JPWO2014054530A1 - 導電パターンの製造方法 - Google Patents
導電パターンの製造方法 Download PDFInfo
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- JPWO2014054530A1 JPWO2014054530A1 JP2013546467A JP2013546467A JPWO2014054530A1 JP WO2014054530 A1 JPWO2014054530 A1 JP WO2014054530A1 JP 2013546467 A JP2013546467 A JP 2013546467A JP 2013546467 A JP2013546467 A JP 2013546467A JP WO2014054530 A1 JPWO2014054530 A1 JP WO2014054530A1
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- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- VSQYNPJPULBZKU-UHFFFAOYSA-N mercury xenon Chemical compound [Xe].[Hg] VSQYNPJPULBZKU-UHFFFAOYSA-N 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 1
- 238000006198 methoxylation reaction Methods 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- ZIYVHBGGAOATLY-UHFFFAOYSA-N methylmalonic acid Chemical compound OC(=O)C(C)C(O)=O ZIYVHBGGAOATLY-UHFFFAOYSA-N 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- DASJFYAPNPUBGG-UHFFFAOYSA-N naphthalene-1-sulfonyl chloride Chemical compound C1=CC=C2C(S(=O)(=O)Cl)=CC=CC2=C1 DASJFYAPNPUBGG-UHFFFAOYSA-N 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- FMJSMJQBSVNSBF-UHFFFAOYSA-N octocrylene Chemical compound C=1C=CC=CC=1C(=C(C#N)C(=O)OCC(CC)CCCC)C1=CC=CC=C1 FMJSMJQBSVNSBF-UHFFFAOYSA-N 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- RYSBYLUYRUYPNW-UHFFFAOYSA-N phenyl-(2-propoxyphenyl)methanone Chemical compound CCCOC1=CC=CC=C1C(=O)C1=CC=CC=C1 RYSBYLUYRUYPNW-UHFFFAOYSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- 125000002467 phosphate group Chemical class [H]OP(=O)(O[H])O[*] 0.000 description 1
- 210000002381 plasma Anatomy 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920005650 polypropylene glycol diacrylate Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- YOSXAXYCARLZTR-UHFFFAOYSA-N prop-2-enoyl isocyanate Chemical compound C=CC(=O)N=C=O YOSXAXYCARLZTR-UHFFFAOYSA-N 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical compound C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- VHXJRLYFEJAIAM-UHFFFAOYSA-N quinoline-2-sulfonyl chloride Chemical compound C1=CC=CC2=NC(S(=O)(=O)Cl)=CC=C21 VHXJRLYFEJAIAM-UHFFFAOYSA-N 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- NQKRZUPZIGCOFV-UHFFFAOYSA-N s-(2-phenyltetrazol-5-yl) benzenecarbothioate Chemical compound C=1C=CC=CC=1C(=O)SC(=N1)N=NN1C1=CC=CC=C1 NQKRZUPZIGCOFV-UHFFFAOYSA-N 0.000 description 1
