JPWO2020260742A5 - - Google Patents

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Publication number
JPWO2020260742A5
JPWO2020260742A5 JP2021576430A JP2021576430A JPWO2020260742A5 JP WO2020260742 A5 JPWO2020260742 A5 JP WO2020260742A5 JP 2021576430 A JP2021576430 A JP 2021576430A JP 2021576430 A JP2021576430 A JP 2021576430A JP WO2020260742 A5 JPWO2020260742 A5 JP WO2020260742A5
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JP
Japan
Prior art keywords
substrate
support
reaction chamber
susceptor
flow
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JP2021576430A
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English (en)
Japanese (ja)
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JP2022531622A (ja
JP7300527B2 (ja
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Priority claimed from PCT/FI2019/050492 external-priority patent/WO2020260742A1/en
Publication of JP2022531622A publication Critical patent/JP2022531622A/ja
Publication of JPWO2020260742A5 publication Critical patent/JPWO2020260742A5/ja
Priority to JP2023059904A priority Critical patent/JP2023085420A/ja
Application granted granted Critical
Publication of JP7300527B2 publication Critical patent/JP7300527B2/ja
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JP2021576430A 2019-06-25 2019-06-25 基板の裏面保護 Active JP7300527B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023059904A JP2023085420A (ja) 2019-06-25 2023-04-03 基板の裏面保護

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/FI2019/050492 WO2020260742A1 (en) 2019-06-25 2019-06-25 Substrate backside protection

Related Child Applications (1)

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JP2023059904A Division JP2023085420A (ja) 2019-06-25 2023-04-03 基板の裏面保護

Publications (3)

Publication Number Publication Date
JP2022531622A JP2022531622A (ja) 2022-07-07
JPWO2020260742A5 true JPWO2020260742A5 (zh) 2022-11-14
JP7300527B2 JP7300527B2 (ja) 2023-06-29

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ID=74060031

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JP2021576430A Active JP7300527B2 (ja) 2019-06-25 2019-06-25 基板の裏面保護
JP2023059904A Pending JP2023085420A (ja) 2019-06-25 2023-04-03 基板の裏面保護

Family Applications After (1)

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JP2023059904A Pending JP2023085420A (ja) 2019-06-25 2023-04-03 基板の裏面保護

Country Status (6)

Country Link
EP (1) EP3990680A4 (zh)
JP (2) JP7300527B2 (zh)
KR (1) KR102412341B1 (zh)
CN (1) CN114026268A (zh)
TW (1) TWI762931B (zh)
WO (1) WO2020260742A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112853316B (zh) * 2020-12-31 2023-03-14 拓荆科技股份有限公司 镀膜装置及其承载座
JP7308330B2 (ja) * 2021-05-10 2023-07-13 ピコサン オーワイ 基板処理装置及び方法

Family Cites Families (31)

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JPH08191097A (ja) * 1995-01-11 1996-07-23 Touyoko Kagaku Kk 高速熱処理装置
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KR20080092766A (ko) * 2007-04-13 2008-10-16 (주)소슬 기판 지지대 및 이를 구비하는 플라즈마 처리 장치
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KR101557590B1 (ko) 2014-08-19 2015-10-05 주식회사 엘지실트론 에피택셜 성장장치 및 이를 이용한 에피택셜 성장방법
JP6752797B2 (ja) * 2015-01-12 2020-09-09 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 基板裏側の変色制御のための支持組立体
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