CN111162023B - 喷淋装置及清洗设备 - Google Patents

喷淋装置及清洗设备 Download PDF

Info

Publication number
CN111162023B
CN111162023B CN201811324019.6A CN201811324019A CN111162023B CN 111162023 B CN111162023 B CN 111162023B CN 201811324019 A CN201811324019 A CN 201811324019A CN 111162023 B CN111162023 B CN 111162023B
Authority
CN
China
Prior art keywords
liquid
channel
gas
nozzle
liquid inlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201811324019.6A
Other languages
English (en)
Chinese (zh)
Other versions
CN111162023A (zh
Inventor
刘伟
刘效岩
吴仪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Naura Microelectronics Equipment Co Ltd
Original Assignee
Beijing Naura Microelectronics Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Naura Microelectronics Equipment Co Ltd filed Critical Beijing Naura Microelectronics Equipment Co Ltd
Priority to CN201811324019.6A priority Critical patent/CN111162023B/zh
Priority to US17/288,461 priority patent/US11504727B2/en
Priority to TW108140270A priority patent/TWI738108B/zh
Priority to JP2021524229A priority patent/JP7179985B2/ja
Priority to EP19882402.1A priority patent/EP3879562A4/en
Priority to PCT/CN2019/115971 priority patent/WO2020094053A1/zh
Publication of CN111162023A publication Critical patent/CN111162023A/zh
Application granted granted Critical
Publication of CN111162023B publication Critical patent/CN111162023B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B5/00—Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
    • B05B5/025—Discharge apparatus, e.g. electrostatic spray guns
    • B05B5/03—Discharge apparatus, e.g. electrostatic spray guns characterised by the use of gas, e.g. electrostatically assisted pneumatic spraying
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • B05B17/06—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
    • B05B17/0607—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers
    • B05B17/0638—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers spray being produced by discharging the liquid or other fluent material through a plate comprising a plurality of orifices
    • B05B17/0646—Vibrating plates, i.e. plates being directly subjected to the vibrations, e.g. having a piezoelectric transducer attached thereto
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02—Spray pistols; Apparatus for discharge
    • B05B7/08—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point
    • B05B7/0892—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point the outlet orifices for jets constituted by a liquid or a mixture containing a liquid being disposed on a circle
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • B05B17/06—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
    • B05B17/0607—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers
    • B05B17/0653—Details
    • B05B17/0661—Transducer materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02—Spray pistols; Apparatus for discharge
    • B05B7/08—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point
    • B05B7/0807—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point to form intersecting jets

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Nozzles (AREA)
  • Cleaning By Liquid Or Steam (AREA)
CN201811324019.6A 2018-11-08 2018-11-08 喷淋装置及清洗设备 Active CN111162023B (zh)

Priority Applications (6)

Application Number Priority Date Filing Date Title
CN201811324019.6A CN111162023B (zh) 2018-11-08 2018-11-08 喷淋装置及清洗设备
US17/288,461 US11504727B2 (en) 2018-11-08 2019-11-06 Spray device and cleaning apparatus
TW108140270A TWI738108B (zh) 2018-11-08 2019-11-06 噴淋裝置及清洗設備
JP2021524229A JP7179985B2 (ja) 2018-11-08 2019-11-06 噴霧デバイスおよび洗浄装置
EP19882402.1A EP3879562A4 (en) 2018-11-08 2019-11-06 Spraying apparatus and cleaning device
PCT/CN2019/115971 WO2020094053A1 (zh) 2018-11-08 2019-11-06 喷淋装置及清洗设备

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201811324019.6A CN111162023B (zh) 2018-11-08 2018-11-08 喷淋装置及清洗设备

Publications (2)

Publication Number Publication Date
CN111162023A CN111162023A (zh) 2020-05-15
CN111162023B true CN111162023B (zh) 2023-03-21

Family

ID=70555383

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201811324019.6A Active CN111162023B (zh) 2018-11-08 2018-11-08 喷淋装置及清洗设备

Country Status (6)

Country Link
US (1) US11504727B2 (https=)
EP (1) EP3879562A4 (https=)
JP (1) JP7179985B2 (https=)
CN (1) CN111162023B (https=)
TW (1) TWI738108B (https=)
WO (1) WO2020094053A1 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CL2018000341A1 (es) * 2018-02-06 2018-07-06 Ingeagro Eirl Dispositivo y método de aplicación electrostática.
CN111696852A (zh) * 2020-06-22 2020-09-22 徐文凯 第三代半导体的清洗方法
CN113921425A (zh) * 2021-09-30 2022-01-11 北京北方华创微电子装备有限公司 半导体清洗设备及其控制方法
US20230415204A1 (en) * 2022-06-23 2023-12-28 Taiwan Semiconductor Manufacturing Company, Ltd. Wet cleaning tool and method
CN115213158B (zh) * 2022-08-05 2023-08-11 无锡京运通科技有限公司 制备薄片化单晶硅片减投清洗剂的加药装置
CN116145453B (zh) * 2022-09-08 2025-02-07 浙江临安金洲纸业有限公司 一种造纸用的清洗装置
CN115569897A (zh) * 2022-09-26 2023-01-06 厦门立林高压电气有限公司 电路板喷淋清洗设备
CN115709439B (zh) * 2022-11-03 2024-10-01 大连理工大学 一种增材制造槽道热管内壁的纳米多相射流复合抛光装置及方法
US20240153811A1 (en) * 2022-11-07 2024-05-09 Samsung Electronics Co., Ltd. Substrate processing apparatus and method for fabricating semiconductor device using the same
CN117165924B (zh) * 2023-11-03 2024-02-02 江苏微导纳米科技股份有限公司 一种喷淋装置、处理设备及处理设备的喷淋工艺
CN117690826B (zh) * 2023-12-12 2024-06-21 苏州恩腾半导体科技有限公司 一种晶圆处理系统和方法
CN118476884B (zh) * 2024-07-15 2024-09-20 南通大学附属医院 一种医用清洁喷嘴
CN120618725B (zh) * 2025-08-18 2025-12-16 上海芯源微企业发展有限公司 一种双流体喷嘴及基板处理设备

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005086214A1 (ja) * 2004-03-09 2005-09-15 Tokyo Electron Limited 基板洗浄用２流体ノズル及び基板洗浄装置
CN104908426A (zh) * 2014-03-12 2015-09-16 精工电子打印科技有限公司 液体喷射头和液体喷射装置
CN105344511A (zh) * 2015-12-10 2016-02-24 北京七星华创电子股份有限公司 一种可自清洁的二相流雾化喷射清洗装置及清洗方法
CN105413905A (zh) * 2015-12-10 2016-03-23 北京七星华创电子股份有限公司 一种二相流雾化喷射清洗装置及清洗方法
CN105513999A (zh) * 2015-12-10 2016-04-20 北京七星华创电子股份有限公司 一种具有气体保护的二相流雾化喷射清洗装置及清洗方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3561444A (en) * 1968-05-22 1971-02-09 Bio Logics Inc Ultrasonic drug nebulizer
US3866831A (en) * 1973-10-10 1975-02-18 Research Corp Pulsed ultrasonic nebulization system and method for flame spectroscopy
US4343433A (en) * 1977-09-29 1982-08-10 Ppg Industries, Inc. Internal-atomizing spray head with secondary annulus suitable for use with induction charging electrode
JPH01107860A (ja) * 1987-10-19 1989-04-25 Inoue Japax Res Inc 噴射ノズル
GB9306680D0 (en) * 1993-03-31 1993-05-26 The Technology Partnership Ltd Fluid droplet apparatus
JP2000000533A (ja) 1998-06-15 2000-01-07 Dainippon Screen Mfg Co Ltd 基板洗浄方法及び基板洗浄ノズル並びに基板洗浄装置
US7451774B2 (en) 2000-06-26 2008-11-18 Applied Materials, Inc. Method and apparatus for wafer cleaning
US6951221B2 (en) * 2000-09-22 2005-10-04 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus
US6705331B2 (en) * 2000-11-20 2004-03-16 Dainippon Screen Mfg., Co., Ltd. Substrate cleaning apparatus
US7524771B2 (en) * 2002-10-29 2009-04-28 Dainippon Screen Mfg. Co., Ltd. Substrate processing method using alkaline solution and acid solution
WO2009096346A1 (ja) * 2008-01-31 2009-08-06 Mitsubishi Electric Corporation 超音波発生装置及びそれを備えた設備機器
CN101607237B (zh) 2009-07-14 2011-06-15 武汉科技大学 一种气液两相旋流大口径细雾喷嘴
KR20110090120A (ko) * 2010-02-02 2011-08-10 주식회사 듀라소닉 초음파 세정장치 및 그 방법
JP5852898B2 (ja) * 2011-03-28 2016-02-03 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
CN103446691A (zh) 2013-09-13 2013-12-18 中国科学技术大学 一种基于气泡雾化的微水雾喷头
JP6282850B2 (ja) 2013-11-22 2018-02-21 株式会社荏原製作所 基板洗浄装置および基板処理装置
CN103779186B (zh) * 2014-02-20 2016-09-14 北京七星华创电子股份有限公司 气液两相雾化流量可控清洗装置及清洗方法
CN104772242B (zh) 2015-04-24 2017-07-18 河海大学常州校区 雾化喷嘴
CN105154614A (zh) 2015-09-29 2015-12-16 华北理工大学 一种超声波辅助雾化的双介质雾化喷嘴
US10304705B2 (en) * 2015-12-10 2019-05-28 Beijing Naura Microelectronics Equipment Co., Ltd. Cleaning device for atomizing and spraying liquid in two-phase flow
TWI600479B (zh) * 2016-08-26 2017-10-01 北京七星華創電子股份有限公司 超音波及百萬赫超音波清洗裝置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005086214A1 (ja) * 2004-03-09 2005-09-15 Tokyo Electron Limited 基板洗浄用２流体ノズル及び基板洗浄装置
CN104908426A (zh) * 2014-03-12 2015-09-16 精工电子打印科技有限公司 液体喷射头和液体喷射装置
CN105344511A (zh) * 2015-12-10 2016-02-24 北京七星华创电子股份有限公司 一种可自清洁的二相流雾化喷射清洗装置及清洗方法
CN105413905A (zh) * 2015-12-10 2016-03-23 北京七星华创电子股份有限公司 一种二相流雾化喷射清洗装置及清洗方法
CN105513999A (zh) * 2015-12-10 2016-04-20 北京七星华创电子股份有限公司 一种具有气体保护的二相流雾化喷射清洗装置及清洗方法

Also Published As

Publication number Publication date
CN111162023A (zh) 2020-05-15
JP7179985B2 (ja) 2022-11-29
JP2022506689A (ja) 2022-01-17
EP3879562A4 (en) 2022-07-20
TW202017662A (zh) 2020-05-16
WO2020094053A1 (zh) 2020-05-14
US20210379611A1 (en) 2021-12-09
TWI738108B (zh) 2021-09-01
EP3879562A1 (en) 2021-09-15
US11504727B2 (en) 2022-11-22

Similar Documents

Publication Publication Date Title
CN111162023B (zh) 喷淋装置及清洗设备
JP2022506689A5 (https=)
CN104841660B (zh) 气液两相雾化清洗装置及清洗方法
US10304705B2 (en) Cleaning device for atomizing and spraying liquid in two-phase flow
US20190054508A1 (en) Cleaning flat objects with a pulsed-liquid jet
KR101686290B1 (ko) 노즐, 기판처리장치, 및 기판처리방법
KR101486165B1 (ko) 기판처리장치 및 노즐
CN102842522B (zh) 双流体喷嘴、基板液处理装置和基板液处理方法
US20070234951A1 (en) Methods and apparatus for cleaning a substrate
US9460943B2 (en) Gas-liquid two-phase atomizing cleaning device and cleaning method
CN103779186B (zh) 气液两相雾化流量可控清洗装置及清洗方法
CN101770935B (zh) 旋涂器及用该旋涂器清洗衬底的方法
CN205200030U (zh) 具有超声或兆声振荡的二相流雾化清洗装置
JP5512424B2 (ja) 基板洗浄装置および基板洗浄方法
KR20180099024A (ko) 슬릿 타입의 분사구를 가지는 혼합 유체 분사 장치
JPWO2020094053A5 (https=)
KR101263602B1 (ko) 콘젯 모드 정전기 스프레이 장치
JP5837788B2 (ja) ノズル、基板処理装置、および基板処理方法
JP5785462B2 (ja) 基板処理装置および基板処理方法
CN112466783A (zh) 半导体工艺设备及其工艺腔室
JP2008130643A (ja) ノズル、基板処理装置および基板処理方法
KR101935573B1 (ko) 슬릿 타입의 분사구를 가지는 혼합 유체 분사 장치

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant