JPWO2018190408A1 - 光学素子及び光学薄膜 - Google Patents
光学素子及び光学薄膜 Download PDFInfo
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- JPWO2018190408A1 JPWO2018190408A1 JP2019512571A JP2019512571A JPWO2018190408A1 JP WO2018190408 A1 JPWO2018190408 A1 JP WO2018190408A1 JP 2019512571 A JP2019512571 A JP 2019512571A JP 2019512571 A JP2019512571 A JP 2019512571A JP WO2018190408 A1 JPWO2018190408 A1 JP WO2018190408A1
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- 230000003287 optical effect Effects 0.000 title claims abstract description 61
- 239000010409 thin film Substances 0.000 title claims abstract description 20
- 239000010408 film Substances 0.000 claims abstract description 249
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 14
- 238000010894 electron beam technology Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 8
- 238000007740 vapor deposition Methods 0.000 claims description 8
- 238000001704 evaporation Methods 0.000 claims description 5
- 230000008020 evaporation Effects 0.000 claims description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 2
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 38
- 230000003595 spectral effect Effects 0.000 description 12
- 238000000034 method Methods 0.000 description 9
- 238000002474 experimental method Methods 0.000 description 8
- 230000008859 change Effects 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 230000000717 retained effect Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 239000012788 optical film Substances 0.000 description 2
- 230000007480 spreading Effects 0.000 description 2
- 238000003892 spreading Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000013032 photocatalytic reaction Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
したがって、気孔率は、
気孔率(%)=100(%)−充填率(%)
として求めることができる。
Claims (6)
- 光学素子本体と、
前記光学素子本体の表面上に形成された多層膜である光学薄膜とを備え、
前記光学薄膜において、
最上層の膜が、多孔質の膜である親水性膜であり、
前記最上層の次の膜が、緻密質の膜である下地膜であり、
前記親水性膜の気孔率は、2%以上20%以下であり、
前記親水性膜の物理膜厚は、0.5nm以上20nm以下であり、
前記下地膜の気孔率は、2%未満である、
光学素子。 - 前記親水性膜及び前記下地膜の少なくとも一方は、SiO2、ZrO2、Al2O3、TiO2、Ti3O5、Ta2O5及びNb2O5のうちの単体若しくはこれらを含む混合材である、
請求項1記載の光学素子。 - 前記親水性膜が、SiO2膜である、
請求項2記載の光学素子。 - 前記下地膜が、SiO2膜である、
請求項2又は3記載の光学素子。 - 前記親水性膜が、EB(電子ビーム)蒸着により形成された膜であり、
前記下地膜が、IAD(イオンアシスト蒸着)により形成された膜である、請求項1乃至3のうちのいずれか1項に記載の光学素子。 - 多層膜である光学薄膜であって、
最上層の膜が、多孔質の膜である親水性膜であり、
前記最上層の次の膜が、緻密質の膜である下地膜であり、
前記親水性膜の気孔率は、2%以上20%以下であり、
前記親水性膜の物理膜厚は、0.5nm以上20nm以下であり、
前記下地膜の気孔率は、2%未満である、
光学薄膜。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017080463 | 2017-04-14 | ||
JP2017080463 | 2017-04-14 | ||
PCT/JP2018/015466 WO2018190408A1 (ja) | 2017-04-14 | 2018-04-13 | 光学素子及び光学薄膜 |
Publications (2)
Publication Number | Publication Date |
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JPWO2018190408A1 true JPWO2018190408A1 (ja) | 2020-03-05 |
JP7091315B2 JP7091315B2 (ja) | 2022-06-27 |
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JP2019512571A Active JP7091315B2 (ja) | 2017-04-14 | 2018-04-13 | 光学素子及びその製造方法 |
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JP (1) | JP7091315B2 (ja) |
CN (1) | CN110691995B (ja) |
WO (1) | WO2018190408A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN115702369A (zh) * | 2020-06-23 | 2023-02-14 | 柯尼卡美能达株式会社 | 亲水性膜的制造方法、亲水性膜和光学部件 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09207289A (ja) * | 1996-02-07 | 1997-08-12 | Nitto Denko Corp | 膜構造材及びその製造方法 |
WO2000018504A1 (fr) * | 1998-09-30 | 2000-04-06 | Nippon Sheet Glass Co., Ltd. | Article photocatalyseur, article protege contre l'encrassement et le voilement, et procede de production d'un article protege contre l'encrassement et le voilement |
WO2004108283A1 (ja) * | 2003-06-09 | 2004-12-16 | Nippon Sheet Glass Co., Ltd. | 光触媒部材 |
JP2012237941A (ja) * | 2011-05-13 | 2012-12-06 | Asahi Glass Co Ltd | 光学部品、光学装置 |
US20140178657A1 (en) * | 2012-12-21 | 2014-06-26 | Intermolecular Inc. | Antireflection coatings |
JP2016001200A (ja) * | 2012-10-15 | 2016-01-07 | 旭硝子株式会社 | 防汚性反射防止膜、物品およびその製造方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1405718A1 (en) * | 2001-06-11 | 2004-04-07 | Murakami Corporation | Antifogging element and method for forming the same |
JP5266019B2 (ja) * | 2008-11-10 | 2013-08-21 | 学校法人慶應義塾 | 反射防止膜、その形成方法、光学素子、交換レンズ及び撮像装置 |
US20150232673A1 (en) * | 2012-09-26 | 2015-08-20 | 3M Innovative Properties Company | Coatable composition, soil-resistant composition, soil-resistant articles, and methods of making the same |
-
2018
- 2018-04-13 CN CN201880024875.1A patent/CN110691995B/zh active Active
- 2018-04-13 WO PCT/JP2018/015466 patent/WO2018190408A1/ja active Application Filing
- 2018-04-13 JP JP2019512571A patent/JP7091315B2/ja active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09207289A (ja) * | 1996-02-07 | 1997-08-12 | Nitto Denko Corp | 膜構造材及びその製造方法 |
WO2000018504A1 (fr) * | 1998-09-30 | 2000-04-06 | Nippon Sheet Glass Co., Ltd. | Article photocatalyseur, article protege contre l'encrassement et le voilement, et procede de production d'un article protege contre l'encrassement et le voilement |
WO2004108283A1 (ja) * | 2003-06-09 | 2004-12-16 | Nippon Sheet Glass Co., Ltd. | 光触媒部材 |
JP2012237941A (ja) * | 2011-05-13 | 2012-12-06 | Asahi Glass Co Ltd | 光学部品、光学装置 |
JP2016001200A (ja) * | 2012-10-15 | 2016-01-07 | 旭硝子株式会社 | 防汚性反射防止膜、物品およびその製造方法 |
US20140178657A1 (en) * | 2012-12-21 | 2014-06-26 | Intermolecular Inc. | Antireflection coatings |
Also Published As
Publication number | Publication date |
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WO2018190408A1 (ja) | 2018-10-18 |
CN110691995B (zh) | 2021-11-26 |
CN110691995A (zh) | 2020-01-14 |
JP7091315B2 (ja) | 2022-06-27 |
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