JPWO2014054547A1 - 樹脂組成物、樹脂硬化物、透明複合体、表示素子用基板および面光源用基板 - Google Patents

樹脂組成物、樹脂硬化物、透明複合体、表示素子用基板および面光源用基板 Download PDF

Info

Publication number
JPWO2014054547A1
JPWO2014054547A1 JP2014539713A JP2014539713A JPWO2014054547A1 JP WO2014054547 A1 JPWO2014054547 A1 JP WO2014054547A1 JP 2014539713 A JP2014539713 A JP 2014539713A JP 2014539713 A JP2014539713 A JP 2014539713A JP WO2014054547 A1 JPWO2014054547 A1 JP WO2014054547A1
Authority
JP
Japan
Prior art keywords
resin composition
epoxy compound
resin
substrate
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2014539713A
Other languages
English (en)
Japanese (ja)
Inventor
大塚 博之
博之 大塚
雄介 井上
雄介 井上
江口 敏正
敏正 江口
内藤 学
学 内藤
大輔 磯部
大輔 磯部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Publication of JPWO2014054547A1 publication Critical patent/JPWO2014054547A1/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/04Reinforcing macromolecular compounds with loose or coherent fibrous material
    • C08J5/0405Reinforcing macromolecular compounds with loose or coherent fibrous material with inorganic fibres
    • C08J5/043Reinforcing macromolecular compounds with loose or coherent fibrous material with inorganic fibres with glass fibres
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0236Special surface textures
    • H01L31/02366Special surface textures of the substrate or of a layer on the substrate, e.g. textured ITO/glass substrate or superstrate, textured polymer layer on glass substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2363/00Characterised by the use of epoxy resins; Derivatives of epoxy resins
    • C08J2363/02Polyglycidyl ethers of bis-phenols

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Reinforced Plastic Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
JP2014539713A 2012-10-01 2013-09-27 樹脂組成物、樹脂硬化物、透明複合体、表示素子用基板および面光源用基板 Pending JPWO2014054547A1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012219174 2012-10-01
JP2012219174 2012-10-01
PCT/JP2013/076393 WO2014054547A1 (ja) 2012-10-01 2013-09-27 樹脂組成物、樹脂硬化物、透明複合体、表示素子用基板および面光源用基板

Publications (1)

Publication Number Publication Date
JPWO2014054547A1 true JPWO2014054547A1 (ja) 2016-08-25

Family

ID=50434875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014539713A Pending JPWO2014054547A1 (ja) 2012-10-01 2013-09-27 樹脂組成物、樹脂硬化物、透明複合体、表示素子用基板および面光源用基板

Country Status (3)

Country Link
JP (1) JPWO2014054547A1 (zh)
TW (1) TW201428019A (zh)
WO (1) WO2014054547A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180244874A1 (en) * 2015-08-27 2018-08-30 Toray Industries, Inc. Epoxy resin compositions and fiber-reinforced composite materials prepared therefrom
JPWO2017078006A1 (ja) * 2015-11-06 2018-08-23 積水化学工業株式会社 有機エレクトロルミネッセンス表示素子用封止剤

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4553572B2 (ja) * 2003-11-12 2010-09-29 ダイセル化学工業株式会社 紫外線硬化型接着剤およびその接着体
JP5387421B2 (ja) * 2010-01-12 2014-01-15 住友ベークライト株式会社 樹脂組成物および透明複合基板
JP5577176B2 (ja) * 2010-07-22 2014-08-20 株式会社ダイセル 繊維強化透明樹脂組成物及びその製造方法並びに透明シート
WO2012081393A1 (ja) * 2010-12-14 2012-06-21 株式会社ダイセル 硬化性組成物、及び硬化樹脂

Also Published As

Publication number Publication date
TW201428019A (zh) 2014-07-16
WO2014054547A1 (ja) 2014-04-10

Similar Documents

Publication Publication Date Title
CN1315950C (zh) 透明复合材料组合物
JP4650003B2 (ja) 透明複合シート及びそれを用いた表示素子基板
WO2005045486A1 (ja) 積層フィルム
JP2007203473A (ja) 複合シート
JP2007203474A (ja) 透明樹脂積層シート
WO2005040256A1 (ja) 光学用樹脂シート及び該光学用樹脂シートを含む液晶セル基板、液晶表示装置、画像表示装置用基板、画像表示装置
WO2014054547A1 (ja) 樹脂組成物、樹脂硬化物、透明複合体、表示素子用基板および面光源用基板
JP7024706B2 (ja) 硬化性組成物及び光学部材
CN110612326A (zh) 具有硬涂层的透明复合膜、其形成方法及包含其的挠性显示装置
JP5426330B2 (ja) 透明基板/ガラス板/透明基板複合フィルムとその用途
JP2006039503A (ja) 光拡散シートおよび液晶ディスプレイ用バックライト
JP4180450B2 (ja) 透明複合シート
JP5685879B2 (ja) 樹脂硬化物、透明複合基板、表示素子基板および樹脂硬化物の製造方法
JP4356395B2 (ja) プラスチック複合透明シート及びそれを使用した表示素子
JP2007091964A (ja) ガラスクロス複合化シリコーン系硬化性樹脂シート
EP3615596A1 (en) Transparent composite film and flexible display devices including the same
JP2007168150A (ja) 透明複合シート
JP4951310B2 (ja) 透明シート
KR102550412B1 (ko) 필름
JP4973344B2 (ja) 透明複合樹脂シート、その製造方法、及び、表示素子用基板
JP5601627B2 (ja) 透明複合シート、およびそれを用いた透明複合基板
JP7374304B2 (ja) フィルム
JP2005239802A (ja) プラスチック複合透明シート及びそれを使用した表示素子
JP4356378B2 (ja) プラスチック複合シート及びそれを使用した表示素子
JP5387421B2 (ja) 樹脂組成物および透明複合基板