JPWO2020094053A5 - - Google Patents

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Publication number
JPWO2020094053A5
JPWO2020094053A5 JP2021524229A JP2021524229A JPWO2020094053A5 JP WO2020094053 A5 JPWO2020094053 A5 JP WO2020094053A5 JP 2021524229 A JP2021524229 A JP 2021524229A JP 2021524229 A JP2021524229 A JP 2021524229A JP WO2020094053 A5 JPWO2020094053 A5 JP WO2020094053A5
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JP
Japan
Prior art keywords
injection
channel
cleaned
atomized
nozzle
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JP2021524229A
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English (en)
Japanese (ja)
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JP7179985B2 (ja
JP2022506689A (ja
JP2022506689A5 (https=
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Priority claimed from CN201811324019.6A external-priority patent/CN111162023B/zh
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Publication of JP2022506689A publication Critical patent/JP2022506689A/ja
Publication of JPWO2020094053A5 publication Critical patent/JPWO2020094053A5/ja
Publication of JP2022506689A5 publication Critical patent/JP2022506689A5/ja
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JP2021524229A 2018-11-08 2019-11-06 噴霧デバイスおよび洗浄装置 Active JP7179985B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN201811324019.6 2018-11-08
CN201811324019.6A CN111162023B (zh) 2018-11-08 2018-11-08 喷淋装置及清洗设备
PCT/CN2019/115971 WO2020094053A1 (zh) 2018-11-08 2019-11-06 喷淋装置及清洗设备

Publications (4)

Publication Number Publication Date
JP2022506689A JP2022506689A (ja) 2022-01-17
JPWO2020094053A5 true JPWO2020094053A5 (https=) 2022-04-07
JP2022506689A5 JP2022506689A5 (https=) 2022-04-07
JP7179985B2 JP7179985B2 (ja) 2022-11-29

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ID=70555383

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021524229A Active JP7179985B2 (ja) 2018-11-08 2019-11-06 噴霧デバイスおよび洗浄装置

Country Status (6)

Country Link
US (1) US11504727B2 (https=)
EP (1) EP3879562A4 (https=)
JP (1) JP7179985B2 (https=)
CN (1) CN111162023B (https=)
TW (1) TWI738108B (https=)
WO (1) WO2020094053A1 (https=)

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CN111696852A (zh) * 2020-06-22 2020-09-22 徐文凯 第三代半导体的清洗方法
CN113921425A (zh) * 2021-09-30 2022-01-11 北京北方华创微电子装备有限公司 半导体清洗设备及其控制方法
US20230415204A1 (en) * 2022-06-23 2023-12-28 Taiwan Semiconductor Manufacturing Company, Ltd. Wet cleaning tool and method
CN115213158B (zh) * 2022-08-05 2023-08-11 无锡京运通科技有限公司 制备薄片化单晶硅片减投清洗剂的加药装置
CN116145453B (zh) * 2022-09-08 2025-02-07 浙江临安金洲纸业有限公司 一种造纸用的清洗装置
CN115569897A (zh) * 2022-09-26 2023-01-06 厦门立林高压电气有限公司 电路板喷淋清洗设备
CN115709439B (zh) * 2022-11-03 2024-10-01 大连理工大学 一种增材制造槽道热管内壁的纳米多相射流复合抛光装置及方法
US20240153811A1 (en) * 2022-11-07 2024-05-09 Samsung Electronics Co., Ltd. Substrate processing apparatus and method for fabricating semiconductor device using the same
CN117165924B (zh) * 2023-11-03 2024-02-02 江苏微导纳米科技股份有限公司 一种喷淋装置、处理设备及处理设备的喷淋工艺
CN117690826B (zh) * 2023-12-12 2024-06-21 苏州恩腾半导体科技有限公司 一种晶圆处理系统和方法
CN118476884B (zh) * 2024-07-15 2024-09-20 南通大学附属医院 一种医用清洁喷嘴
CN120618725B (zh) * 2025-08-18 2025-12-16 上海芯源微企业发展有限公司 一种双流体喷嘴及基板处理设备

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