JPWO2015064094A1 - Iii−v族化合物半導体ナノワイヤ、電界効果トランジスタおよびスイッチ素子 - Google Patents
Iii−v族化合物半導体ナノワイヤ、電界効果トランジスタおよびスイッチ素子 Download PDFInfo
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- JPWO2015064094A1 JPWO2015064094A1 JP2015544804A JP2015544804A JPWO2015064094A1 JP WO2015064094 A1 JPWO2015064094 A1 JP WO2015064094A1 JP 2015544804 A JP2015544804 A JP 2015544804A JP 2015544804 A JP2015544804 A JP 2015544804A JP WO2015064094 A1 JPWO2015064094 A1 JP WO2015064094A1
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- compound semiconductor
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- nanowire
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- 229910000673 Indium arsenide Inorganic materials 0.000 claims description 41
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical group [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 claims description 41
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims description 24
- -1 InGaN Inorganic materials 0.000 claims description 5
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 4
- 229910002704 AlGaN Inorganic materials 0.000 claims description 3
- 229910017115 AlSb Inorganic materials 0.000 claims description 3
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- 239000001307 helium Substances 0.000 description 1
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Abstract
Description
[1]III−V族化合物半導体からなるナノワイヤであって、その側面が微小な(111)面で構成される(−110)面である、III−V族化合物半導体ナノワイヤ。
[2]その側面が(111)A面である第1の層と、その側面が(111)B面である第2の層とが、軸方向に沿って交互に積層されている、[1]に記載のIII−V族化合物半導体ナノワイヤ。
[3]その側面における(111)A面の割合は、50%を超え、100%未満である、[1]または[2]に記載のIII−V族化合物半導体ナノワイヤ。
[4]前記第1の層および前記第2の層は、それぞれ1〜5原子層からなり、かつそのうちの90%以上が1〜3原子層からなる、[2]に記載のIII−V族化合物半導体ナノワイヤ。
[5]その側面のラフネスが1〜6原子層の範囲内である、[1]または[2]に記載のIII−V族化合物半導体ナノワイヤ。
[6]前記III−V族化合物半導体は、InAs、InP、GaAs、GaN、InSb、GaSb、AlSb、AlGaAs、InGaAs、InGaN、AlGaN、GaNAs、InAsSb、GaAsSb、InGaSb、AlInSb、InGaAlN、AlInGaP、InGaAsP、GaInAsN、InGaAlSb、InGaAsSbまたはAlInGaPSbである、[1]〜[5]のいずれか一項に記載のIII−V族化合物半導体ナノワイヤ。
[7](111)面を有し、第1導電型にドープされたIV族半導体基板と、前記IV族半導体基板の(111)面上に配置されたIII−V族化合物半導体ナノワイヤであって、前記IV族半導体基板の(111)面に接続された第1の領域と、前記第1導電型または前記第1導電型と異なる第2導電型にドープされた第2の領域とを含むIII−V族化合物半導体ナノワイヤと、前記III−V族化合物半導体ナノワイヤの側面に配置されたゲート誘電体膜と、前記IV族半導体基板に接続されたソース電極およびドレイン電極から選択されるいずれか一方と、前記III−V族化合物半導体ナノワイヤの第2の領域に接続されたソース電極およびドレイン電極から選択されるいずれか他方と、前記ゲート誘電体膜上に配置され、前記IV族半導体基板の(111)面と前記III−V族化合物半導体ナノワイヤとの界面に電界を作用させるゲート電極と、を有し、前記III−V族化合物半導体ナノワイヤは、[1]〜[6]のいずれか一項に記載のIII−V族化合物半導体ナノワイヤである、電界効果トランジスタ。
[8]トンネル電界効果トランジスタである、[7]に記載の電界効果トランジスタ。
[9][7]または[8]に記載の電界効果トランジスタを含むスイッチ素子。
