JPWO2021182064A1 - - Google Patents

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Publication number
JPWO2021182064A1
JPWO2021182064A1 JP2022505882A JP2022505882A JPWO2021182064A1 JP WO2021182064 A1 JPWO2021182064 A1 JP WO2021182064A1 JP 2022505882 A JP2022505882 A JP 2022505882A JP 2022505882 A JP2022505882 A JP 2022505882A JP WO2021182064 A1 JPWO2021182064 A1 JP WO2021182064A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022505882A
Other languages
Japanese (ja)
Other versions
JP7390470B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021182064A1 publication Critical patent/JPWO2021182064A1/ja
Application granted granted Critical
Publication of JP7390470B2 publication Critical patent/JP7390470B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06—Organic material
    • B01D71/26—Polyalkenes
    • B01D71/262—Polypropylene
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B01D61/22—Controlling or regulating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06—Organic material
    • B01D71/26—Polyalkenes
    • B01D71/261—Polyethylene
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06—Organic material
    • B01D71/30—Polyalkenyl halides
    • B01D71/32—Polyalkenyl halides containing fluorine atoms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06—Organic material
    • B01D71/56—Polyamides, e.g. polyester-amides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Water Supply & Treatment (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2022505882A 2020-03-12 2021-02-18 薬液の精製方法、薬液の製造方法、薬液 Active JP7390470B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020042604 2020-03-12
JP2020042604 2020-03-12
PCT/JP2021/006184 WO2021182064A1 (ja) 2020-03-12 2021-02-18 薬液の精製方法、薬液の製造方法、薬液

Publications (2)

Publication Number Publication Date
JPWO2021182064A1 true JPWO2021182064A1 (https=) 2021-09-16
JP7390470B2 JP7390470B2 (ja) 2023-12-01

Family

ID=77671670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022505882A Active JP7390470B2 (ja) 2020-03-12 2021-02-18 薬液の精製方法、薬液の製造方法、薬液

Country Status (2)

Country Link
JP (1) JP7390470B2 (https=)
WO (1) WO2021182064A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025047775A (ja) * 2023-09-21 2025-04-03 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003251154A (ja) * 2002-02-28 2003-09-09 Nitto Denko Corp ベッセル、膜モジュールおよびその運転方法
JP2013061426A (ja) * 2011-09-12 2013-04-04 Nomura Micro Sci Co Ltd フォトレジスト膜形成用樹脂溶液の不純物除去方法、不純物除去用濾過部材及び不純物除去用濾過装置
JP2015147187A (ja) * 2014-02-07 2015-08-20 東レ株式会社 ナノ材料の分離方法
JP2016155121A (ja) * 2015-02-23 2016-09-01 東京応化工業株式会社 液体の精製方法、薬液又は洗浄液の製造方法、フィルターメディア、及び、フィルターデバイス
JP2016179417A (ja) * 2015-03-23 2016-10-13 日本碍子株式会社 分離方法及び分離装置
WO2018043697A1 (ja) * 2016-09-02 2018-03-08 富士フイルム株式会社 有機溶剤の精製方法および有機溶剤の精製装置
JP2018060193A (ja) * 2016-09-30 2018-04-12 富士フイルム株式会社 パターン形成方法、電子デバイスの製造方法、キット
JP2018064093A (ja) * 2016-09-30 2018-04-19 富士フイルム株式会社 半導体チップの製造方法、キット
WO2018180735A1 (ja) * 2017-03-31 2018-10-04 富士フイルム株式会社 薬液の精製方法、薬液の製造方法、及び、薬液
JP2019150823A (ja) * 2017-03-31 2019-09-12 日本碍子株式会社 ゼオライト膜複合体、および、ゼオライト膜複合体の製造方法

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003251154A (ja) * 2002-02-28 2003-09-09 Nitto Denko Corp ベッセル、膜モジュールおよびその運転方法
JP2013061426A (ja) * 2011-09-12 2013-04-04 Nomura Micro Sci Co Ltd フォトレジスト膜形成用樹脂溶液の不純物除去方法、不純物除去用濾過部材及び不純物除去用濾過装置
JP2015147187A (ja) * 2014-02-07 2015-08-20 東レ株式会社 ナノ材料の分離方法
JP2016155121A (ja) * 2015-02-23 2016-09-01 東京応化工業株式会社 液体の精製方法、薬液又は洗浄液の製造方法、フィルターメディア、及び、フィルターデバイス
JP2016179417A (ja) * 2015-03-23 2016-10-13 日本碍子株式会社 分離方法及び分離装置
WO2018043697A1 (ja) * 2016-09-02 2018-03-08 富士フイルム株式会社 有機溶剤の精製方法および有機溶剤の精製装置
JP2018060193A (ja) * 2016-09-30 2018-04-12 富士フイルム株式会社 パターン形成方法、電子デバイスの製造方法、キット
JP2018064093A (ja) * 2016-09-30 2018-04-19 富士フイルム株式会社 半導体チップの製造方法、キット
WO2018180735A1 (ja) * 2017-03-31 2018-10-04 富士フイルム株式会社 薬液の精製方法、薬液の製造方法、及び、薬液
JP2019150823A (ja) * 2017-03-31 2019-09-12 日本碍子株式会社 ゼオライト膜複合体、および、ゼオライト膜複合体の製造方法

Also Published As

Publication number Publication date
JP7390470B2 (ja) 2023-12-01
WO2021182064A1 (ja) 2021-09-16

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