JPWO2021157440A1 - - Google Patents

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Publication number
JPWO2021157440A1
JPWO2021157440A1 JP2021575745A JP2021575745A JPWO2021157440A1 JP WO2021157440 A1 JPWO2021157440 A1 JP WO2021157440A1 JP 2021575745 A JP2021575745 A JP 2021575745A JP 2021575745 A JP2021575745 A JP 2021575745A JP WO2021157440 A1 JPWO2021157440 A1 JP WO2021157440A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021575745A
Other languages
Japanese (ja)
Other versions
JP7305807B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021157440A1 publication Critical patent/JPWO2021157440A1/ja
Priority to JP2023105696A priority Critical patent/JP7580534B2/ja
Application granted granted Critical
Publication of JP7305807B2 publication Critical patent/JP7305807B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/62—Regenerating the filter material in the filter
    • B01D29/66—Regenerating the filter material in the filter by flushing, e.g. counter-current air-bumps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14—Removing waste, e.g. labels, from cleaning liquid
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/007—Heating the liquid
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2021575745A 2020-02-05 2021-01-27 フィルタ洗浄システムおよびフィルタ洗浄方法 Active JP7305807B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023105696A JP7580534B2 (ja) 2020-02-05 2023-06-28 フィルタ洗浄システム、フィルタ洗浄方法および減圧機構

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020018170 2020-02-05
JP2020018170 2020-02-05
PCT/JP2021/002751 WO2021157440A1 (ja) 2020-02-05 2021-01-27 フィルタ洗浄システムおよびフィルタ洗浄方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023105696A Division JP7580534B2 (ja) 2020-02-05 2023-06-28 フィルタ洗浄システム、フィルタ洗浄方法および減圧機構

Publications (2)

Publication Number Publication Date
JPWO2021157440A1 true JPWO2021157440A1 (https=) 2021-08-12
JP7305807B2 JP7305807B2 (ja) 2023-07-10

Family

ID=77200558

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2021575745A Active JP7305807B2 (ja) 2020-02-05 2021-01-27 フィルタ洗浄システムおよびフィルタ洗浄方法
JP2023105696A Active JP7580534B2 (ja) 2020-02-05 2023-06-28 フィルタ洗浄システム、フィルタ洗浄方法および減圧機構

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023105696A Active JP7580534B2 (ja) 2020-02-05 2023-06-28 フィルタ洗浄システム、フィルタ洗浄方法および減圧機構

Country Status (5)

Country Link
US (1) US12427551B2 (https=)
JP (2) JP7305807B2 (https=)
KR (2) KR102918884B1 (https=)
CN (1) CN115039205A (https=)
WO (1) WO2021157440A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7526237B2 (ja) 2022-09-15 2024-07-31 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置、および、フィルタの気泡除去方法
JP2025047775A (ja) * 2023-09-21 2025-04-03 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013175552A (ja) * 2012-02-24 2013-09-05 Tokyo Electron Ltd 処理液交換方法および基板処理装置
JP2015088719A (ja) * 2013-09-27 2015-05-07 東京エレクトロン株式会社 フィルタユニットの前処理方法、処理液供給装置、フィルタユニットの加熱装置及び処理液供給路の前処理方法
JP2015103662A (ja) * 2013-11-25 2015-06-04 東京エレクトロン株式会社 フィルタ洗浄方法、液処理装置及び記憶媒体
JP2015220374A (ja) * 2014-05-19 2015-12-07 東京エレクトロン株式会社 処理液交換方法および液処理装置
JP2017055023A (ja) * 2015-09-11 2017-03-16 東京エレクトロン株式会社 基板液処理装置及び流路洗浄方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3654148A (en) * 1970-09-28 1972-04-04 Puredesal Inc Liquid purification system
US4254699A (en) * 1977-12-22 1981-03-10 Frito-Lay, Inc. Liquid-solid contacting apparatus
US4381703A (en) * 1982-02-12 1983-05-03 Frito-Lay, Inc. Vertical soak tank with improved levelling and weighing apparatus
US5035799A (en) * 1989-08-21 1991-07-30 Clear Flow, Inc. Filter assembly
US5498349A (en) * 1993-02-08 1996-03-12 Kabushiki Kaisha Sanshin Seisakusho Filtration concentration apparatus and method
AUPM800694A0 (en) * 1994-09-09 1994-10-06 Memtec Limited Cleaning of hollow fibre membranes
US6280300B1 (en) * 1998-11-25 2001-08-28 Ebara Corporation Filter apparatus
JP2010021215A (ja) * 2008-07-08 2010-01-28 Toshiba Corp 洗浄システム及び洗浄液循環方法
KR101485275B1 (ko) * 2011-02-18 2015-01-21 오르가노 코포레이션 필터의 청정화 방법, 및 피처리체의 세정 또는 건조 방법
JP5835929B2 (ja) 2011-04-15 2015-12-24 株式会社キッツマイクロフィルター 半導体製造用薬液のマイクロバブル低減用ろ過システムとそのろ過方法
JP5910401B2 (ja) * 2012-08-03 2016-04-27 東京エレクトロン株式会社 処理液供給装置の運転方法、処理液供給装置及び記憶媒体
JP5741549B2 (ja) * 2012-10-09 2015-07-01 東京エレクトロン株式会社 処理液供給方法、処理液供給装置及び記憶媒体
JP6278808B2 (ja) * 2014-04-10 2018-02-14 東京エレクトロン株式会社 液供給装置およびフィルタ洗浄方法
JP6762378B2 (ja) * 2017-01-04 2020-09-30 東京エレクトロン株式会社 基板洗浄方法、基板洗浄システムおよび記憶媒体
JP6965935B2 (ja) * 2017-09-29 2021-11-10 日本電気株式会社 クロスフロー濾過装置、クロスフロー濾過方法
JP6933960B2 (ja) * 2017-11-15 2021-09-08 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013175552A (ja) * 2012-02-24 2013-09-05 Tokyo Electron Ltd 処理液交換方法および基板処理装置
JP2015088719A (ja) * 2013-09-27 2015-05-07 東京エレクトロン株式会社 フィルタユニットの前処理方法、処理液供給装置、フィルタユニットの加熱装置及び処理液供給路の前処理方法
JP2015103662A (ja) * 2013-11-25 2015-06-04 東京エレクトロン株式会社 フィルタ洗浄方法、液処理装置及び記憶媒体
JP2015220374A (ja) * 2014-05-19 2015-12-07 東京エレクトロン株式会社 処理液交換方法および液処理装置
JP2017055023A (ja) * 2015-09-11 2017-03-16 東京エレクトロン株式会社 基板液処理装置及び流路洗浄方法

Also Published As

Publication number Publication date
US12427551B2 (en) 2025-09-30
WO2021157440A1 (ja) 2021-08-12
TW202135914A (zh) 2021-10-01
JP2023115235A (ja) 2023-08-18
US20230091875A1 (en) 2023-03-23
CN115039205A (zh) 2022-09-09
KR20220137671A (ko) 2022-10-12
JP7580534B2 (ja) 2024-11-11
KR102918884B1 (ko) 2026-01-27
KR20260006700A (ko) 2026-01-13
JP7305807B2 (ja) 2023-07-10

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