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical class OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- XLKZJJVNBQCVIX-UHFFFAOYSA-N tetradecane-1,14-diol Chemical compound OCCCCCCCCCCCCCCO XLKZJJVNBQCVIX-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000001017 thiazole dye Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- DQFBYFPFKXHELB-VAWYXSNFSA-N trans-chalcone Chemical compound C=1C=CC=CC=1C(=O)\C=C\C1=CC=CC=C1 DQFBYFPFKXHELB-VAWYXSNFSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- XOALFFJGWSCQEO-UHFFFAOYSA-N tridecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCOC(=O)C=C XOALFFJGWSCQEO-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/047—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using sets of wires, e.g. crossed wires
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G5/00—Control arrangements or circuits for visual indicators common to cathode-ray tube indicators and other visual indicators
- G09G5/003—Details of a display terminal, the details relating to the control arrangement of the display terminal and to the interfaces thereto
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1283—After-treatment of the printed patterns, e.g. sintering or curing methods
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G2300/00—Aspects of the constitution of display devices
- G09G2300/04—Structural and physical details of display devices
- G09G2300/0404—Matrix technologies
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1131—Sintering, i.e. fusing of metal particles to achieve or improve electrical conductivity
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Human Computer Interaction (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Computer Hardware Design (AREA)
- Materials For Photolithography (AREA)
- Conductive Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Manufacturing Of Electric Cables (AREA)
Abstract
Description
(1) 導電性粒子A及び有機化合物Bを含む、基板上の膜又はパターンを、ブロードスペクトラムを有する光で露光して、導電膜又は導電パターンを得る、露光工程を備える、導電パターンの製造方法。
(2) 上記膜を現像して、導電パターンを得る、現像工程と、を備える、上記(1)に記載の導電パターンの製造方法。
(3) 上記導電パターンを、さらにブロードスペクトラムを有する光で露光する、第2の露光工程と、を備える、上記(1)又は(2)に記載の導電パターンの製造方法。
(4) 上記ブロードスペクトラムを有する光は、その最小波長及び最大波長が200〜3000nmの範囲内にある、上記(1)〜(3)のいずれかに記載の導電パターンの製造方法。
(5)上記ブロードスペクトラムを有する光は、キセノンランプの光、キセノンフラッシュランプの光及びハロゲンランプの光からなる群から選ばれる光である、上記(1)〜(4)のいずれかに記載の導電パターンの製造方法。