本発明に係る電界効果トランジスタ(FET)は、IV族半導体基板、III−V族化合物半導体ナノワイヤ、ゲート誘電体膜、ソース電極、ドレイン電極およびゲート電極を有する。1つのIV族半導体基板の上に複数のFETが形成されていてもよい。以下、本発明に係るFETの代表例としてトンネル電界効果トランジスタ(TFET)について説明するが、基本的構成はその他のFETでも同じである。
以下、本発明に係るFETの製造方法の代表例としてTFETの製造方法について説明するが、基本的工程はその他のFETでも同じである。本発明に係るTFETの製造方法は、ナノワイヤ成長ステップと、ゲート電極形成ステップと、ソース電極およびドレイン電極形成ステップと、を含む。
以下、図面を参照して、本発明に係る電界効果トランジスタ(FET)の実施の形態を説明する。本実施の形態では、本発明に係る電界効果トランジスタ(FET)の代表例としてトンネル電界効果トランジスタ(TFET)について説明する。
n型シリコン(111)基板(キャリア濃度:1×1018cm−3)を、熱酸化処理して、表面に膜厚20nmの酸化シリコン膜を形成した。電子線ビームリソグラフィーおよびウェットケミカルエッチングにより酸化シリコン膜に周期的に開口部を形成して、シリコン基板の表面を露出させた。開口部の形状は六角形とし、開口部の外径は70nmとした。
シリコン基板の(111)面上に、III−V族化合物半導体ナノワイヤとして、InAsナノワイヤまたはInGaAsナノワイヤを形成した。
シリコン基板上およびIII−V族化合物半導体ナノワイヤの側面にゲート誘電体膜を形成し、さらにその上にゲート電極を形成した。具体的には、ALD法により、膜厚4〜14nmのHf0.8Al0.2O膜(ゲート誘電体膜)を形成した。その後、高周波スパッタリング法により、膜厚100nmのW膜(ゲート電極)を形成した。
上記工程により作製されたFETの電気特性を測定した。
110,210 n型シリコン基板
120,220 絶縁膜
122 開口部
130,230 III−V族化合物半導体ナノワイヤ
132,232 第1の領域
134,234 第2の領域
140,240 ゲート誘電体膜
150,250 絶縁保護膜
160,260 ソース電極
170,270 ドレイン電極
180,280 ゲート電極
200 FET
Claims (9)
- III−V族化合物半導体からなるナノワイヤであって、その側面が微小な(111)面で構成される(−110)面である、III−V族化合物半導体ナノワイヤ。
- その側面が(111)A面である第1の層と、その側面が(111)B面である第2の層とが、軸方向に沿って交互に積層されている、請求項1に記載のIII−V族化合物半導体ナノワイヤ。
- その側面における(111)A面の割合は、50%を超え、100%未満である、請求項1または請求項2に記載のIII−V族化合物半導体ナノワイヤ。
- 前記第1の層および前記第2の層は、それぞれ1〜5原子層からなり、かつそのうちの90%以上が1〜3原子層からなる、請求項2に記載のIII−V族化合物半導体ナノワイヤ。
- その側面のラフネスが1〜6原子層の範囲内である、請求項1または請求項2に記載のIII−V族化合物半導体ナノワイヤ。
- 前記III−V族化合物半導体は、InAs、InP、GaAs、GaN、InSb、GaSb、AlSb、AlGaAs、InGaAs、InGaN、AlGaN、GaNAs、InAsSb、GaAsSb、InGaSb、AlInSb、InGaAlN、AlInGaP、InGaAsP、GaInAsN、InGaAlSb、InGaAsSbまたはAlInGaPSbである、請求項1〜5のいずれか一項に記載のIII−V族化合物半導体ナノワイヤ。
- (111)面を有し、第1導電型にドープされたIV族半導体基板と、
前記IV族半導体基板の(111)面上に配置されたIII−V族化合物半導体ナノワイヤであって、前記IV族半導体基板の(111)面に接続された第1の領域と、前記第1導電型または前記第1導電型と異なる第2導電型にドープされた第2の領域とを含むIII−V族化合物半導体ナノワイヤと、
前記III−V族化合物半導体ナノワイヤの側面に配置されたゲート誘電体膜と、
前記IV族半導体基板に接続されたソース電極およびドレイン電極から選択されるいずれか一方と、
前記III−V族化合物半導体ナノワイヤの第2の領域に接続されたソース電極およびドレイン電極から選択されるいずれか他方と、
前記ゲート誘電体膜上に配置され、前記IV族半導体基板の(111)面と前記III−V族化合物半導体ナノワイヤとの界面に電界を作用させるゲート電極と、
を有し、
前記III−V族化合物半導体ナノワイヤは、請求項1〜6のいずれか一項に記載のIII−V族化合物半導体ナノワイヤである、
電界効果トランジスタ。 - トンネル電界効果トランジスタである、請求項7に記載の電界効果トランジスタ。
- 請求項7または請求項8に記載の電界効果トランジスタを含むスイッチ素子。
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US20160284536A1 (en) | 2016-09-29 |
KR101904626B1 (ko) | 2018-10-04 |
EP3065179A4 (en) | 2017-06-21 |
TW201523886A (zh) | 2015-06-16 |
JP6095083B2 (ja) | 2017-03-15 |
TWI644436B (zh) | 2018-12-11 |
KR20160055939A (ko) | 2016-05-18 |
EP3065179A1 (en) | 2016-09-07 |
WO2015064094A1 (ja) | 2015-05-07 |
CN105684152A (zh) | 2016-06-15 |
US10403498B2 (en) | 2019-09-03 |
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