JPWO2017038733A1 - 光電変換素子 - Google Patents
光電変換素子 Download PDFInfo
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- JPWO2017038733A1 JPWO2017038733A1 JP2017537874A JP2017537874A JPWO2017038733A1 JP WO2017038733 A1 JPWO2017038733 A1 JP WO2017038733A1 JP 2017537874 A JP2017537874 A JP 2017537874A JP 2017537874 A JP2017537874 A JP 2017537874A JP WO2017038733 A1 JPWO2017038733 A1 JP WO2017038733A1
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 78
- 239000004065 semiconductor Substances 0.000 claims abstract description 355
- 239000000758 substrate Substances 0.000 claims abstract description 95
- 239000010408 film Substances 0.000 description 243
- 238000004519 manufacturing process Methods 0.000 description 42
- 238000000034 method Methods 0.000 description 30
- 230000002093 peripheral effect Effects 0.000 description 24
- 229910021417 amorphous silicon Inorganic materials 0.000 description 13
- 239000012535 impurity Substances 0.000 description 7
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022416—Electrodes for devices characterised by at least one potential jump barrier or surface barrier comprising ring electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/022441—Electrode arrangements specially adapted for back-contact solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
- H01L31/0745—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type comprising a AIVBIV heterojunction, e.g. Si/Ge, SiGe/Si or Si/SiC solar cells
- H01L31/0747—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type comprising a AIVBIV heterojunction, e.g. Si/Ge, SiGe/Si or Si/SiC solar cells comprising a heterojunction of crystalline and amorphous materials, e.g. heterojunction with intrinsic thin layer or HIT® solar cells; solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PIN type
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Energy (AREA)
- Sustainable Development (AREA)
- Photovoltaic Devices (AREA)
Abstract
Description
<ヘテロ接合型バックコンタクトセルの構成>
図1に、実施形態1のヘテロ接合型バックコンタクトセルの裏面の模式的な拡大平面図を示す。図1に示すように、実施形態1のヘテロ接合型バックコンタクトセルは、n型半導体基板1の第1の面の一例である裏面の側にp電極7とn電極8とを有している。
以下、図3〜図7の模式的断面図を参照して、実施形態1のヘテロ接合型バックコンタクトセルの製造方法の一例について説明する。まず、図3に示すように、n型半導体基板1の裏面1aの全面に接するとともに、n型半導体基板1の裏面1aの裏面1aの外周端部1d上を通って側面1cの受光面1b側の端部まで延在するように第1のi型非晶質半導体膜2を形成し、引き続いて、p型非晶質半導体膜3を形成する。第1のi型非晶質半導体膜2およびp型非晶質半導体膜3の形成方法は特に限定されないが、たとえばプラズマCVD法を用いることができる。
図8に、実施形態2のヘテロ接合型バックコンタクトセルの裏面の外周端部近傍の模式的な拡大断面図を示す。実施形態2のヘテロ接合型バックコンタクトセルは、実施形態1のヘテロ接合型バックコンタクトセルとは外周端部近傍の構成が異なることを特徴としている。
図13に、実施形態3のヘテロ接合型バックコンタクトセルの外周端部近傍の模式的な拡大断面図を示す。実施形態3のヘテロ接合型バックコンタクトセルは、実施形態1および実施形態2のヘテロ接合型バックコンタクトセルとは外周端部近傍の構成が異なることを特徴としている。
(1)ここで開示された実施形態は、n型の半導体基板と、半導体基板の第1の面側および側面上のp型非晶質半導体膜と、半導体基板の第1の面側のn型非晶質半導体膜と、p型非晶質半導体膜上のp電極と、n型非晶質半導体膜上のn電極とを備え、p電極は、半導体基板の第1の面側および側面上に配置されたp型非晶質半導体膜上に位置している光電変換素子である。この場合には、従来の裏面接合型太陽電池と比べて電流の収集量を向上することができるため、従来よりも光電変換効率を向上することが可能となる。
Claims (5)
- n型の半導体基板と、
前記半導体基板の第1の面側および側面上のp型非晶質半導体膜と、
前記半導体基板の前記第1の面側のn型非晶質半導体膜と、
前記p型非晶質半導体膜上のp電極と、
前記n型非晶質半導体膜上のn電極と、を備え、
前記p電極は、前記半導体基板の第1の面側および側面上に配置された前記p型非晶質半導体膜上に位置している、光電変換素子。 - 前記半導体基板の前記側面上において、前記p型非晶質半導体膜は、前記p電極よりも長く延在している、請求項1に記載の光電変換素子。
- 前記n電極は、アイランド状である、請求項1または請求項2に記載の光電変換素子。
- 前記p電極は、前記n電極と間隔を空けて、前記n電極を取り囲んでいる、請求項3に記載の光電変換素子。
- 前記半導体基板と前記p型非晶質半導体膜との間に第1のi型非晶質半導体膜をさらに備え、
前記半導体基板と前記n型非晶質半導体膜との間に第2のi型非晶質半導体膜をさらに備える、請求項1〜請求項4のいずれか1項に記載の光電変換素子。
Applications Claiming Priority (3)
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JP2015170647 | 2015-08-31 | ||
JP2015170647 | 2015-08-31 | ||
PCT/JP2016/075121 WO2017038733A1 (ja) | 2015-08-31 | 2016-08-29 | 光電変換素子 |
