JPWO2019003305A1 - 有機elデバイスの製造方法 - Google Patents
有機elデバイスの製造方法 Download PDFInfo
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Abstract
Description
2 :バックプレーン(回路)
3 :有機EL素子
4 :偏光板
10 :薄膜封止構造(TFE構造)
12 :第1無機バリア層(SiNx層)
14 :有機バリア層(アクリル樹脂層)
16 :第2無機バリア層(SiNx層)
20 :素子基板
26 :アクリルモノマー
26p :アクリルモノマーの蒸気または霧状のアクリルモノマー
100、100C :有機EL表示装置
200 :成膜装置
Claims (12)
- 有機ELデバイスの製造方法であって、
前記有機ELデバイスは、基板と、前記基板上に形成された複数のTFTと、それぞれが前記複数のTFTのいずれかに接続された複数のゲートバスラインおよび複数のソースバスラインと、複数の端子と、前記複数の端子と前記複数のゲートバスラインまたは前記複数のソースバスラインのいずれかとを接続する複数の引出し配線とを有する、駆動回路層と、前記駆動回路層上に形成され、少なくとも前記複数の端子を露出する無機保護層と、前記無機保護層上に形成された有機平坦化層と、前記有機平坦化層上に形成され、それぞれが前記複数のTFTのいずれかに接続された複数の有機EL素子を有する有機EL素子層と、前記有機EL素子層を覆うように形成された薄膜封止構造とを有し、
前記製造方法は、
前記基板上に前記駆動回路層を形成する工程Aと、
前記駆動回路層上に前記無機保護層を形成する工程Bと、
前記無機保護層上に前記有機平坦化層を形成する工程Cと、
前記有機平坦化層を200℃以上の温度に加熱する工程Dと、
前記加熱工程の後に、前記有機平坦化層上に、前記有機EL素子層を形成する工程Eと
を包含し、
前記工程Cの後、かつ前記工程Dの前に、前記有機平坦化層を覆う有機高分子膜を形成する工程C1と、前記有機高分子膜を除去する工程C2とをさらに包含する、製造方法。 - 前記工程C1と前記工程C2との間に、前記有機高分子膜が形成された前記基板を保管または運搬する工程をさらに包含する、請求項1に記載の製造方法。
- 前記工程C1は、前記有機高分子の溶液を前記有機平坦化層上に付与する工程を包含する、請求項1また2に記載の製造方法。
- 前記有機高分子膜は、水溶性高分子から形成されている、請求項1から3のいずれかに記載の製造方法。
- 前記工程C2は、水系溶媒で前記有機高分子膜を溶解させる工程を包含する、請求項4に記載の製造方法。
- 前記水溶性高分子は、ポリビニルアルコールである、請求項4または5に記載の製造方法。
- 前記有機平坦化層は、感光性を有する樹脂から形成されている、請求項1から6のいずれかに記載の製造方法。
- 前記有機平坦化層は、ポリイミドから形成されている、請求項1から7のいずれかに記載の製造方法。
- 前記基板の法線方向から見たとき、前記無機保護層が形成された領域内に、前記有機平坦化層が形成されており、前記有機平坦化層が形成された領域内に、前記複数の有機EL素子が配置されており、前記薄膜封止構造の外縁は、前記複数の引出し配線と交差し、かつ、前記有機平坦化層の外縁と前記無機保護層の外縁との間に存在し、
前記複数の引出し配線の上で前記無機保護層と前記第1無機バリア層とが直接接触する部分において、前記第1無機バリア層の、前記複数の引出し配線の線幅方向に平行な断面の形状における側面のテーパー角は、90°未満である、請求項1から8のいずれかに記載の製造方法。 - 前記第1無機バリア層の前記側面の前記テーパー角は70°未満である、請求項9に記載の製造方法。
- 前記工程Eの後で、前記複数の有機EL素子が形成されたアクティブ領域に選択的に前記第1無機バリア層を形成する工程Fと、
前記工程Fの後で、前記基板をチャンバー内に配置し、前記チャンバー内に蒸気または霧状の光硬化性樹脂を供給する工程Gと、
前記第1無機バリア層上で光硬化性樹脂を凝縮させる工程であって、前記テーパー角が90°未満の前記第1無機バリア層の部分の上には、前記光硬化性樹脂を存在させないように、前記光硬化性樹脂を凝縮させる工程Hと、
前記工程Hの後に、前記凝縮された前記光硬化性樹脂に光を照射することによって、光硬化樹脂からなる前記有機バリア層を形成する工程Iと
を包含する、請求項9または10に記載の製造方法。 - 前記工程Eの後で、前記複数の有機EL素子が形成されたアクティブ領域に選択的に前記第1無機バリア層を形成する工程Fと、
前記工程Fの後で、前記基板をチャンバー内に配置し、前記チャンバー内に蒸気または霧状の光硬化性樹脂を供給する工程Gと、
前記第1無機バリア層上で前記光硬化性樹脂を凝縮させ、液状の膜を形成する工程Hと、
前記光硬化性樹脂の前記液状の膜に光を照射することによって、光硬化樹脂層を形成する工程Iと、
前記光硬化樹脂層を部分的にアッシングすることによって、前記有機バリア層を形成する工程Jと
を包含する、請求項9または10に記載の製造方法。
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