JP2005528234A5 - - Google Patents

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Publication number
JP2005528234A5
JP2005528234A5 JP2004509589A JP2004509589A JP2005528234A5 JP 2005528234 A5 JP2005528234 A5 JP 2005528234A5 JP 2004509589 A JP2004509589 A JP 2004509589A JP 2004509589 A JP2004509589 A JP 2004509589A JP 2005528234 A5 JP2005528234 A5 JP 2005528234A5
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JP
Japan
Prior art keywords
silicon substrate
integer
composition
providing
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004509589A
Other languages
English (en)
Japanese (ja)
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JP2005528234A (ja
Filing date
Publication date
Priority claimed from US10/160,738 external-priority patent/US6841079B2/en
Application filed filed Critical
Publication of JP2005528234A publication Critical patent/JP2005528234A/ja
Publication of JP2005528234A5 publication Critical patent/JP2005528234A5/ja
Pending legal-status Critical Current

Links

JP2004509589A 2002-05-31 2003-04-01 シリコン物品のフルオロケミカル処理 Pending JP2005528234A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/160,738 US6841079B2 (en) 2002-05-31 2002-05-31 Fluorochemical treatment for silicon articles
PCT/US2003/009894 WO2003101888A2 (en) 2002-05-31 2003-04-01 Fluorochemical treatment for silicon articles

Publications (2)

Publication Number Publication Date
JP2005528234A JP2005528234A (ja) 2005-09-22
JP2005528234A5 true JP2005528234A5 (https=) 2006-05-25

Family

ID=29709726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004509589A Pending JP2005528234A (ja) 2002-05-31 2003-04-01 シリコン物品のフルオロケミカル処理

Country Status (7)

Country Link
US (1) US6841079B2 (https=)
EP (1) EP1513763A2 (https=)
JP (1) JP2005528234A (https=)
CN (1) CN1314693C (https=)
AU (1) AU2003226168A1 (https=)
CA (1) CA2487715A1 (https=)
WO (1) WO2003101888A2 (https=)

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US9290380B2 (en) 2012-12-18 2016-03-22 Freescale Semiconductor, Inc. Reducing MEMS stiction by deposition of nanoclusters
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CA3029244A1 (en) 2016-07-05 2018-01-11 Kratos LLC Passivated pre-lithiated micron and sub-micron group iva particles and methods of preparation thereof
CN110475602B (zh) 2016-11-17 2022-05-03 特拉波雷技术有限公司 含有高分子量亲水性添加剂的均孔自组装嵌段共聚物膜及其制备方法
KR102308806B1 (ko) 2017-02-22 2021-10-07 테라포어 테크놀로지스, 인코포레이티드 리간드 결합 mbp 멤브레인, 사용 및 제조방법
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