JPWO2016140321A1 - 膜厚監視装置用センサ、それを備えた膜厚監視装置、および膜厚監視装置用センサの製造方法 - Google Patents

膜厚監視装置用センサ、それを備えた膜厚監視装置、および膜厚監視装置用センサの製造方法 Download PDF

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Publication number
JPWO2016140321A1
JPWO2016140321A1 JP2016540712A JP2016540712A JPWO2016140321A1 JP WO2016140321 A1 JPWO2016140321 A1 JP WO2016140321A1 JP 2016540712 A JP2016540712 A JP 2016540712A JP 2016540712 A JP2016540712 A JP 2016540712A JP WO2016140321 A1 JPWO2016140321 A1 JP WO2016140321A1
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Prior art keywords
film thickness
crystal resonator
frequency
axis
thickness monitoring
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Japanese (ja)
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伊藤　敦
敦 伊藤
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Ulvac Inc
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Ulvac Inc
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
    • G01B21/08—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N5/00—Analysing materials by weighing, e.g. weighing small particles separated from a gas or liquid
    • G01N5/02—Analysing materials by weighing, e.g. weighing small particles separated from a gas or liquid by absorbing or adsorbing components of a material and determining change of weight of the adsorbent, e.g. determining moisture content

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  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
  • Physical Vapour Deposition (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
JP2016540712A 2015-03-03 2016-03-03 膜厚監視装置用センサ、それを備えた膜厚監視装置、および膜厚監視装置用センサの製造方法 Pending JPWO2016140321A1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015041065 2015-03-03
JP2015041065 2015-03-03
PCT/JP2016/056647 WO2016140321A1 (ja) 2015-03-03 2016-03-03 膜厚監視装置用センサ、それを備えた膜厚監視装置、および膜厚監視装置用センサの製造方法

Publications (1)

Publication Number Publication Date
JPWO2016140321A1 true JPWO2016140321A1 (ja) 2017-04-27

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JP2016540712A Pending JPWO2016140321A1 (ja) 2015-03-03 2016-03-03 膜厚監視装置用センサ、それを備えた膜厚監視装置、および膜厚監視装置用センサの製造方法

Country Status (5)

Country Link
JP (1) JPWO2016140321A1 (ko)
KR (1) KR20160124170A (ko)
CN (1) CN106104251A (ko)
SG (1) SG11201607500PA (ko)
WO (1) WO2016140321A1 (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6873638B2 (ja) * 2016-09-23 2021-05-19 太陽誘電株式会社 ガスセンサ及びガス検出方法
JP7064407B2 (ja) * 2018-08-31 2022-05-10 キヤノントッキ株式会社 成膜装置及び成膜装置の制御方法
JP7503481B2 (ja) 2020-11-17 2024-06-20 株式会社アルバック 膜厚モニタ
CN112458407B (zh) * 2020-11-27 2023-06-02 江苏集萃有机光电技术研究所有限公司 一种晶振测量系统及测量方法和装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4375604A (en) * 1981-02-27 1983-03-01 The United States Of America As Represented By The Secretary Of The Army Method of angle correcting doubly rotated crystal resonators
JPH03218411A (ja) * 1990-01-24 1991-09-26 Nippon Dempa Kogyo Co Ltd モニタ用水晶振動子及びこれを用いた膜厚制御装置
US6147437A (en) * 1999-08-11 2000-11-14 Schlumberger Technology Corporation Pressure and temperature transducer
JP2006292733A (ja) * 2005-03-15 2006-10-26 Yoshinori Kanno 水晶マイクロバランスセンサー装置
JP2012127711A (ja) * 2010-12-14 2012-07-05 Ulvac Japan Ltd 真空蒸着装置及び薄膜の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5321496A (en) * 1990-03-14 1994-06-14 Zellweger Uster, Inc. Apparatus for monitoring trash in a fiber sample
JP2003218411A (ja) * 2002-01-21 2003-07-31 Matsushita Electric Ind Co Ltd 熱電変換材料、その製造方法および薄膜熱電変換素子
JP4388443B2 (ja) 2004-09-09 2009-12-24 株式会社アルバック 膜厚監視方法および膜厚監視装置
US7828929B2 (en) * 2004-12-30 2010-11-09 Research Electro-Optics, Inc. Methods and devices for monitoring and controlling thin film processing
CN202913055U (zh) * 2012-10-31 2013-05-01 上海膜林科技有限公司 分立式晶控膜厚控制装置
CN102888591A (zh) * 2012-10-31 2013-01-23 上海膜林科技有限公司 分立式晶控膜厚控制装置
CN103540906B (zh) * 2013-09-29 2015-07-29 中国科学院上海光学精密机械研究所 光控-晶控综合膜厚监控方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4375604A (en) * 1981-02-27 1983-03-01 The United States Of America As Represented By The Secretary Of The Army Method of angle correcting doubly rotated crystal resonators
JPH03218411A (ja) * 1990-01-24 1991-09-26 Nippon Dempa Kogyo Co Ltd モニタ用水晶振動子及びこれを用いた膜厚制御装置
US6147437A (en) * 1999-08-11 2000-11-14 Schlumberger Technology Corporation Pressure and temperature transducer
JP2006292733A (ja) * 2005-03-15 2006-10-26 Yoshinori Kanno 水晶マイクロバランスセンサー装置
JP2012127711A (ja) * 2010-12-14 2012-07-05 Ulvac Japan Ltd 真空蒸着装置及び薄膜の製造方法

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KR20160124170A (ko) 2016-10-26
WO2016140321A1 (ja) 2016-09-09
CN106104251A (zh) 2016-11-09
SG11201607500PA (en) 2016-10-28

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