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JPWO2017038733A1 true JPWO2017038733A1 (ja) | 2018-06-14 |
JP6762304B2 JP6762304B2 (ja) | 2020-09-30 |
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US (1) | US10505055B2 (ja) |
EP (1) | EP3346506B1 (ja) |
JP (1) | JP6762304B2 (ja) |
CN (1) | CN107924958B (ja) |
WO (1) | WO2017038733A1 (ja) |
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CN109564946B (zh) * | 2016-08-15 | 2023-10-03 | 夏普株式会社 | 光电转换元件以及光电转换装置 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH10190022A (ja) * | 1996-12-24 | 1998-07-21 | Mitsubishi Electric Corp | 薄膜太陽電池およびその製造方法 |
JP2009088203A (ja) * | 2007-09-28 | 2009-04-23 | Sanyo Electric Co Ltd | 太陽電池、太陽電池モジュール及び太陽電池の製造方法 |
JP2011035092A (ja) * | 2009-07-31 | 2011-02-17 | Sanyo Electric Co Ltd | 裏面接合型太陽電池及びそれを用いた太陽電池モジュール |
US20120138128A1 (en) * | 2010-12-01 | 2012-06-07 | Industrial Technology Research Institute | Solar Cell |
JP2013102217A (ja) * | 2009-09-29 | 2013-05-23 | Kyocera Corp | 太陽電池素子および太陽電池モジュール |
JP2014072343A (ja) * | 2012-09-28 | 2014-04-21 | Panasonic Corp | 光起電力装置 |
WO2014157525A1 (ja) * | 2013-03-28 | 2014-10-02 | シャープ株式会社 | 光電変換素子 |
Family Cites Families (9)
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JPS5742173A (en) * | 1980-08-27 | 1982-03-09 | Mitsubishi Electric Corp | Amorphous solar battery |
JPS6482570A (en) * | 1987-09-24 | 1989-03-28 | Mitsubishi Electric Corp | Manufacture of photoelectric conversion device |
US20060130891A1 (en) * | 2004-10-29 | 2006-06-22 | Carlson David E | Back-contact photovoltaic cells |
JP2008294080A (ja) * | 2007-05-22 | 2008-12-04 | Sanyo Electric Co Ltd | 太陽電池セル及び太陽電池セルの製造方法 |
CN102369601B (zh) * | 2009-03-30 | 2015-04-29 | 三洋电机株式会社 | 太阳能电池 |
JP5845445B2 (ja) * | 2010-01-26 | 2016-01-20 | パナソニックIpマネジメント株式会社 | 太陽電池及びその製造方法 |
US20120013812A1 (en) * | 2010-07-13 | 2012-01-19 | Jacques Gollier | Systems And Methods For Reducing Speckle In Laser Projected Images |
JP2013219065A (ja) | 2010-08-06 | 2013-10-24 | Sanyo Electric Co Ltd | 太陽電池及び太陽電池の製造方法 |
JP6071293B2 (ja) * | 2012-07-18 | 2017-02-01 | シャープ株式会社 | 光電変換素子および光電変換素子の製造方法 |
-
2016
- 2016-08-29 US US15/756,061 patent/US10505055B2/en active Active
- 2016-08-29 JP JP2017537874A patent/JP6762304B2/ja active Active
- 2016-08-29 CN CN201680050114.4A patent/CN107924958B/zh active Active
- 2016-08-29 WO PCT/JP2016/075121 patent/WO2017038733A1/ja active Application Filing
- 2016-08-29 EP EP16841765.7A patent/EP3346506B1/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH10190022A (ja) * | 1996-12-24 | 1998-07-21 | Mitsubishi Electric Corp | 薄膜太陽電池およびその製造方法 |
JP2009088203A (ja) * | 2007-09-28 | 2009-04-23 | Sanyo Electric Co Ltd | 太陽電池、太陽電池モジュール及び太陽電池の製造方法 |
JP2011035092A (ja) * | 2009-07-31 | 2011-02-17 | Sanyo Electric Co Ltd | 裏面接合型太陽電池及びそれを用いた太陽電池モジュール |
JP2013102217A (ja) * | 2009-09-29 | 2013-05-23 | Kyocera Corp | 太陽電池素子および太陽電池モジュール |
US20120138128A1 (en) * | 2010-12-01 | 2012-06-07 | Industrial Technology Research Institute | Solar Cell |
JP2014072343A (ja) * | 2012-09-28 | 2014-04-21 | Panasonic Corp | 光起電力装置 |
WO2014157525A1 (ja) * | 2013-03-28 | 2014-10-02 | シャープ株式会社 | 光電変換素子 |
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EP3346506A4 (en) | 2018-09-12 |
US10505055B2 (en) | 2019-12-10 |
CN107924958A (zh) | 2018-04-17 |
WO2017038733A1 (ja) | 2017-03-09 |
EP3346506B1 (en) | 2020-04-01 |
US20180248054A1 (en) | 2018-08-30 |
CN107924958B (zh) | 2020-02-04 |
JP6762304B2 (ja) | 2020-09-30 |
EP3346506A1 (en) | 2018-07-11 |
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