JPWO2020166326A1 - 炭化珪素半導体チップおよび炭化珪素半導体装置 - Google Patents
炭化珪素半導体チップおよび炭化珪素半導体装置 Download PDFInfo
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- JPWO2020166326A1 JPWO2020166326A1 JP2020572149A JP2020572149A JPWO2020166326A1 JP WO2020166326 A1 JPWO2020166326 A1 JP WO2020166326A1 JP 2020572149 A JP2020572149 A JP 2020572149A JP 2020572149 A JP2020572149 A JP 2020572149A JP WO2020166326 A1 JPWO2020166326 A1 JP WO2020166326A1
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- silicon carbide
- insulating film
- electrode
- main surface
- gate
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims abstract description 124
- 229910010271 silicon carbide Inorganic materials 0.000 title claims abstract description 124
- 239000004065 semiconductor Substances 0.000 title claims description 67
- 238000000926 separation method Methods 0.000 claims abstract description 50
- 239000000758 substrate Substances 0.000 claims abstract description 48
- 239000012535 impurity Substances 0.000 claims description 61
- 229910021332 silicide Inorganic materials 0.000 claims description 28
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 27
- 229910052751 metal Inorganic materials 0.000 claims description 21
- 239000002184 metal Substances 0.000 claims description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- 235000012239 silicon dioxide Nutrition 0.000 claims description 7
- 239000000377 silicon dioxide Substances 0.000 claims description 7
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 7
- 210000000746 body region Anatomy 0.000 description 21
- 239000013078 crystal Substances 0.000 description 14
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- 238000000137 annealing Methods 0.000 description 11
- 239000007789 gas Substances 0.000 description 11
- 239000010936 titanium Substances 0.000 description 11
- 229910052719 titanium Inorganic materials 0.000 description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 10
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 238000005530 etching Methods 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000004913 activation Effects 0.000 description 3
- 239000012159 carrier gas Substances 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 3
- 229910021334 nickel silicide Inorganic materials 0.000 description 3
- RUFLMLWJRZAWLJ-UHFFFAOYSA-N nickel silicide Chemical compound [Ni]=[Si]=[Ni] RUFLMLWJRZAWLJ-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 239000012495 reaction gas Substances 0.000 description 3
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
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- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229910018503 SF6 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- PEUPIGGLJVUNEU-UHFFFAOYSA-N nickel silicon Chemical compound [Si].[Ni] PEUPIGGLJVUNEU-UHFFFAOYSA-N 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 238000005092 sublimation method Methods 0.000 description 1
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 1
- 229960000909 sulfur hexafluoride Drugs 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
本開示の目的は、第1電極が炭化珪素基板から剥がれることを抑制可能な炭化珪素半導体チップおよび炭化珪素半導体装置を提供することである。
[本開示の効果]
本開示によれば、第1電極が炭化珪素基板から剥がれることを抑制可能な炭化珪素半導体チップおよび炭化珪素半導体装置を提供することができる。
[本開示の実施形態の説明]
最初に本開示の実施形態を列挙して説明する。本明細書の結晶学的記載においては、個別方位を[]、集合方位を<>、個別面を()、集合面を{}でそれぞれ示す。結晶学上の指数が負であることは、通常、数字の上に”−”(バー)を付すことによって表現されるが、本明細書では数字の前に負の符号を付すことによって結晶学上の負の指数を表現する。
以下、本開示の実施形態の詳細について説明する。以下の説明では、同一または対応する要素には同一の符号を付し、それらについて同じ説明は繰り返さない。
まず、第1実施形態に係る炭化珪素半導体装置300の構成について説明する。
第1実施形態に係る炭化珪素半導体チップ200は、たとえばMOSFET(Metal Oxide Semiconductor Field Effect Transistor)を含んでいる。図3に示されるように、MOSFET150は、炭化珪素基板100と、ゲート電極64と、ゲート絶縁膜71と、分離絶縁膜72と、ソース電極60(第1電極60)と、ドレイン電極63(第2電極63)とを主に有している。炭化珪素基板100は、第1主面1と、第1主面1と反対側の第2主面2とを有している。炭化珪素基板100は、炭化珪素単結晶基板4と、炭化珪素単結晶基板4上に設けられた炭化珪素エピタキシャル層3とを含んでいる。炭化珪素単結晶基板4は、第2主面2を構成している。炭化珪素エピタキシャル層3は、第1主面1を構成している。
まず、炭化珪素基板100を準備する工程が実施される。たとえば昇華法によって製造された炭化珪素インゴット(図示せず)がスライスされることにより、炭化珪素単結晶基板4が準備される。炭化珪素単結晶基板4の最大径は、たとえば100mm以上であり、好ましくは150mm以上である。
次に、第2実施形態に係る炭化珪素半導体チップ200が含むMOSFET150の構成について説明する。第2実施形態に係るMOSFET150は、主に分離絶縁膜72が底面6に向かって突出するように湾曲していている構成において、第1実施形態に係るMOSFET150と異なっており、他の構成については、第1実施形態に係るMOSFET150と同様である。以下、第1実施形態に係るMOSFET150と異なる構成を中心に説明する。
次に、第3実施形態に係る炭化珪素半導体チップ200が含むMOSFET150の構成について説明する。第3実施形態に係るMOSFET150は、主に第1電極60は、シリサイド膜61と、金属膜62と、チタン膜65と、窒化チタン膜66とを有している構成において、第1実施形態に係るMOSFET150と異なっており、他の構成については、第1実施形態に係るMOSFET150と同様である。以下、第1実施形態に係るMOSFET150と異なる構成を中心に説明する。
Claims (6)
- 第1主面と、前記第1主面と反対側の第2主面とを有する炭化珪素基板を備え、
前記第1主面には、側面と、前記側面に連なる底面とを有するゲートトレンチが設けられており、
前記側面および前記底面の各々に接するゲート絶縁膜と、
前記ゲート絶縁膜上に設けられたゲート電極と、
前記ゲート電極上に設けられた分離絶縁膜と、
前記分離絶縁膜上に設けられた第1電極と、
前記第2主面上に設けられた第2電極とをさらに備え、
前記分離絶縁膜は、前記ゲート電極と前記第1電極とを電気的に分離し、
前記ゲート絶縁膜、前記ゲート電極および前記分離絶縁膜の各々と、前記第1電極の一部とは、前記ゲートトレンチの内部に設けられている、炭化珪素半導体チップ。 - 前記側面は、前記ゲート絶縁膜に接しかつ前記底面に連なる第1側面部と、前記分離絶縁膜に接しかつ前記第1側面部に連なる第2側面部と、前記第2側面部と前記第1主面との間に位置する第3側面部とを有し、
前記第1電極は、シリサイド膜と、前記シリサイド膜上に設けられた金属膜とを有し、
前記シリサイド膜は、前記第1主面および前記第3側面部の各々に接している、請求項1に記載の炭化珪素半導体チップ。 - 前記分離絶縁膜は、窒化珪素または酸窒化珪素を含み、
前記ゲート絶縁膜は、二酸化珪素を含む、請求項1または請求項2に記載の炭化珪素半導体チップ。 - 前記分離絶縁膜は、前記底面に向かって突出するように湾曲している、請求項1から請求項3のいずれか1項に記載の炭化珪素半導体チップ。
- 前記炭化珪素基板は、
第1導電型を有する第1不純物領域と、
前記第1不純物領域上に設けられ、かつ前記第1導電型と異なる第2導電型を有する第2不純物領域と、
前記第1不純物領域から隔てられるように前記第2不純物領域上に設けられ、かつ前記第1導電型を有する第3不純物領域とを含み、
前記分離絶縁膜は、前記側面において前記第3不純物領域に接している、請求項1から請求項4のいずれか1項に記載の炭化珪素半導体チップ。 - 請求項1から請求項5のいずれか1項に記載の炭化珪素半導体チップと、
前記第1電極に電気的に接続された第1ワイヤーと、
前記ゲート電極に電気的に接続された第2ワイヤーとを備えた、炭化珪素半導体装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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JP2019023429 | 2019-02-13 | ||
JP2019023429 | 2019-02-13 | ||
PCT/JP2020/003085 WO2020166326A1 (ja) | 2019-02-13 | 2020-01-29 | 炭化珪素半導体チップおよび炭化珪素半導体装置 |
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JP2001085685A (ja) * | 1999-09-13 | 2001-03-30 | Shindengen Electric Mfg Co Ltd | トランジスタ |
JP2005244168A (ja) * | 2004-01-27 | 2005-09-08 | Matsushita Electric Ind Co Ltd | 半導体装置およびその製造方法 |
JP2008306022A (ja) * | 2007-06-08 | 2008-12-18 | Toshiba Corp | 半導体装置 |
WO2011117920A1 (ja) * | 2010-03-24 | 2011-09-29 | パナソニック株式会社 | 半導体装置およびその製造方法 |
JP2017011176A (ja) * | 2015-06-24 | 2017-01-12 | ローム株式会社 | 半導体装置および半導体装置の製造方法 |
JP2019003967A (ja) * | 2017-06-09 | 2019-01-10 | 国立研究開発法人産業技術総合研究所 | 半導体装置および半導体装置の製造方法 |
WO2019117248A1 (ja) * | 2017-12-14 | 2019-06-20 | 富士電機株式会社 | 半導体装置 |
JP2019186458A (ja) * | 2018-04-13 | 2019-10-24 | トヨタ自動車株式会社 | スイッチング素子とその製造方法 |
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US7372088B2 (en) * | 2004-01-27 | 2008-05-13 | Matsushita Electric Industrial Co., Ltd. | Vertical gate semiconductor device and method for fabricating the same |
US10692863B2 (en) * | 2016-09-30 | 2020-06-23 | Rohm Co., Ltd. | Semiconductor device and semiconductor package |
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JP2001085685A (ja) * | 1999-09-13 | 2001-03-30 | Shindengen Electric Mfg Co Ltd | トランジスタ |
JP2005244168A (ja) * | 2004-01-27 | 2005-09-08 | Matsushita Electric Ind Co Ltd | 半導体装置およびその製造方法 |
JP2008306022A (ja) * | 2007-06-08 | 2008-12-18 | Toshiba Corp | 半導体装置 |
WO2011117920A1 (ja) * | 2010-03-24 | 2011-09-29 | パナソニック株式会社 | 半導体装置およびその製造方法 |
JP2017011176A (ja) * | 2015-06-24 | 2017-01-12 | ローム株式会社 | 半導体装置および半導体装置の製造方法 |
JP2019003967A (ja) * | 2017-06-09 | 2019-01-10 | 国立研究開発法人産業技術総合研究所 | 半導体装置および半導体装置の製造方法 |
WO2019117248A1 (ja) * | 2017-12-14 | 2019-06-20 | 富士電機株式会社 | 半導体装置 |
JP2019186458A (ja) * | 2018-04-13 | 2019-10-24 | トヨタ自動車株式会社 | スイッチング素子とその製造方法 |
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