WO2021157440A1 - フィルタ洗浄システムおよびフィルタ洗浄方法 - Google Patents

フィルタ洗浄システムおよびフィルタ洗浄方法 Download PDF

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Publication number
WO2021157440A1
WO2021157440A1 PCT/JP2021/002751 JP2021002751W WO2021157440A1 WO 2021157440 A1 WO2021157440 A1 WO 2021157440A1 JP 2021002751 W JP2021002751 W JP 2021002751W WO 2021157440 A1 WO2021157440 A1 WO 2021157440A1
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WO
WIPO (PCT)
Prior art keywords
liquid
filter
path
storage unit
stored
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2021/002751
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English (en)
French (fr)
Japanese (ja)
Inventor
優樹 大塚
篤史 穴本
洋司 小宮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
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Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to KR1020257042871A priority Critical patent/KR20260006700A/ko
Priority to US17/796,014 priority patent/US12427551B2/en
Priority to CN202180011726.3A priority patent/CN115039205A/zh
Priority to JP2021575745A priority patent/JP7305807B2/ja
Priority to KR1020227029161A priority patent/KR102918884B1/ko
Publication of WO2021157440A1 publication Critical patent/WO2021157440A1/ja
Anticipated expiration legal-status Critical
Priority to JP2023105696A priority patent/JP7580534B2/ja
Ceased legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/62—Regenerating the filter material in the filter
    • B01D29/66—Regenerating the filter material in the filter by flushing, e.g. counter-current air-bumps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14—Removing waste, e.g. labels, from cleaning liquid
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/007—Heating the liquid
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment

Definitions

  • This disclosure relates to a filter cleaning system and a filter cleaning method.
  • a substrate liquid processing apparatus that performs liquid treatment on a substrate such as a semiconductor wafer has a filter in a processing liquid supply path in order to remove foreign substances contained in the processing liquid.
  • Patent Document 1 discloses a method of cleaning the supply path and the filter by alternately supplying high-temperature pure water and low-temperature pure water to the supply path.
  • the present disclosure provides a technique capable of effectively cleaning a filter before it is used in a substrate liquid treatment apparatus.
  • the filter cleaning system includes a storage unit, a liquid supply passage, a circulation passage, a first supply unit, and a second supply unit.
  • the storage unit stores the liquid that is passed through the filter.
  • the liquid feed path sends the liquid stored in the reservoir to the filter.
  • the circulation path returns the liquid delivered from the filter to the reservoir.
  • the first supply unit supplies the first liquid to the storage unit.
  • the second supply unit supplies the storage unit with a second liquid having a lower surface tension than the first liquid and having an affinity with the first liquid.
  • FIG. 1 is a diagram showing a configuration of a filter cleaning system according to an embodiment.
  • FIG. 2 is a diagram showing an example of the configuration of the filter and the decompression mechanism.
  • FIG. 3 is a graph showing the relationship between the washable range of the first liquid and the washable range of the second liquid.
  • FIG. 4 is a flowchart showing a procedure of processing executed by the filter cleaning system according to the first embodiment.
  • FIG. 5 is an explanatory diagram of the first IPA wetting process.
  • FIG. 6 is an explanatory diagram of the first IPA wetting process.
  • FIG. 7 is an explanatory diagram of the first IPA wetting process.
  • FIG. 8 is an explanatory diagram of the first DIW replacement process.
  • FIG. 9 is an explanatory diagram of the first DIW replacement process.
  • FIG. 10 is an explanatory diagram of the HDIW cleaning process.
  • FIG. 11 is a diagram showing a configuration of a filter cleaning system according to a second embodiment.
  • FIG. 1 is a diagram showing a configuration of a filter cleaning system according to an embodiment.
  • FIG. 2 is a diagram showing an example of the configuration of the filter and the decompression mechanism.
  • the filter cleaning system 1 cleans the filter 100.
  • the filter 100 is a new product (unused product).
  • the new filter 100 Before the operation of the substrate liquid treatment apparatus on which the filter 100 is mounted, the new filter 100 is in a state in which the filtration membrane 110 (see FIG. 2) provided inside the filter 100 is sufficiently wetted so that the liquid can flow appropriately. There is a need to.
  • the filter 100 does not necessarily have to be new, and may be, for example, a filter 100 that has been used in the past in another substrate liquid treatment apparatus (reused product).
