1984-11-29 Mergenthaler Linotype Gmbh, 6236 Eschborn Einstellbarer laserlicht-abschwaecher fuer typografische setz- und druckgeraete
ATE134927T1 (de) * 1992-09-28 1996-03-15 Schablonentechnik Kufstein Ag Verfahren und vorrichtung zum gravieren von rundschablonen
JPH11258526A (ja) * 1998-03-16 1999-09-24 Hamamatsu Photonics Kk 光量調整方法及びその装置
AUPS023002A0 (en) 2002-01-31 2002-02-21 Q-Vis Limited Variable attenuator
JP3655268B2 (ja) 2002-08-26 2005-06-02 株式会社東芝 燃料電池発電プラント
JP4923615B2 (ja) 2006-02-23 2012-04-25 旭硝子株式会社 光アイソレータおよび双方向光送受信装置
CN203705729U (zh) * 2014-01-28 2014-07-09 上海海固电器设备有限公司 激光偏振衰减器
CN103984112A (zh) 2014-04-23 2014-08-13 深圳市大族激光科技股份有限公司 反射式光学隔离器及采用该反射式光学隔离器的激光加工设备

Also Published As

Publication number Publication date
TW202205766A (zh) 2022-02-01
TWI888546B (zh) 2025-07-01
WO2022018917A1 (ja) 2022-01-27
KR20230039597A (ko) 2023-03-21
JP7542352B2 (ja) 2024-08-30
EP4113190A1 (en) 2023-01-04
JP2022021215A (ja) 2022-02-02
US20240033849A1 (en) 2024-02-01
EP4113190A4 (en) 2024-04-10
KR102946766B1 (ko) 2026-04-02

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