JPWO2021193480A5 - - Google Patents

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Publication number
JPWO2021193480A5
JPWO2021193480A5 JP2022510455A JP2022510455A JPWO2021193480A5 JP WO2021193480 A5 JPWO2021193480 A5 JP WO2021193480A5 JP 2022510455 A JP2022510455 A JP 2022510455A JP 2022510455 A JP2022510455 A JP 2022510455A JP WO2021193480 A5 JPWO2021193480 A5 JP WO2021193480A5
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JP
Japan
Prior art keywords
gas supply
gas
processing chamber
pipe
flow rate
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JP2022510455A
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English (en)
Japanese (ja)
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JP7329679B2 (ja
JPWO2021193480A1 (https=
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Priority claimed from PCT/JP2021/011557 external-priority patent/WO2021193480A1/ja
Publication of JPWO2021193480A1 publication Critical patent/JPWO2021193480A1/ja
Publication of JPWO2021193480A5 publication Critical patent/JPWO2021193480A5/ja
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Publication of JP7329679B2 publication Critical patent/JP7329679B2/ja
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JP2022510455A 2020-03-26 2021-03-21 基板処理装置、半導体装置の製造方法およびプログラム Active JP7329679B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020056120 2020-03-26
JP2020056120 2020-03-26
PCT/JP2021/011557 WO2021193480A1 (ja) 2020-03-26 2021-03-21 基板処理装置、半導体装置の製造方法およびプログラム

Publications (3)

Publication Number Publication Date
JPWO2021193480A1 JPWO2021193480A1 (https=) 2021-09-30
JPWO2021193480A5 true JPWO2021193480A5 (https=) 2022-11-22
JP7329679B2 JP7329679B2 (ja) 2023-08-18

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ID=77891776

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Application Number Title Priority Date Filing Date
JP2022510455A Active JP7329679B2 (ja) 2020-03-26 2021-03-21 基板処理装置、半導体装置の製造方法およびプログラム

Country Status (2)

Country Link
JP (1) JP7329679B2 (https=)
WO (1) WO2021193480A1 (https=)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4543848B2 (ja) * 2004-09-17 2010-09-15 東京エレクトロン株式会社 半導体製造装置及びそのメンテナンス方法
JP5305328B2 (ja) * 2007-06-07 2013-10-02 株式会社日立国際電気 基板処理装置
JP6415730B2 (ja) * 2015-08-26 2018-10-31 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 半導体装置の製造方法、基板処理装置およびプログラム

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