JPWO2021193516A5 - - Google Patents

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Publication number
JPWO2021193516A5
JPWO2021193516A5 JP2022510471A JP2022510471A JPWO2021193516A5 JP WO2021193516 A5 JPWO2021193516 A5 JP WO2021193516A5 JP 2022510471 A JP2022510471 A JP 2022510471A JP 2022510471 A JP2022510471 A JP 2022510471A JP WO2021193516 A5 JPWO2021193516 A5 JP WO2021193516A5
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JP
Japan
Prior art keywords
semiconductor substrate
based adhesives
adhesive
formula
cleaning
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JP2022510471A
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English (en)
Japanese (ja)
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JPWO2021193516A1 (https=
JP7640939B2 (ja
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Priority claimed from PCT/JP2021/011675 external-priority patent/WO2021193516A1/ja
Publication of JPWO2021193516A1 publication Critical patent/JPWO2021193516A1/ja
Publication of JPWO2021193516A5 publication Critical patent/JPWO2021193516A5/ja
Application granted granted Critical
Publication of JP7640939B2 publication Critical patent/JP7640939B2/ja
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JP2022510471A 2020-03-23 2021-03-22 半導体基板の洗浄方法、加工された半導体基板の製造方法及び剥離用組成物 Active JP7640939B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020050954 2020-03-23
JP2020050954 2020-03-23
PCT/JP2021/011675 WO2021193516A1 (ja) 2020-03-23 2021-03-22 半導体基板の洗浄方法、加工された半導体基板の製造方法及び剥離用組成物

Publications (3)

Publication Number Publication Date
JPWO2021193516A1 JPWO2021193516A1 (https=) 2021-09-30
JPWO2021193516A5 true JPWO2021193516A5 (https=) 2022-12-27
JP7640939B2 JP7640939B2 (ja) 2025-03-06

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ID=77891840

Family Applications (1)

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JP2022510471A Active JP7640939B2 (ja) 2020-03-23 2021-03-22 半導体基板の洗浄方法、加工された半導体基板の製造方法及び剥離用組成物

Country Status (6)

Country Link
EP (1) EP4131344A4 (https=)
JP (1) JP7640939B2 (https=)
KR (1) KR20220161345A (https=)
CN (1) CN115335970B (https=)
TW (1) TWI910138B (https=)
WO (1) WO2021193516A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4535403A4 (en) * 2022-06-02 2026-05-06 Nissan Chemical Corp Photoradiation-releasable adhesive composition, laminate, and method for producing processed semiconductor substrate

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100271768B1 (ko) * 1998-06-26 2001-02-01 윤종용 반도체 포토레지스트제거용 용제조성물, 이를 이용한 반도체장치 제조용 웨이퍼의 리워크방법 및 반도체장치의 제조방법
US6818608B2 (en) 2002-02-01 2004-11-16 John C. Moore Cured polymers dissolving compositions
JP5010668B2 (ja) * 2009-12-03 2012-08-29 信越化学工業株式会社 積層型半導体集積装置の製造方法
KR20120132624A (ko) 2010-02-12 2012-12-06 다우 코닝 코포레이션 반도체 가공을 위한 임시 웨이퍼 접합 방법
JP5767159B2 (ja) * 2012-04-27 2015-08-19 信越化学工業株式会社 ウエハ加工体、ウエハ加工用部材、ウエハ加工用仮接着材、及び薄型ウエハの製造方法
JP2014133855A (ja) 2012-12-11 2014-07-24 Fujifilm Corp シロキサン樹脂の除去剤、それを用いたシロキサン樹脂の除去方法並びに半導体基板製品及び半導体素子の製造方法
JP6224509B2 (ja) 2013-05-14 2017-11-01 信越化学工業株式会社 ウエハ用仮接着材料、それらを用いた仮接着用フィルム、及びウエハ加工体並びにそれらを使用した薄型ウエハの製造方法
JP5775231B1 (ja) * 2013-12-16 2015-09-09 モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 付加硬化型シリコーン組成物
JP6583639B2 (ja) 2014-06-10 2019-10-02 日産化学株式会社 仮接着剤を用いた積層体
JP6450451B2 (ja) * 2015-03-23 2019-01-09 富士フイルム株式会社 キットおよび積層体
KR102636988B1 (ko) 2016-12-09 2024-02-15 동우 화인켐 주식회사 경화 고분자 세정액 조성물
KR102680736B1 (ko) * 2016-12-14 2024-07-03 삼성전자주식회사 기판 가공 방법 및 접착층 세정 조성물
WO2021193519A1 (ja) * 2020-03-23 2021-09-30 日産化学株式会社 半導体基板の洗浄方法、加工された半導体基板の製造方法及び剥離用組成物

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