JPWO2020085236A1 - 濃度測定装置 - Google Patents
濃度測定装置 Download PDFInfo
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- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
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- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
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- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
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- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
- G01N21/274—Calibration, base line adjustment, drift correction
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- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
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- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/02274—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
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Abstract
Description
Aλ=−log10(I/I0)=αLC ・・・(1)
2a NO2ガスソース
2b N2ガスソース
3 流量制御装置
10 チャンバ
10A 測定空間
12 サセプタ
14 シャワープレート
16 真空ポンプ
17 圧力センサ
18 温度センサ
20 濃度測定ユニット
21a 入射側光ファイバ
21b 出射側光ファイバ
22 光源
22a 第1発光素子
22b 第2発光素子
24 光検出器
26 演算制御回路
27 光源制御部
28 濃度演算部
30 測定セル
31 窓部
32 反射部材
Claims (3)
- 測定流体が流入する測定空間と、前記測定空間に入射させる光を発する光源と、前記測定空間から出射した光を受け取る光検出器と、前記光検出器の出力に基づいて前記測定流体の濃度を演算により求める演算制御回路とを備え、前記演算制御回路は、前記光検出器の信号に基づいて、ランベルト・ベールの法則を利用して濃度を求めるように構成されている濃度測定装置であって、
前記光源は、第1の波長の光を発生する第1の発光素子と、前記第1の波長とは異なる第2の波長の光を発生する第2の発光素子とを含み、前記測定流体の圧力または温度に基づいて、前記第1の波長の光または前記第2の波長の光のいずれかを用いて濃度を測定するように構成されている、濃度測定装置。 - 前記測定空間における流体温度を測定する温度センサをさらに備え、前記温度センサの出力に基づいて前記濃度を補正するように構成されている、請求項1に記載の濃度測定装置。
- 前記測定空間における流体圧力を測定する圧力センサをさらに備え、前記圧力センサの出力に基づいて前記濃度を補正するように構成されている、請求項1または2に記載の濃度測定装置。
Applications Claiming Priority (3)
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JP2018201838 | 2018-10-26 | ||
JP2018201838 | 2018-10-26 | ||
PCT/JP2019/041107 WO2020085236A1 (ja) | 2018-10-26 | 2019-10-18 | 濃度測定装置 |
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JPWO2020085236A1 true JPWO2020085236A1 (ja) | 2021-09-16 |
JPWO2020085236A5 JPWO2020085236A5 (ja) | 2022-07-25 |
JP7323945B2 JP7323945B2 (ja) | 2023-08-09 |
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US (1) | US11686671B2 (ja) |
JP (1) | JP7323945B2 (ja) |
KR (1) | KR102498481B1 (ja) |
CN (1) | CN112805551A (ja) |
TW (1) | TWI734226B (ja) |
WO (1) | WO2020085236A1 (ja) |
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US20230168192A1 (en) * | 2021-11-29 | 2023-06-01 | Asahi Kasei Microdevices Corporation | Concentration measurement apparatus and concentration measurement method |
Citations (4)
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JP2011021996A (ja) * | 2009-07-15 | 2011-02-03 | Nippon Soken Inc | ガス濃度計測装置 |
JP2013050403A (ja) * | 2011-08-31 | 2013-03-14 | Shimadzu Corp | ガス分析装置 |
WO2016047168A1 (ja) * | 2014-09-22 | 2016-03-31 | 株式会社 東芝 | ガス分析装置及びガス処理装置 |
WO2016080532A1 (ja) * | 2014-11-23 | 2016-05-26 | 株式会社フジキン | 光学的ガス濃度測定方法及び該方法によるガス濃度モニター方法 |
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JPH09318528A (ja) * | 1996-05-28 | 1997-12-12 | Matsushita Electric Works Ltd | ガスセンサ |
JP4669193B2 (ja) | 2002-10-16 | 2011-04-13 | 忠弘 大見 | 圧力式流量制御装置の温度測定装置 |
EP1586674A1 (en) * | 2004-04-14 | 2005-10-19 | Nederlandse Organisatie voor Toegepast-Natuuurwetenschappelijk Onderzoek TNO | Coatings, and methods and devices for the manufacture thereof |
JP2009041941A (ja) * | 2007-08-06 | 2009-02-26 | Fuji Electric Systems Co Ltd | ガス濃度測定装置およびガス濃度測定方法 |
WO2012066930A1 (ja) * | 2010-11-16 | 2012-05-24 | 株式会社 日立メディコ | 生体光計測装置とその作動方法 |
JP5885699B2 (ja) | 2013-05-09 | 2016-03-15 | 株式会社フジキン | 脆性破壊性光透過窓板の固定構造及びこれを用いた脆性破壊性光透過窓板の固定方法 |
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US9638630B2 (en) * | 2013-11-21 | 2017-05-02 | TOTAL Gas Detection Ltd. | Methods and devices for analyzing gases in well-related fluids using fourier transform infrared (FTIR) spectroscopy |
AT518433B1 (de) * | 2016-04-18 | 2017-10-15 | Scan Messtechnik Ges Mbh | Spektrometer und Verfahren zur Untersuchung der Inhaltsstoffe eines Fluids |
JP6912766B2 (ja) * | 2016-07-29 | 2021-08-04 | 国立大学法人徳島大学 | 濃度測定装置 |
JP6786099B2 (ja) * | 2016-08-12 | 2020-11-18 | 株式会社フジキン | 濃度測定装置 |
DE202017001743U1 (de) * | 2017-03-31 | 2017-05-08 | Siemens Aktiengesellschaft | Gasanalysator |
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2019
- 2019-10-18 WO PCT/JP2019/041107 patent/WO2020085236A1/ja active Application Filing
- 2019-10-18 CN CN201980065598.3A patent/CN112805551A/zh active Pending
- 2019-10-18 US US17/288,300 patent/US11686671B2/en active Active
- 2019-10-18 JP JP2020553343A patent/JP7323945B2/ja active Active
- 2019-10-18 KR KR1020217009231A patent/KR102498481B1/ko active IP Right Grant
- 2019-10-22 TW TW108137985A patent/TWI734226B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2011021996A (ja) * | 2009-07-15 | 2011-02-03 | Nippon Soken Inc | ガス濃度計測装置 |
JP2013050403A (ja) * | 2011-08-31 | 2013-03-14 | Shimadzu Corp | ガス分析装置 |
WO2016047168A1 (ja) * | 2014-09-22 | 2016-03-31 | 株式会社 東芝 | ガス分析装置及びガス処理装置 |
WO2016080532A1 (ja) * | 2014-11-23 | 2016-05-26 | 株式会社フジキン | 光学的ガス濃度測定方法及び該方法によるガス濃度モニター方法 |
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KR102498481B1 (ko) | 2023-02-10 |
US11686671B2 (en) | 2023-06-27 |
US20210396657A1 (en) | 2021-12-23 |
WO2020085236A1 (ja) | 2020-04-30 |
TWI734226B (zh) | 2021-07-21 |
KR20210048542A (ko) | 2021-05-03 |
JP7323945B2 (ja) | 2023-08-09 |
CN112805551A (zh) | 2021-05-14 |
TW202018274A (zh) | 2020-05-16 |
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