JPWO2018226468A5 - - Google Patents

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JPWO2018226468A5
JPWO2018226468A5 JP2019567599A JP2019567599A JPWO2018226468A5 JP WO2018226468 A5 JPWO2018226468 A5 JP WO2018226468A5 JP 2019567599 A JP2019567599 A JP 2019567599A JP 2019567599 A JP2019567599 A JP 2019567599A JP WO2018226468 A5 JPWO2018226468 A5 JP WO2018226468A5
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measurements
pulsing
current
data acquisition
period
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JP2019567599A
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JP2020523739A5 (https=
JP7536451B2 (ja
JP2020523739A (ja
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JP2019567599A 2017-06-08 2018-05-30 トランス結合容量性同調切り替えを用いたトランス結合プラズマパルス化のためのシステムおよび方法 Active JP7536451B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/617,366 2017-06-08
US15/617,366 US10734195B2 (en) 2017-06-08 2017-06-08 Systems and methods for transformer coupled plasma pulsing with transformer coupled capacitive tuning switching
PCT/US2018/035026 WO2018226468A1 (en) 2017-06-08 2018-05-30 Systems and methods for transformer coupled plasma pulsing with transformer coupled capacitive tuning switching

Publications (4)

Publication Number Publication Date
JP2020523739A JP2020523739A (ja) 2020-08-06
JPWO2018226468A5 true JPWO2018226468A5 (https=) 2023-03-14
JP2020523739A5 JP2020523739A5 (https=) 2023-03-14
JP7536451B2 JP7536451B2 (ja) 2024-08-20

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JP2019567599A Active JP7536451B2 (ja) 2017-06-08 2018-05-30 トランス結合容量性同調切り替えを用いたトランス結合プラズマパルス化のためのシステムおよび方法

Country Status (6)

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US (1) US10734195B2 (https=)
JP (1) JP7536451B2 (https=)
KR (1) KR102621966B1 (https=)
CN (1) CN110709961B (https=)
TW (1) TWI787276B (https=)
WO (1) WO2018226468A1 (https=)

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US11114279B2 (en) 2019-06-28 2021-09-07 COMET Technologies USA, Inc. Arc suppression device for plasma processing equipment
CN112509899B (zh) * 2019-09-16 2024-02-09 中微半导体设备(上海)股份有限公司 电感耦合等离子体处理装置及其点火控制方法
TW202601749A (zh) * 2020-03-19 2026-01-01 美商蘭姆研究公司 基板處理系統
TW202215485A (zh) * 2020-06-12 2022-04-16 美商蘭姆研究公司 用於離子損傷減輕及蝕刻均勻度改善之脈動遠程電漿
US12609283B2 (en) * 2020-06-15 2026-04-21 Lam Research Corporation Control of pulsing frequencies and duty cycles of parameters of RF signals
CN112016676B (zh) * 2020-08-18 2021-07-02 武汉大学 一种神经网络模型预测的半导体薄膜工艺参数优化系统
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