KR102918884B1 - 필터 세정 시스템 및 필터 세정 방법 - Google Patents

필터 세정 시스템 및 필터 세정 방법

Info

Publication number
KR102918884B1
KR102918884B1 KR1020227029161A KR20227029161A KR102918884B1 KR 102918884 B1 KR102918884 B1 KR 102918884B1 KR 1020227029161 A KR1020227029161 A KR 1020227029161A KR 20227029161 A KR20227029161 A KR 20227029161A KR 102918884 B1 KR102918884 B1 KR 102918884B1
Authority
KR
South Korea
Prior art keywords
liquid
filter
storage unit
ipa
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020227029161A
Other languages
English (en)
Korean (ko)
Other versions
KR20220137671A (ko
Inventor
유키 오츠카
아츠시 아나모토
히로시 고미야
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Priority to KR1020257042871A priority Critical patent/KR20260006700A/ko
Publication of KR20220137671A publication Critical patent/KR20220137671A/ko
Application granted granted Critical
Publication of KR102918884B1 publication Critical patent/KR102918884B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/62—Regenerating the filter material in the filter
    • B01D29/66—Regenerating the filter material in the filter by flushing, e.g. counter-current air-bumps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14—Removing waste, e.g. labels, from cleaning liquid
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/007—Heating the liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020227029161A 2020-02-05 2021-01-27 필터 세정 시스템 및 필터 세정 방법 Active KR102918884B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020257042871A KR20260006700A (ko) 2020-02-05 2021-01-27 필터 세정 시스템 및 필터 세정 방법

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2020-018170 2020-02-05
JP2020018170 2020-02-05
PCT/JP2021/002751 WO2021157440A1 (ja) 2020-02-05 2021-01-27 フィルタ洗浄システムおよびフィルタ洗浄方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020257042871A Division KR20260006700A (ko) 2020-02-05 2021-01-27 필터 세정 시스템 및 필터 세정 방법

Publications (2)

Publication Number Publication Date
KR20220137671A KR20220137671A (ko) 2022-10-12
KR102918884B1 true KR102918884B1 (ko) 2026-01-27

Family

ID=77200558

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020227029161A Active KR102918884B1 (ko) 2020-02-05 2021-01-27 필터 세정 시스템 및 필터 세정 방법
KR1020257042871A Pending KR20260006700A (ko) 2020-02-05 2021-01-27 필터 세정 시스템 및 필터 세정 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020257042871A Pending KR20260006700A (ko) 2020-02-05 2021-01-27 필터 세정 시스템 및 필터 세정 방법

Country Status (5)

Country Link
US (1) US12427551B2 (https=)
JP (2) JP7305807B2 (https=)
KR (2) KR102918884B1 (https=)
CN (1) CN115039205A (https=)
WO (1) WO2021157440A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7526237B2 (ja) 2022-09-15 2024-07-31 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置、および、フィルタの気泡除去方法
JP2025047775A (ja) * 2023-09-21 2025-04-03 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3654148A (en) * 1970-09-28 1972-04-04 Puredesal Inc Liquid purification system
US4254699A (en) * 1977-12-22 1981-03-10 Frito-Lay, Inc. Liquid-solid contacting apparatus
US4381703A (en) * 1982-02-12 1983-05-03 Frito-Lay, Inc. Vertical soak tank with improved levelling and weighing apparatus
US5035799A (en) * 1989-08-21 1991-07-30 Clear Flow, Inc. Filter assembly
US5498349A (en) * 1993-02-08 1996-03-12 Kabushiki Kaisha Sanshin Seisakusho Filtration concentration apparatus and method
AUPM800694A0 (en) * 1994-09-09 1994-10-06 Memtec Limited Cleaning of hollow fibre membranes
US6280300B1 (en) * 1998-11-25 2001-08-28 Ebara Corporation Filter apparatus
JP2010021215A (ja) * 2008-07-08 2010-01-28 Toshiba Corp 洗浄システム及び洗浄液循環方法
KR101485275B1 (ko) * 2011-02-18 2015-01-21 오르가노 코포레이션 필터의 청정화 방법, 및 피처리체의 세정 또는 건조 방법
JP5835929B2 (ja) 2011-04-15 2015-12-24 株式会社キッツマイクロフィルター 半導体製造用薬液のマイクロバブル低減用ろ過システムとそのろ過方法
JP5726784B2 (ja) * 2012-02-24 2015-06-03 東京エレクトロン株式会社 処理液交換方法および基板処理装置
JP5910401B2 (ja) * 2012-08-03 2016-04-27 東京エレクトロン株式会社 処理液供給装置の運転方法、処理液供給装置及び記憶媒体
JP5741549B2 (ja) * 2012-10-09 2015-07-01 東京エレクトロン株式会社 処理液供給方法、処理液供給装置及び記憶媒体
JP6107690B2 (ja) * 2013-09-27 2017-04-05 東京エレクトロン株式会社 フィルタユニットの前処理方法、処理液供給装置、フィルタユニットの加熱装置
JP6159651B2 (ja) 2013-11-25 2017-07-05 東京エレクトロン株式会社 フィルタ洗浄方法、液処理装置及び記憶媒体
JP6278808B2 (ja) * 2014-04-10 2018-02-14 東京エレクトロン株式会社 液供給装置およびフィルタ洗浄方法
JP6223906B2 (ja) * 2014-05-19 2017-11-01 東京エレクトロン株式会社 処理液交換方法および液処理装置
JP2017055023A (ja) 2015-09-11 2017-03-16 東京エレクトロン株式会社 基板液処理装置及び流路洗浄方法
JP6762378B2 (ja) * 2017-01-04 2020-09-30 東京エレクトロン株式会社 基板洗浄方法、基板洗浄システムおよび記憶媒体
JP6965935B2 (ja) * 2017-09-29 2021-11-10 日本電気株式会社 クロスフロー濾過装置、クロスフロー濾過方法
JP6933960B2 (ja) * 2017-11-15 2021-09-08 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置

Also Published As

Publication number Publication date
US12427551B2 (en) 2025-09-30
WO2021157440A1 (ja) 2021-08-12
TW202135914A (zh) 2021-10-01
JP2023115235A (ja) 2023-08-18
US20230091875A1 (en) 2023-03-23
CN115039205A (zh) 2022-09-09
KR20220137671A (ko) 2022-10-12
JP7580534B2 (ja) 2024-11-11
KR20260006700A (ko) 2026-01-13
JP7305807B2 (ja) 2023-07-10
JPWO2021157440A1 (https=) 2021-08-12

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