  • the filter cleaning system 1 includes a storage unit 2, a liquid supply passage 3, a circulation passage 4, a first supply unit 5, a second supply unit 6, a decompression mechanism 7, and a control device. 8 and is included.
  • the filter cleaning system 1 may include the filter 100. Further, the filter cleaning system 1 may be a part of the substrate liquid processing apparatus.
  • the storage unit 2 is, for example, a tank, and stores the liquid to be passed through the filter 100.
  • the liquid feeding path 3 is a conduit connecting the primary side of the filter 100 and the storage section 2. Specifically, one end of the liquid feeding path 3 is connected to the bottom of the storage unit 2, and the other end is connected to the introduction port 120 (see FIG. 2) provided on the primary side of the filter 100.
  • the liquid feeding path 3 is provided with a valve 201 that opens and closes the liquid feeding path 3.
  • the primary side of the filter 100 refers to a portion of the filter 100 upstream of the filtration membrane 110.
  • a bypass path 31 is provided in the liquid delivery path 3.
  • One end of the bypass path 31 is connected to the liquid supply path 3 on the upstream side of the valve 201, and the other end is connected to the liquid supply path 3 on the downstream side of the valve 201.
  • the bypass path 31 is provided with a pump 311, a heating unit 312 for heating the liquid flowing through the bypass path 31, and a valve 202 for opening and closing the bypass path 31.
  • a drain path 32 is connected to the liquid supply path 3.
  • the drain path 32 is connected to the liquid supply path 3 on the upstream side of the bypass path 31.
  • the drain path 32 is provided with a valve 203 that opens and closes the drain path 32.
  • the drain path 32 is used, for example, when draining the liquid inside the filter 100.
  • the circulation path 4 is a pipeline connecting the secondary side of the filter 100 and the storage unit 2.
  • the circulation path 4 includes a first circulation path 41 and a second circulation path 42.
  • the first circulation path 41 is connected to a transmission port 130 (see FIG. 2) provided on the secondary side of the filter 100.
  • the second circulation path 42 is connected to a vent port 140 (see FIG. 2) provided on the secondary side of the filter 100.
  • the vent port 140 is used, for example, when discharging air bubbles from the inside of the filter 100.
  • the first circulation path 41 is provided with a valve 204 for opening and closing the first circulation path 41.
  • the second circulation path 42 is provided with a valve 205 for opening and closing the second circulation path 42.
  • the first supply unit 5 supplies DIW (deionized water), which is an example of the first liquid, to the storage unit 2.
  • DIW deionized water
  • the temperature of the DIW is not adjusted, and the temperature is, for example, room temperature (for example, about 23 ° C. to 25 ° C.).
  • the first supply section 5 is a valve provided in the DIW supply source 51, the first supply path 52 connecting the DIW supply source 51 and the storage section 2, and the first supply path 52, and opens and closes the first supply path 52. It is equipped with 206.
  • the DIW supply source 51 pumps the DIW to the first supply path 52 by using a pump or the like (not shown).
  • the DIW pumped by the DIW supply source 51 is supplied to the storage unit 2 via the first supply path 52 and stored in the storage unit 2.
  • DIW can remove metal components and the like from the pollutants contained in the filter 100.
  • the pollutants contained in the filter 100 the metal component and the like are substances that are difficult to remove (almost insoluble in the IPA) by the IPA supplied from the second supply unit 6 described later.
  • the second supply unit 6 supplies IPA (isopropyl alcohol), which is an example of the second liquid, to the storage unit 2.
  • IPA isopropyl alcohol
  • the temperature of IPA is not adjusted, and the temperature is, for example, room temperature (for example, about 23 ° C. to 25 ° C.). That is, the temperature of the IPA is the same as the temperature of the DIW supplied from the first supply unit 5.
  • the second supply section 6 is provided in the IPA supply source 61, the second supply path 62 connecting the IPA supply source 61 and the storage section 2, and the second supply path 62, and is a valve that opens and closes the second supply path 62. It includes 207.
  • the IPA supply source 61 pumps the IPA to the second supply path 62 by using a pump or the like (not shown).
  • the IPA pumped by the IPA supply source 61 is supplied to the storage unit 2 via the second supply path 62 and stored in the storage unit 2.
  • IPA can mainly remove substances other than the above-mentioned metal components among the pollutants contained in the filter 100. It should be noted that the metal component and the like are not completely dissolved in IPA, but are dissolved in a very small amount. Therefore, if the metal component and the like are not properly removed, the metal component and the like may dissolve out from the filter 100 little by little for a long period of time during operation of the apparatus and continue to contaminate the treatment liquid.
  • FIG. 3 is a graph showing the relationship between the washable range of the first liquid and the washable range of the second liquid.
  • the washable range of the first liquid for example, DIW
  • the washable range of the second liquid for example, IPA
  • the first liquid and the second liquid having a positional relationship in which the washable range (cleaning ability) with respect to the contaminated group to be cleaned is as opposite as possible are selected.
  • the contamination group for example, a metal component
  • a liquid having a low surface tension and having an affinity with the first liquid is selected so that the filtration membrane 110 can be wetted.
  • a liquid that can suitably remove the contaminated group that is difficult to remove with the first liquid is selected with respect to the contaminated group to be cleaned.
  • the indexes for selecting the first liquid and the second liquid are, for example, the HSP value (Hansen solubility parameter), the dielectric constant, the diffusion coefficient, and the like, and differ depending on the contamination group to be cleaned.
  • the decompression mechanism 7 is connected to the circulation path 4 and decompresses the inside of the filter 100 via the circulation path 4.
  • the decompression mechanism 7 includes a tank 71, branch paths 72 and 73, an open air path 74, and an exhaust device 75.
  • the tank 71 stores a liquid (IPA or DIW).
  • a drain path 711 for discharging the liquid stored in the tank 71 is connected to the tank 71.
  • the drain path 711 is provided with a valve 208 that opens and closes the drain path 711.
  • the branch path 72 is a pipeline connecting the first circulation path 41 and the tank 71. Specifically, one end of the branch path 72 is connected to the first circulation path 41 downstream of the filter 100 and upstream of the valve 204. The other end of the branch path 72 is connected to the upper part of the tank 71.
  • the branch path 72 is provided with a valve 209 that opens and closes the branch path 72.
  • the branch path 73 is a pipeline connecting the second circulation path 42 and the tank 71. Specifically, one end of the branch path 73 is connected to the second circulation path 42 between the filter 100 and the valve 205. The other end of the branch path 73 is connected to the upper part of the tank 71.
  • the branch path 73 is provided with a valve 210 that opens and closes the branch path 73.
  • the open air passage 74 is connected to the upper part of the tank 71.
  • the open air passage 74 is provided with a valve 211 that opens and closes the open air passage 74.
  • the exhaust device 75 is, for example, a vacuum pump or the like, and is connected to the tank 71 via the exhaust passage 751.
  • the exhaust passage 751 is connected to the upper part of the tank 71.
  • the exhaust passage 751 is provided with a valve 212 that opens and closes the exhaust passage 751.
  • the filter 100 includes a filtration membrane 110 inside.
  • the filtration membrane 110 includes, for example, a PTFE (polytetrafluoroethylene) membrane.
  • the PTFE membrane is hydrophobic.
  • An introduction port 120, a vent port 140, and a drain port 150 are provided on the primary side of the filter 100.
  • a liquid feeding path 3 is connected to the introduction port 120.
  • a second circulation path 42 is connected to the vent port 140.
  • the vent port 140 is used, for example, to remove air bubbles from the inside of the filter 100.
  • a drain path 160 is connected to the drain port 150.
  • the drain path 160 is provided with a valve 213 that opens and closes the drain path 160.
  • the drain path 160 is used, for example, when draining the liquid from the filter 100.
  • a transmission port 130 is provided on the secondary side of the filter 100.
  • the first circulation path 41 is connected to the transmission port 130.
  • the filter 100 is installed with the primary side facing downward and the secondary side facing upward. Therefore, the liquid (IPA or DIW) is introduced from below with respect to the filter 100.
  • the filter 100 is arranged at a position lower than the liquid level of the liquid (IPA or DIW) stored in the storage unit 2 (see FIG. 1).
  • the filter cleaning system 1 can supply the liquid (IPA or DIW) stored in the storage unit 2 to the filter 100 by utilizing the weight of the liquid itself.
  • the filter cleaning system 1 further includes a control device 8.
  • the control device 8 controls the operation of the filter cleaning system 1.
  • a control device 8 is, for example, a computer, and includes a control device 81 and a storage unit 82.
  • the control device 81 includes a microcomputer having a CPU (Central Processing Unit), a ROM (Read Only Memory), a RAM (Random Access Memory), an input / output port, and various circuits.
  • the CPU of such a microcomputer realizes the control described later by reading and executing the program stored in the ROM.
  • the storage unit 82 is realized by, for example, a semiconductor memory element such as a RAM or a flash memory, or a storage device such as a hard disk or an optical disk.
  • Such a program may be recorded on a recording medium readable by a computer, and may be installed from the recording medium in the storage unit of the control device 8.
  • Examples of recording media that can be read by a computer include a hard disk (HD), a flexible disk (FD), a compact disk (CD), a magnet optical disk (MO), and a memory card.
  • FIG. 4 is a flowchart showing a procedure of processing executed by the filter cleaning system 1 according to the first embodiment.
  • 5 to 7 are explanatory views of the first IPA wetting process
  • FIGS. 8 and 9 are explanatory views of the first DIW replacement process
  • FIG. 10 is an explanatory view of the HDIW cleaning process.
  • Each processing procedure shown in FIG. 4 is executed according to the control of the control device 8.
  • step S101 the first IPA wetting process is performed (step S101).
  • the valve 207 is opened for a certain period of time, so that the IPA is supplied from the second supply unit 6 to the storage unit 2.
  • IPA is stored in the storage unit 2 (see FIG. 5).
  • the valve 207 is closed, the supply of IPA from the second supply unit 6 to the storage unit 2 is stopped.
  • This process may be performed before the start of the first IPA wetting process. That is, the IPA may be stored in the storage unit 2 in advance. Further, the IPA may be supplied from the second supply unit 6 to the storage unit 2 periodically or constantly during the first IPA wetting process.
  • valves 201, 209, 210, 211 are opened.
  • the filter 100 is arranged below the storage unit 2. Therefore, when the valves 201, 209, 210, and 211 are opened, the IPA stored in the storage unit 2 flows through the liquid feeding path 3 and flows into the filter 100 due to the weight of the IPA. As a result, the filter 100 is filled with IPA. After the filter 100 is filled with IPA, valves 2011 and 211 are closed.
  • the inside of the filter 100 is first filled with IPA. Since IPA has a relatively low surface tension, specifically lower than DIW, it is suitable for wetting (hydrophilizing) the hydrophobic filtration membrane 110 (PTFE membrane) arranged inside the filter 100. There is. Further, by temporarily storing the IPA in the storage unit 2 and then supplying the IPA to the inside of the filter 100 using the weight of the IPA, for example, the gas dissolved in the IPA can be removed. As a result, the time for the decompression degassing treatment in the subsequent stage can be shortened.
  • IPA is mentioned as an example of the second liquid used for the first IPA wetting treatment, but the second liquid has a higher surface tension than the first liquid (DIW in this case) used for the subsequent treatment.
  • Any liquid that is low and has an affinity with the first liquid may be used.
  • an alcohol solvent such as methanol or ethanol can be used in addition to IPA.
  • the valve 212 is opened and the exhaust device 75 is driven.
  • the exhaust device 75 sucks the inside of the filter 100 through the tank 71, the branch paths 72, 73, and the circulation path 4. As a result, the pressure inside the filter 100 is reduced. This state is maintained for a predetermined time (for example, 10 hours or more, preferably 15 hours or more).
  • the filter cleaning system 1 can degas the inside of the filter 100 by depressurizing the inside of the filter 100.
  • the IPA does not come into contact with the portion to which the air bubbles are attached, so that the portion becomes a dry spot that is not hydrophilized. Since the liquid is not passed through the dry spot, the effective membrane area of the filtration membrane 110 is reduced by the area of the dry spot.
  • the filter cleaning system 1 by degassing the inside of the filter 100, it is possible to suppress the formation of dry spots on the filtration membrane 110, so that the filtration membrane 110 is effectively hydrophilic. Can be made.
  • the filter cleaning system 1 by performing the first IPA wetting process, among the pollutants contained in the filter 100, substances that are relatively easily dissolved in IPA can be removed. As described above, the first IPA wetting process also serves as cleaning of the filter 100.
  • the first DIW replacement process is performed (step S102).
  • DIW is supplied from the first supply unit 5 to the storage unit 2.
  • DIW is stored in the storage unit 2 (see FIG. 8).
  • the DIW may be supplied from the first supply unit 5 to the storage unit 2 periodically or constantly during the first DIW replacement process.
  • the inside of the filter 100 is decompressed by the decompression mechanism 7.
  • the DIW stored in the storage unit 2 is passed from the storage unit 2 to the filter 100 through the liquid supply path 3 by the decompression mechanism 7.
  • the inside of the filter 100 is replaced with DIW from IPA (see FIG. 9).
  • the liquid passing time of DIW through the filter 100 is, for example, about 10 minutes to 20 minutes.
  • the filter cleaning system 1 decompresses the inside of the filter 100 by the depressurizing mechanism 7 even before the DIW is passed through the filter 100. This makes it possible to efficiently replace the IPA with the DIW.
  • the exhaust device 75 is stopped, the valve 212 is closed, and the valve 211 is opened. As a result, the decompression state of the inside of the filter 100 is released.
  • the IPA can be replaced by using HDIW (high temperature DIW) used in the HDIW cleaning process described later.
  • HDIW high temperature DIW
  • foaming may occur inside the filter 100 when HDIW is mixed with IPA at room temperature.
  • the filter cleaning system 1 by replacing the IPA with DIW having the same temperature as the IPA, air bubbles are generated again inside the filter 100 after degassing using the decompression mechanism 7. It can be suppressed.
  • HDIW cleaning process is performed (step S103).
  • valves 202, 204, 205 are opened. Further, the pump 311 and the heating unit 312 are driven. As a result, the DIW stored in the storage unit 2 flows through the bypass path 31 and is heated by the heating unit 312. Then, HDIW, which is a heated DIW, is passed through the filter 100. The HDIW that has passed through the filter 100 is returned to the storage unit 2 via the first circulation passage 41 and the second circulation passage 42.
  • the temperature of HDIW is a temperature equal to or higher than the operating temperature of the treatment liquid (IPA) passed through the filter 100 in the substrate liquid treatment apparatus.
  • the HDIW that has passed through the filter 100 is returned to the storage unit 2 via the first circulation passage 41 and the second circulation passage 42.
  • the liquid passing time of HDIW through the filter 100 is 24 hours or more. Further, it is preferable that the flow rate of HDIW in the HDIW cleaning process is larger than the flow rate of DIW in the first DIW replacement process.
  • the flow rate of HDIW (or DIW) can be adjusted by a flow rate adjusting mechanism (not shown).
  • the second DIW replacement process is performed (step S104).
  • the pump 311 and the heating unit 312 are stopped. Further, when the valves 203 and 213 are opened for a certain period of time, the HDIW used for the HDIW cleaning process is discharged from the storage unit 2 and the filter 100.
  • the valve 206 opens and the new DIW liquid is supplied from the first supply unit 5 to the storage unit 2.
  • the valves 201, 209, 210, and 212 are opened, and the exhaust device 75 of the depressurizing mechanism 7 is driven.
  • the DIW stored in the storage unit 2 is passed through the filter 100 by the same procedure as the first DIW replacement process, that is, by the same route as in FIG.
  • the HDIW remaining inside the filter 100 is replaced with the DIW.
  • the liquid passing time of DIW through the filter 100 is, for example, about 10 minutes to 20 minutes.
  • the second DIW replacement process may be passed through the filter 100 by the same procedure as the HDIW cleaning process, that is, by the same route as in FIG.
  • foaming during mixing can be suppressed as compared with the case where HDIW is replaced with IPA in the second IPA wetting process in the subsequent stage.
  • step S105 the second IPA wetting process is performed.
  • the filter 100 is filled with IPA by the same procedure as the first IPA wetting process, and then the inside of the filter 100 is depressurized.
  • the series of filter cleaning treatments described above may be completed in a state where IPA (a treatment liquid to be passed through the filter 100 in the mounted substrate liquid treatment apparatus) is sealed inside the filter 100. Further, the series of filter cleaning treatments described above may be completed in a state where the inside of the filter 100 is dried with, for example, N2 gas after discharging the IPA from the filter 100.
  • IPA a treatment liquid to be passed through the filter 100 in the mounted substrate liquid treatment apparatus
  • FIG. 11 is a diagram showing a configuration of a filter cleaning system according to a second embodiment.
  • the control device 8 is omitted.
  • the filter cleaning system 1A further includes a branch path 9A.
  • the branch path 9A is a pipeline connecting the second supply path 62 of the second supply section 6 and the liquid supply path 3. Specifically, one end of the branch path 9A is connected to the second supply path 62 on the upstream side of the valve 207. Further, the other end of the branch path 9A is connected to the liquid supply path 3 on the downstream side of the valve 201.
  • the branch path 9A is provided with a valve 220 that opens and closes the branch path 9A.
  • the first IPA wetting process and the second IPA wetting process are performed using the branch path 9A. Specifically, when the valve 220 is opened for a certain period of time, IPA is supplied from the IPA supply source 61 to the filter 100 via the branch path 9A and the liquid supply path 3 by pumping by the IPA supply source 61.
  • the first IPA wetting process and the second IPA wetting process can be performed without storing the IPA in the storage unit 2. Therefore, according to the filter cleaning system 1A, the time required for the first IPA wetting process and the second IPA wetting process can be shortened.
  • the filter cleaning systems 1 and 1A may include, for example, a processing liquid supply unit that supplies the processing liquid that is passed through the filter 100 to the storage unit 2 when the substrate liquid processing apparatus is in operation.
  • the treatment liquid is IPA
  • the treatment liquid supply unit corresponds to the second supply unit 6 described above.
  • the filter cleaning system (filter cleaning system 1, 1A as an example) according to the embodiment includes a storage unit (storage unit 2 as an example) and a liquid feed path (liquid feed path 3, as an example). 3A), a circulation path (circulation path 4 as an example), a first supply section (first supply section 5 as an example), and a second supply section (second supply section 6 as an example) are provided.
  • the storage unit stores the liquid to be passed through the filter (for example, the filter 100).
  • the liquid feed path sends the liquid stored in the reservoir to the filter.
  • the circulation path returns the liquid delivered from the filter to the reservoir.
  • the first supply unit supplies the first liquid (DIW as an example) to the storage unit.
  • the second supply unit supplies the storage unit with a second liquid (IPA, for example) having a lower surface tension than the first liquid and having an affinity with the first liquid. Therefore, according to the filter cleaning system according to the embodiment, it is possible to effectively clean the filter before it is used in the substrate liquid treatment apparatus.
  • IPA a second liquid
  • the filter cleaning system according to the embodiment may include a decompression mechanism (as an example, a decompression mechanism 7).
  • the decompression mechanism 7 is connected to a circulation path and decompresses the inside of the filter via the circulation path. As a result, the inside of the filter can be degassed, and the formation of dry spots on the filtration membrane arranged inside the filter can be suppressed.
  • the filter cleaning system may include a control unit (as an example, a control device 81).
  • the control unit controls the first supply unit, the second supply unit, and the decompression mechanism. Further, the control unit executes a process of reducing the pressure (for example, a first IPA wetting process) and a process of substituting with the first liquid (as an example, a first DIW replacement process).
  • the depressurizing process is a process of depressurizing the inside of the filter by controlling the depressurizing mechanism while the filter is filled with the second liquid.
  • the first supply section is controlled to store the first solution in the storage section, and the stored first solution is stored.
  • This is a process of replacing the inside of the filter with the first liquid by passing the liquid through the filter.
  • the control unit may use a decompression mechanism to reduce the pressure inside the filter before the first liquid is passed through the filter and during the passage of the first liquid through the filter. As a result, the replacement of the second liquid with the first liquid can be efficiently performed. Further, the generation of air bubbles inside the filter can be suppressed as compared with the case where the first liquid is supplied to the filter by pressurization.
  • the liquid feeding path may be provided with a bypass path (as an example, a bypass path 31) that branches from the liquid feeding path and returns to the liquid feeding path.
  • the bypass path may include a heating unit (for example, a heating unit 312).
  • the control unit stops the decompression mechanism, then circulates the first liquid through the bypass path, and passes the first liquid (HDIW, for example) heated by the heating unit through the filter. It may be liquid.
  • the second liquid with the unheated first liquid before supplying the heated first liquid, foaming inside the filter can be suppressed.
  • the filter cleaning system may include a treatment liquid supply unit (when the treatment liquid is IPA, the first supply unit 6 as an example).
  • the treatment liquid supply unit supplies the treatment liquid that is passed through the filter to the storage unit when the substrate liquid treatment apparatus is in operation.
  • the control unit controls the processing liquid supply unit to store the processing liquid in the storage unit after the process of replacing the first liquid with the first liquid is completed and the first liquid is discharged from the filter, and the stored processing liquid is stored. Pass the liquid through the filter.
  • the first liquid is DIW
  • the filter cleaning system according to the embodiment may include a branch path (as an example, a branch path 9A) that branches from the second supply unit and is connected to the liquid supply path.
  • a branch path as an example, a branch path 9A

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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