CN115039205A - 过滤器清洗系统和过滤器清洗方法 - Google Patents

过滤器清洗系统和过滤器清洗方法 Download PDF

Info

Publication number
CN115039205A
CN115039205A CN202180011726.3A CN202180011726A CN115039205A CN 115039205 A CN115039205 A CN 115039205A CN 202180011726 A CN202180011726 A CN 202180011726A CN 115039205 A CN115039205 A CN 115039205A
Authority
CN
China
Prior art keywords
liquid
filter
cleaning system
path
ipa
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202180011726.3A
Other languages
English (en)
Chinese (zh)
Inventor
大塚优树
穴本笃史
小宫洋司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of CN115039205A publication Critical patent/CN115039205A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/62—Regenerating the filter material in the filter
    • B01D29/66—Regenerating the filter material in the filter by flushing, e.g. counter-current air-bumps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14—Removing waste, e.g. labels, from cleaning liquid
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/007—Heating the liquid
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
CN202180011726.3A 2020-02-05 2021-01-27 过滤器清洗系统和过滤器清洗方法 Pending CN115039205A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020-018170 2020-02-05
JP2020018170 2020-02-05
PCT/JP2021/002751 WO2021157440A1 (ja) 2020-02-05 2021-01-27 フィルタ洗浄システムおよびフィルタ洗浄方法

Publications (1)

Publication Number Publication Date
CN115039205A true CN115039205A (zh) 2022-09-09

Family

ID=77200558

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180011726.3A Pending CN115039205A (zh) 2020-02-05 2021-01-27 过滤器清洗系统和过滤器清洗方法

Country Status (5)

Country Link
US (1) US12427551B2 (https=)
JP (2) JP7305807B2 (https=)
KR (2) KR102918884B1 (https=)
CN (1) CN115039205A (https=)
WO (1) WO2021157440A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7526237B2 (ja) 2022-09-15 2024-07-31 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置、および、フィルタの気泡除去方法
JP2025047775A (ja) * 2023-09-21 2025-04-03 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010021215A (ja) * 2008-07-08 2010-01-28 Toshiba Corp 洗浄システム及び洗浄液循環方法
JP2012223669A (ja) * 2011-04-15 2012-11-15 Kitz Microfilter Corp 中空糸膜フィルタのエアパージ用ろ過システムとそのエアパージ方法
CN103167903A (zh) * 2011-02-18 2013-06-19 奥加诺株式会社 过滤器的清洁化方法、及被处理体的洗涤或干燥方法
TW201344745A (zh) * 2012-02-24 2013-11-01 東京威力科創股份有限公司 處理液更換方法及基板處理裝置
JP2015103662A (ja) * 2013-11-25 2015-06-04 東京エレクトロン株式会社 フィルタ洗浄方法、液処理装置及び記憶媒体
JP2015204302A (ja) * 2014-04-10 2015-11-16 東京エレクトロン株式会社 液供給装置およびフィルタ洗浄方法
CN105580108A (zh) * 2013-09-27 2016-05-11 东京毅力科创株式会社 过滤器单元的预处理方法、处理液供给装置、过滤器单元的加热装置以及处理液供给路径的预处理方法
CN109786284A (zh) * 2017-11-15 2019-05-21 株式会社斯库林集团 基板处理方法及基板处理装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3654148A (en) * 1970-09-28 1972-04-04 Puredesal Inc Liquid purification system
US4254699A (en) * 1977-12-22 1981-03-10 Frito-Lay, Inc. Liquid-solid contacting apparatus
US4381703A (en) * 1982-02-12 1983-05-03 Frito-Lay, Inc. Vertical soak tank with improved levelling and weighing apparatus
US5035799A (en) * 1989-08-21 1991-07-30 Clear Flow, Inc. Filter assembly
US5498349A (en) * 1993-02-08 1996-03-12 Kabushiki Kaisha Sanshin Seisakusho Filtration concentration apparatus and method
AUPM800694A0 (en) * 1994-09-09 1994-10-06 Memtec Limited Cleaning of hollow fibre membranes
US6280300B1 (en) * 1998-11-25 2001-08-28 Ebara Corporation Filter apparatus
JP5910401B2 (ja) * 2012-08-03 2016-04-27 東京エレクトロン株式会社 処理液供給装置の運転方法、処理液供給装置及び記憶媒体
JP5741549B2 (ja) * 2012-10-09 2015-07-01 東京エレクトロン株式会社 処理液供給方法、処理液供給装置及び記憶媒体
JP6223906B2 (ja) * 2014-05-19 2017-11-01 東京エレクトロン株式会社 処理液交換方法および液処理装置
JP2017055023A (ja) 2015-09-11 2017-03-16 東京エレクトロン株式会社 基板液処理装置及び流路洗浄方法
JP6762378B2 (ja) * 2017-01-04 2020-09-30 東京エレクトロン株式会社 基板洗浄方法、基板洗浄システムおよび記憶媒体
JP6965935B2 (ja) * 2017-09-29 2021-11-10 日本電気株式会社 クロスフロー濾過装置、クロスフロー濾過方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010021215A (ja) * 2008-07-08 2010-01-28 Toshiba Corp 洗浄システム及び洗浄液循環方法
CN103167903A (zh) * 2011-02-18 2013-06-19 奥加诺株式会社 过滤器的清洁化方法、及被处理体的洗涤或干燥方法
JP2012223669A (ja) * 2011-04-15 2012-11-15 Kitz Microfilter Corp 中空糸膜フィルタのエアパージ用ろ過システムとそのエアパージ方法
TW201344745A (zh) * 2012-02-24 2013-11-01 東京威力科創股份有限公司 處理液更換方法及基板處理裝置
CN105580108A (zh) * 2013-09-27 2016-05-11 东京毅力科创株式会社 过滤器单元的预处理方法、处理液供给装置、过滤器单元的加热装置以及处理液供给路径的预处理方法
JP2015103662A (ja) * 2013-11-25 2015-06-04 東京エレクトロン株式会社 フィルタ洗浄方法、液処理装置及び記憶媒体
JP2015204302A (ja) * 2014-04-10 2015-11-16 東京エレクトロン株式会社 液供給装置およびフィルタ洗浄方法
CN109786284A (zh) * 2017-11-15 2019-05-21 株式会社斯库林集团 基板处理方法及基板处理装置

Also Published As

Publication number Publication date
US12427551B2 (en) 2025-09-30
WO2021157440A1 (ja) 2021-08-12
TW202135914A (zh) 2021-10-01
JP2023115235A (ja) 2023-08-18
US20230091875A1 (en) 2023-03-23
KR20220137671A (ko) 2022-10-12
JP7580534B2 (ja) 2024-11-11
KR102918884B1 (ko) 2026-01-27
KR20260006700A (ko) 2026-01-13
JP7305807B2 (ja) 2023-07-10
JPWO2021157440A1 (https=) 2021-08-12

Similar Documents

Publication Publication Date Title
CN110957239B (zh) 基片处理系统和处理流体供给方法
CN103706523B (zh) 处理液供给方法和处理液供给装置
US8608864B2 (en) Substrate treating method
CN112289702B (zh) 基板处理设备
CN106024579B (zh) 处理液供给方法和处理液供给装置
JP7580534B2 (ja) フィルタ洗浄システム、フィルタ洗浄方法および減圧機構
CN109411387B (zh) 药液供给装置、基板处理装置、药液供给方法、以及基板处理方法
TWI895440B (zh) 液處理裝置及液處理方法
JP6159651B2 (ja) フィルタ洗浄方法、液処理装置及び記憶媒体
JP2007175559A (ja) 高圧処理装置および高圧処理方法
JP2008305980A (ja) 薬液供給システム及び薬液供給方法並びに記憶媒体
KR20170103653A (ko) 기판 처리 장치, 기판 처리 방법 및 기억 매체
JP7285992B2 (ja) 処理流体供給方法
JP2008066495A (ja) 高圧処理装置および高圧処理方法
JP2016189493A (ja) 液処理方法、液処理装置及び記憶媒体
TWI917346B (zh) 過濾器洗淨系統及過濾器洗淨方法
JP7458533B2 (ja) 処理流体供給装置
JP2024170984A (ja) 基板処理装置および基板処理方法
CN120977901A (zh) 衬底处理装置
TW202517358A (zh) 洗淨方法、洗淨裝置及塗佈裝置
CN120637270A (zh) 基片处理装置和处理液补充方法
CN120977898A (zh) 衬底处理方法
CN120814031A (zh) 基片处理装置和基片处理方法
CN119013767A (zh) 液供给系统、液处理装置和液供给方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination