TWI738108B - 噴淋裝置及清洗設備 - Google Patents

噴淋裝置及清洗設備 Download PDF

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Publication number
TWI738108B
TWI738108B TW108140270A TW108140270A TWI738108B TW I738108 B TWI738108 B TW I738108B TW 108140270 A TW108140270 A TW 108140270A TW 108140270 A TW108140270 A TW 108140270A TW I738108 B TWI738108 B TW I738108B
Authority
TW
Taiwan
Prior art keywords
atomization
channel
cleaned
spray device
liquid
Prior art date
Application number
TW108140270A
Other languages
English (en)
Chinese (zh)
Other versions
TW202017662A (zh
Inventor
劉偉
劉效岩
吳儀
Original Assignee
大陸商北京北方華創微電子裝備有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 大陸商北京北方華創微電子裝備有限公司 filed Critical 大陸商北京北方華創微電子裝備有限公司
Publication of TW202017662A publication Critical patent/TW202017662A/zh
Application granted granted Critical
Publication of TWI738108B publication Critical patent/TWI738108B/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B5/00—Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
    • B05B5/025—Discharge apparatus, e.g. electrostatic spray guns
    • B05B5/03—Discharge apparatus, e.g. electrostatic spray guns characterised by the use of gas, e.g. electrostatically assisted pneumatic spraying
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • B05B17/06—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
    • B05B17/0607—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers
    • B05B17/0638—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers spray being produced by discharging the liquid or other fluent material through a plate comprising a plurality of orifices
    • B05B17/0646—Vibrating plates, i.e. plates being directly subjected to the vibrations, e.g. having a piezoelectric transducer attached thereto
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02—Spray pistols; Apparatus for discharge
    • B05B7/08—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point
    • B05B7/0892—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point the outlet orifices for jets constituted by a liquid or a mixture containing a liquid being disposed on a circle
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • B05B17/06—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
    • B05B17/0607—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers
    • B05B17/0653—Details
    • B05B17/0661—Transducer materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02—Spray pistols; Apparatus for discharge
    • B05B7/08—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point
    • B05B7/0807—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point to form intersecting jets

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Nozzles (AREA)
  • Cleaning By Liquid Or Steam (AREA)
TW108140270A 2018-11-08 2019-11-06 噴淋裝置及清洗設備 TWI738108B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201811324019.6 2018-11-08
CN201811324019.6A CN111162023B (zh) 2018-11-08 2018-11-08 喷淋装置及清洗设备

Publications (2)

Publication Number Publication Date
TW202017662A TW202017662A (zh) 2020-05-16
TWI738108B true TWI738108B (zh) 2021-09-01

Family

ID=70555383

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108140270A TWI738108B (zh) 2018-11-08 2019-11-06 噴淋裝置及清洗設備

Country Status (6)

Country Link
US (1) US11504727B2 (https=)
EP (1) EP3879562A4 (https=)
JP (1) JP7179985B2 (https=)
CN (1) CN111162023B (https=)
TW (1) TWI738108B (https=)
WO (1) WO2020094053A1 (https=)

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CL2018000341A1 (es) * 2018-02-06 2018-07-06 Ingeagro Eirl Dispositivo y método de aplicación electrostática.
CN111696852A (zh) * 2020-06-22 2020-09-22 徐文凯 第三代半导体的清洗方法
CN113921425A (zh) * 2021-09-30 2022-01-11 北京北方华创微电子装备有限公司 半导体清洗设备及其控制方法
US20230415204A1 (en) * 2022-06-23 2023-12-28 Taiwan Semiconductor Manufacturing Company, Ltd. Wet cleaning tool and method
CN115213158B (zh) * 2022-08-05 2023-08-11 无锡京运通科技有限公司 制备薄片化单晶硅片减投清洗剂的加药装置
CN116145453B (zh) * 2022-09-08 2025-02-07 浙江临安金洲纸业有限公司 一种造纸用的清洗装置
CN115569897A (zh) * 2022-09-26 2023-01-06 厦门立林高压电气有限公司 电路板喷淋清洗设备
CN115709439B (zh) * 2022-11-03 2024-10-01 大连理工大学 一种增材制造槽道热管内壁的纳米多相射流复合抛光装置及方法
US20240153811A1 (en) * 2022-11-07 2024-05-09 Samsung Electronics Co., Ltd. Substrate processing apparatus and method for fabricating semiconductor device using the same
CN117165924B (zh) * 2023-11-03 2024-02-02 江苏微导纳米科技股份有限公司 一种喷淋装置、处理设备及处理设备的喷淋工艺
CN117690826B (zh) * 2023-12-12 2024-06-21 苏州恩腾半导体科技有限公司 一种晶圆处理系统和方法
CN118476884B (zh) * 2024-07-15 2024-09-20 南通大学附属医院 一种医用清洁喷嘴
CN120618725B (zh) * 2025-08-18 2025-12-16 上海芯源微企业发展有限公司 一种双流体喷嘴及基板处理设备

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TW550630B (en) * 2000-06-26 2003-09-01 Applied Materials Inc Method and apparatus for wet processing wafers
CN101607237A (zh) * 2009-07-14 2009-12-23 武汉科技大学 一种气液两相旋流大口径细雾喷嘴
CN103446691A (zh) * 2013-09-13 2013-12-18 中国科学技术大学 一种基于气泡雾化的微水雾喷头
CN104772242A (zh) * 2015-04-24 2015-07-15 河海大学常州校区 雾化喷嘴
CN105513999A (zh) * 2015-12-10 2016-04-20 北京七星华创电子股份有限公司 一种具有气体保护的二相流雾化喷射清洗装置及清洗方法

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TW550630B (en) * 2000-06-26 2003-09-01 Applied Materials Inc Method and apparatus for wet processing wafers
CN101607237A (zh) * 2009-07-14 2009-12-23 武汉科技大学 一种气液两相旋流大口径细雾喷嘴
CN103446691A (zh) * 2013-09-13 2013-12-18 中国科学技术大学 一种基于气泡雾化的微水雾喷头
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Also Published As

Publication number Publication date
CN111162023A (zh) 2020-05-15
JP7179985B2 (ja) 2022-11-29
JP2022506689A (ja) 2022-01-17
CN111162023B (zh) 2023-03-21
EP3879562A4 (en) 2022-07-20
TW202017662A (zh) 2020-05-16
WO2020094053A1 (zh) 2020-05-14
US20210379611A1 (en) 2021-12-09
EP3879562A1 (en) 2021-09-15
US11504727B2 (en) 2022-11-22

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