JP7542352B2 - アッテネータ装置及びレーザ加工装置 - Google Patents

アッテネータ装置及びレーザ加工装置 Download PDF

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Publication number
JP7542352B2
JP7542352B2 JP2020124684A JP2020124684A JP7542352B2 JP 7542352 B2 JP7542352 B2 JP 7542352B2 JP 2020124684 A JP2020124684 A JP 2020124684A JP 2020124684 A JP2020124684 A JP 2020124684A JP 7542352 B2 JP7542352 B2 JP 7542352B2
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Japan
Prior art keywords
pair
window
optical axis
window pair
laser light
Prior art date
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Application number
JP2020124684A
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English (en)
Japanese (ja)
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JP2022021215A5 (https=
JP2022021215A (ja
Inventor
晴康 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hamamatsu Photonics KK
Original Assignee
Hamamatsu Photonics KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2020124684A priority Critical patent/JP7542352B2/ja
Application filed by Hamamatsu Photonics KK filed Critical Hamamatsu Photonics KK
Priority to US18/010,272 priority patent/US20240033849A1/en
Priority to KR1020227038238A priority patent/KR102946766B1/ko
Priority to CN202180060829.9A priority patent/CN116157224A/zh
Priority to EP21845529.3A priority patent/EP4113190A4/en
Priority to PCT/JP2021/015881 priority patent/WO2022018917A1/ja
Priority to TW110115747A priority patent/TWI888546B/zh
Publication of JP2022021215A publication Critical patent/JP2022021215A/ja
Publication of JP2022021215A5 publication Critical patent/JP2022021215A5/ja
Application granted granted Critical
Publication of JP7542352B2 publication Critical patent/JP7542352B2/ja
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/023—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/281—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for attenuating light intensity, e.g. comprising rotatable polarising elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3066—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state involving the reflection of light at a particular angle of incidence, e.g. Brewster's angle
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Lasers (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
JP2020124684A 2020-07-21 2020-07-21 アッテネータ装置及びレーザ加工装置 Active JP7542352B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2020124684A JP7542352B2 (ja) 2020-07-21 2020-07-21 アッテネータ装置及びレーザ加工装置
KR1020227038238A KR102946766B1 (ko) 2020-07-21 2021-04-19 어테뉴에이터 장치 및 레이저 가공 장치
CN202180060829.9A CN116157224A (zh) 2020-07-21 2021-04-19 衰减器装置及激光加工装置
EP21845529.3A EP4113190A4 (en) 2020-07-21 2021-04-19 DAMPING DEVICE AND LASER PROCESSING DEVICE
US18/010,272 US20240033849A1 (en) 2020-07-21 2021-04-19 Attenuator device and laser processing apparatus
PCT/JP2021/015881 WO2022018917A1 (ja) 2020-07-21 2021-04-19 アッテネータ装置及びレーザ加工装置
TW110115747A TWI888546B (zh) 2020-07-21 2021-04-30 衰減器裝置及雷射加工裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020124684A JP7542352B2 (ja) 2020-07-21 2020-07-21 アッテネータ装置及びレーザ加工装置

Publications (3)

Publication Number Publication Date
JP2022021215A JP2022021215A (ja) 2022-02-02
JP2022021215A5 JP2022021215A5 (https=) 2023-03-28
JP7542352B2 true JP7542352B2 (ja) 2024-08-30

Family

ID=79729321

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020124684A Active JP7542352B2 (ja) 2020-07-21 2020-07-21 アッテネータ装置及びレーザ加工装置

Country Status (7)

Country Link
US (1) US20240033849A1 (https=)
EP (1) EP4113190A4 (https=)
JP (1) JP7542352B2 (https=)
KR (1) KR102946766B1 (https=)
CN (1) CN116157224A (https=)
TW (1) TWI888546B (https=)
WO (1) WO2022018917A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060013271A1 (en) 2002-01-31 2006-01-19 Q-Vis Limited Variable attenuator
JP2007225905A (ja) 2006-02-23 2007-09-06 Asahi Glass Co Ltd 光アイソレータおよび双方向光送受信装置
CN103984112A (zh) 2014-04-23 2014-08-13 深圳市大族激光科技股份有限公司 反射式光学隔离器及采用该反射式光学隔离器的激光加工设备

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4916000Y1 (https=) * 1970-03-09 1974-04-22
US3655268A (en) 1970-06-01 1972-04-11 Sylvania Electric Prod Laser beam attenuator
DE3319151A1 (de) * 1983-05-26 1984-11-29 Mergenthaler Linotype Gmbh, 6236 Eschborn Einstellbarer laserlicht-abschwaecher fuer typografische setz- und druckgeraete
ATE134927T1 (de) * 1992-09-28 1996-03-15 Schablonentechnik Kufstein Ag Verfahren und vorrichtung zum gravieren von rundschablonen
JPH11258526A (ja) * 1998-03-16 1999-09-24 Hamamatsu Photonics Kk 光量調整方法及びその装置
JP3655268B2 (ja) 2002-08-26 2005-06-02 株式会社東芝 燃料電池発電プラント
CN203705729U (zh) * 2014-01-28 2014-07-09 上海海固电器设备有限公司 激光偏振衰减器

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060013271A1 (en) 2002-01-31 2006-01-19 Q-Vis Limited Variable attenuator
JP2007225905A (ja) 2006-02-23 2007-09-06 Asahi Glass Co Ltd 光アイソレータおよび双方向光送受信装置
CN103984112A (zh) 2014-04-23 2014-08-13 深圳市大族激光科技股份有限公司 反射式光学隔离器及采用该反射式光学隔离器的激光加工设备

Also Published As

Publication number Publication date
TW202205766A (zh) 2022-02-01
TWI888546B (zh) 2025-07-01
WO2022018917A1 (ja) 2022-01-27
KR20230039597A (ko) 2023-03-21
CN116157224A (zh) 2023-05-23
EP4113190A1 (en) 2023-01-04
JP2022021215A (ja) 2022-02-02
US20240033849A1 (en) 2024-02-01
EP4113190A4 (en) 2024-04-10
KR102946766B1 (ko) 2026-04-02

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