JPWO2020130055A1 - レーザ加工方法、半導体部材製造方法及びレーザ加工装置 - Google Patents
レーザ加工方法、半導体部材製造方法及びレーザ加工装置 Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 165
- 238000003672 processing method Methods 0.000 title claims abstract description 74
- 238000004519 manufacturing process Methods 0.000 title claims description 64
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 39
- 238000005520 cutting process Methods 0.000 claims abstract description 11
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims description 115
- 229910002601 GaN Inorganic materials 0.000 claims description 70
- 238000000034 method Methods 0.000 claims description 22
- 238000003754 machining Methods 0.000 claims description 20
- 238000012986 modification Methods 0.000 claims description 20
- 230000004048 modification Effects 0.000 claims description 20
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 12
- 229910052733 gallium Inorganic materials 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 11
- 230000002093 peripheral effect Effects 0.000 description 20
- 235000012431 wafers Nutrition 0.000 description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 15
- 229910001873 dinitrogen Inorganic materials 0.000 description 13
- 238000002407 reforming Methods 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 7
- 230000012447 hatching Effects 0.000 description 6
- 238000004891 communication Methods 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0011—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing with preliminary treatment, e.g. weakening by scoring
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- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
- B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/0823—Devices involving rotation of the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
- B23K26/0853—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/56—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting
Abstract
Description
[レーザ加工装置の構成]
[第1実施形態のレーザ加工方法及び半導体部材製造方法]
[第2実施形態のレーザ加工方法及び半導体部材製造方法]
[変形例]
Claims (13)
- 半導体対象物の内部において前記半導体対象物の表面に対向する仮想面に沿って、前記半導体対象物を切断するためのレーザ加工方法であって、
前記表面から前記半導体対象物の内部にレーザ光を入射させることにより、前記仮想面に沿って、第1形成密度となるように複数の第1改質スポットを形成する第1工程と、
前記第1工程の後に、前記表面から前記半導体対象物の内部にレーザ光を入射させることにより、前記仮想面に沿って、前記第1形成密度よりも高い第2形成密度となるように複数の第2改質スポットを形成する第2工程と、を備える、レーザ加工方法。 - 前記第1工程においては、前記複数の第1改質スポットからそれぞれ延びる複数の亀裂が互いに繋がらないように、前記複数の第1改質スポットを形成する、請求項1に記載のレーザ加工方法。
- 前記第2工程においては、前記複数の第2改質スポットからそれぞれ延びる複数の亀裂が互いに繋がるように、前記複数の第2改質スポットを形成する、請求項1又は2に記載のレーザ加工方法。
- 前記第2工程においては、前記複数の第2改質スポットが互いに繋がるように、前記複数の第2改質スポットを形成する、請求項1〜3のいずれか一項に記載のレーザ加工方法。
- 前記第1工程においては、パルス発振された前記レーザ光の集光点を、第1パルスピッチで前記仮想面に沿って移動させることにより、前記複数の第1改質スポットを形成し、
前記第2工程においては、パルス発振された前記レーザ光の集光点を、前記第1パルスピッチよりも小さい第2パルスピッチで前記仮想面に沿って移動させることにより、前記複数の第2改質スポットを形成する、請求項1〜4のいずれか一項に記載のレーザ加工方法。 - 前記半導体対象物の材料は、ガリウムを含む、請求項1〜5のいずれか一項に記載のレーザ加工方法。
- 前記半導体対象物の材料は、窒化ガリウムを含む、請求項6に記載のレーザ加工方法。
- 請求項1〜7のいずれか一項に記載のレーザ加工方法が備える前記第1工程及び前記第2工程と、
前記仮想面に渡る亀裂を境界として前記半導体対象物から半導体部材を取得する第3工程と、を備える、半導体部材製造方法。 - 前記仮想面は、前記表面に対向する方向に並ぶように複数設定されている、請求項8に記載の半導体部材製造方法。
- 前記半導体対象物は、半導体インゴットであり、
前記半導体部材は、半導体ウェハである、請求項9に記載の半導体部材製造方法。 - 前記仮想面は、前記表面が延在する方向に並ぶように複数設定されている、請求項8に記載の半導体部材製造方法。
- 前記半導体対象物は、半導体ウェハであり、
前記半導体部材は、半導体デバイスである、請求項11に記載の半導体部材製造方法。 - 半導体対象物の内部において前記半導体対象物の表面に対向する仮想面に沿って、前記半導体対象物を切断するためのレーザ加工装置であって、
前記半導体対象物を支持するステージと、
前記表面から前記半導体対象物の内部にレーザ光を入射させることにより、前記仮想面に沿って複数の第1改質スポット及び複数の第2改質スポットを形成するレーザ照射ユニットと、を備え、
前記仮想面に沿って、第1形成密度となるように前記複数の第1改質スポットを形成し、前記複数の第1改質スポットを形成した後に、前記仮想面に沿って、前記第1形成密度よりも高い第2形成密度となるように前記複数の第2改質スポットを形成する、レーザ加工装置。
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PCT/JP2019/049701 WO2020130055A1 (ja) | 2018-12-21 | 2019-12-18 | レーザ加工方法、半導体部材製造方法及びレーザ加工装置 |
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JP2004259846A (ja) * | 2003-02-25 | 2004-09-16 | Ogura Jewel Ind Co Ltd | 基板上形成素子の分離方法 |
JP2007165850A (ja) * | 2005-11-16 | 2007-06-28 | Denso Corp | ウェハおよびウェハの分断方法 |
JP4907984B2 (ja) * | 2005-12-27 | 2012-04-04 | 浜松ホトニクス株式会社 | レーザ加工方法及び半導体チップ |
US8961806B2 (en) * | 2010-07-26 | 2015-02-24 | Hamamatsu Photonics K.K. | Laser processing method |
JP5840215B2 (ja) * | 2011-09-16 | 2016-01-06 | 浜松ホトニクス株式会社 | レーザ加工方法及びレーザ加工装置 |
JP2014011358A (ja) * | 2012-06-29 | 2014-01-20 | Toshiba Mach Co Ltd | レーザダイシング方法 |
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JP6395613B2 (ja) * | 2015-01-06 | 2018-09-26 | 株式会社ディスコ | ウエーハの生成方法 |
JP6260601B2 (ja) * | 2015-10-02 | 2018-01-17 | 日亜化学工業株式会社 | 半導体素子の製造方法 |
US10794872B2 (en) | 2015-11-16 | 2020-10-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Acoustic measurement of fabrication equipment clearance |
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WO2017199784A1 (ja) * | 2016-05-17 | 2017-11-23 | エルシード株式会社 | 加工対象材料の切断方法 |
JP6669594B2 (ja) * | 2016-06-02 | 2020-03-18 | 株式会社ディスコ | ウエーハ生成方法 |
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TW202105482A (zh) | 2021-02-01 |
KR20210104767A (ko) | 2021-08-25 |
CN113260492B (zh) | 2024-02-20 |
WO2020130055A1 (ja) | 2020-06-25 |
TW202105481A (zh) | 2021-02-01 |
KR20210104768A (ko) | 2021-08-25 |
JPWO2020130054A1 (ja) | 2021-11-04 |
CN113195185A (zh) | 2021-07-30 |
CN113260492A (zh) | 2021-08-13 |
US20220055156A1 (en) | 2022-02-24 |
WO2020130054A1 (ja) | 2020-06-25 |
US20220093463A1 (en) | 2022-03-24 |
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