(6) 上記露光工程は、400nm未満の波長の光を遮光する、上記(1)〜(5)のいずれかに記載の導電パターンの製造方法。
(7) 上記導電性粒子Aの体積平均粒子径は、0.05〜5μmである、上記(1)〜(6)のいずれかに記載の製造方法。
(8) 上記導電性粒子Aの体積平均粒子径は、1〜5μmである、上記(1)〜(7)のいずれかに記載の導電パターンの製造方法。
(9)上記有機化合物Bは、不飽和二重結合、グリシジル基又はカルボキシル基を有する、上記(1)〜(8)のいずれかに記載の導電パターンの製造方法。
(10) 上記膜又はパターンは、400nm以上の波長域に吸収帯を有する、上記(1)〜(9)のいずれかに記載の導電パターンの製造方法。
(11) 上記露光工程は、ブロードスペクトラムを有する光をパルス照射する、上記(1)〜(10)のいずれかに記載の導電パターンの製造方法。
(12) 基板は、ガラス板又はフィルムである、上記(1)〜(11)のいずれかに記載の導電パターンの製造方法。
(13) 上記基板の表面は、透明導電膜加飾膜及び絶縁膜からなる群から選ばれる膜で被覆されている、上記(1)〜(12)のいずれかに記載の導電パターンの製造方法。
(14) 上記導電パターンは、膜厚が1〜30μmである、上記(1)〜(13)のいずれかに記載の導電パターンの製造方法。
(15) 上記導電パターンは、ライン幅が10〜100μmである、上記(1)〜(14)のいずれかに記載の導電パターンの製造方法。
(16) 導電パターンは、有機成分の含有量が5質量%以上40質量%未満である、上記(1)〜(15)のいずれかに記載の導電パターンの製造方法。
(17) 上記(1)〜(16)のいずれかに記載の導電パターンの製造方法により製造された導電パターンを具備する、タッチセンサー。
(18) 上記(17)に記載のタッチセンサーを具備する、タッチパネル。
(19) 上記(18)に記載のタッチセンサーを具備する、ディスプレイパネル。
導電性粒子(A−1) : 湿式還元法により製造されたAg粉末(体積平均粒径1.19μm、比表面積1.12m2/g、タップ密度4.8g/cm3)
導電性粒子(A−2) : 湿式還元法により製造されたAg粉末(体積平均粒径0.4μm、比表面積2.50m2/g、タップ密度3.1g/cm3)
導電性粒子(A−3) : 湿式還元法により製造されたAg粉末(体積平均粒径3.65μm、比表面積0.17m2/g、タップ密度6.2g/cm3)
導電性粒子(A−4) : 湿式還元法により製造されたAg粉末(体積平均粒径6.1μm、比表面積0.17m2/g、タップ密度4.2g/cm3)
有機化合物(B−1) : 60gのバインダーポリマー(TR−2500;根上工業社製)及び100gのジエチレングリコールモノブチルエーテルアセテートを、60℃で加熱溶解させたもの
有機化合物(B−2) : 酸価=85、重量平均分子量=32,000の感光性アクリルポリマー(APX−716;東レ社製)
有機化合物(B−3) : エチレンオキサイド変性ビスフェノールAジアクリレート(FA−324A;日立化成工業株式会社製)/EA/AAの共重合体(共重合比率:50質量部/10質量部/15質量部)に、5質量部のグリシジルメタクリレート(GMA)を付加反応させたもの;より具体的には、まず、窒素雰囲気の反応容器中に150gのジエチレングリコールモノエチルエーテルアセテートを仕込み、オイルバスを用いて80℃まで昇温してから、50gのエチレンオキサイド変性ビスフェノールAジアクリレート(FA−324A)、20gのエチルアクリレート、15gのアクリル酸、0.8gの2,2’−アゾビスイソブチロニトリル及び10gのジエチレングリコールモノエチルエーテルアセテートからなる混合物を1時間かけて滴下し、さらに6時間重合反応を行った。その後、1gのハイドロキノンモノメチルエーテルを添加して重合反応を停止してから、5gのグリシジルメタクリレート、1gトリエチルベンジルアンモニウムクロライド及び10gジエチレングリコールモノエチルエーテルアセテートからなる混合物を0.5時間かけて滴下し、さらに2時間付加反応を行った。最後に、得られた反応溶液をメタノールで精製して未反応不純物を除去し、さらに24時間真空乾燥したものを有機化合物B−3とした。
有機化合物(B−4) : イソオクチルアクリレート
有機化合物(B−5) : ジペンタエリスリトールヘキサアクリレート
有機化合物(B−6) : ジペンタエリスリトールモノヒドロキシペンタアクリレート
光重合開始剤(C−1): 1−ヒドロキシシクロヘキシルフェニルケトン
光重合開始剤(C−2): 2−ジメチルアミノ−1−(4−モルホリノフェニル)−2−ベンジル−1−ブタノン
(導電ペーストXの作製)
100gの有機化合物(B−1)、5gの有機化合物(B−4)及び25gの有機化合物(B−5)に、0.1gの1,6−ヘキサンジオール−ビス[(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、5gの光重合開始剤(C−1)及び2gの分散剤(フローレン G−700DMEA;共栄社化学社製)を加え、2時間撹拌して、感光性樹脂溶液Xを得た。120gの感光性樹脂溶液Xと380gの導電性粒子(A−1)を混合し、3本ローラー(EXAKT M−50;EXAKT社製)で混練して、導電ペーストXを得た。
25gの有機化合物(B−2)及び10gの有機化合物(B−6)に、2.5gの光重合開始剤(C−2)、2gのベンゾインイソプロピルエーテル、0.05gの1,6−ヘキサンジオール−ビス[(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]及び30gの3−メトキシ−3−メチルブタノールを加え、2時間撹拌して、感光性樹脂溶液Yを得た。得られた感光性樹脂溶液Yに80gの導電性粒子(A−1)を混合し、3本ローラーで混練して、導電ペーストYを得た。
17.5gの有機化合物(B−3)に、3.5gの光重合開始剤(C−2)及び17.0gのジエチレングリコールモノブチルエーテルを加え、2時間攪拌して、感光性樹脂溶液Zを得た。得られた感光性樹脂溶液Zに140.5gの導電性粒子(A−1)を混合し、3本ローラーで混練して、導電ペーストZを得た。
上記と同様の方法で得られた感光性樹脂溶液Zに140.5gの導電性粒子(A−2)を混合し、3本ローラーで混練して、導電ペーストPを得た。
上記と同様の方法で得られた感光性樹脂溶液Zに140.5gの導電性粒子(A−3)を混合し、3本ローラーで混練して、導電ペーストQを得た。
上記と同様の方法で得られた感光性樹脂溶液Zに140.5gの導電性粒子(A−4)を混合し、3本ローラーで混練して、導電ペーストRを得た。
ガラス基板上に、導電ペーストXをスクリーン印刷で塗布して塗布膜を得た。
ガラス基板上に、導電ペーストXをスクリーン印刷でストライプ状に塗布して、ストライプ状の塗布パターンを得た。
ガラス基板上に、導電ペーストYをスクリーン印刷で塗布して、塗布膜を得た。
導電ペーストYに代えて導電ペーストZを用いた以外は実施例3と同様の操作をし、ストライプ状の導電パターンを得た。最終的に得られた導電パターンは、膜厚6μm、L/S=20μm/20μmで、残渣や剥がれはなく、良好な微細配線となった。また、ライン幅50μm、ライン長45mmのライン抵抗は、95Ωであった。また基板の歪みや色変化なども発生せず、良好であった。
導電ペーストYに代えて導電ペーストPを用いた以外は実施例3と同様の操作をし、ストライプ状の導電パターンを得た。最終的に得られた導電パターンは、膜厚6μm、L/S=20μm/20μmで、残渣や剥がれはなく、良好な微細配線となった。また、ライン幅50μm、ライン長45mmのライン抵抗は、130Ωであった。また基板の歪みや色変化なども発生せず、良好であった。
導電ペーストYに代えて導電ペーストQを用いた以外は実施例3と同様の操作をし、ストライプ状の導電パターンを得た。最終的に得られた導電パターンは、膜厚6μm、L/S=20μm/20μmで、残渣や剥がれはなく、良好な微細配線となった。また、ライン幅50μm、ライン長45mmのライン抵抗は、80Ωであった。また基板の歪みや色変化なども発生せず、良好であった。
導電ペーストYに代えて導電ペーストRを用いた以外は実施例3と同様の操作をし、ストライプ状の導電パターンを得た。最終的に得られた導電パターンは、膜厚6μm、L/S=25μm/15μmで、狙いのライン幅である20μmよりやや大きかった。また、ライン幅50μm、ライン長45mmでのライン抵抗は、170Ωであった。また基板の歪みや色変化なども発生せず、良好であった。
ガラス基板に代えてPETフィルム基板を用い、さらに光源に光波長400nmカットフィルターを使用した以外は実施例3と同様の操作をし、導電パターンを得た。
最終的に得られた導電パターンは、膜厚6μm、L/S=20μm/20μmで、残渣や剥がれはなく、良好な微細配線となった。また、ライン幅50μm、ライン長45mmのライン抵抗は、70Ωであった。また基板の歪みや色変化なども発生せず、良好であった。
ガラス基板に代えてPETフィルム基板を用いた以外は実施例3と同様の操作をし、露光膜を得た。得られた露光膜を、実施例1の導電膜と同様に現像し、その後、水でリンス処理して非露光部分を除去し、ストライプ状の導電パターンを得た。
実施例3と同様の操作をし、露光膜を得た。得られた露光膜を、実施例1の導電膜と同様に現像し、その後、水でリンス処理して非露光部分を除去し、ストライプ状の導電パターンを得た。
実施例3と同様の操作をし、露光膜を得た。得られた露光膜を、実施例1の導電膜と同様に現像し、その後、水でリンス処理して非露光部分を除去し、ストライプ状の導電パターンを得た。
実施例3と同様の操作をし、露光膜を得た。得られた露光膜を、実施例1の導電膜と同様に現像し、その後、水でリンス処理して非露光部分を除去し、ストライプ状の導電パターンを得た。
ガラス基板に代えてPETフィルム基板を用いた以外は実施例3と同様の操作をし、露光膜を得た。得られた露光膜を、実施例1の導電膜と同様に現像し、その後、水でリンス処理して非露光部分を除去し、ストライプ状の導電パターンを得た。
ガラス基板上に、導電ペーストXをスクリーン印刷でストライプ状に塗布して、ストライプ状の塗布パターンを得た。
ストライプ状の乾燥パターンの熱処理時間を30分に変更した以外は、比較例1と同様の操作をし、ストライプ状の導電パターンを得た。得られた導電パターンは、膜厚6μm、L/S=50μm/50μmで、残渣や剥がれはなく、良好な微細配線となった。また、ライン幅50μm、ライン長45mmのライン抵抗は、200Ωでああり、抵抗値が高く、実用的でなかった。
ガラス基板に代えてPETフィルム基板を用い、さらにストライプ状の乾燥パターンの熱処理時間を1時間に変更した以外は、比較例1と同様の操作をし、ストライプ状の導電パターンを得た。得られた導電パターンは、膜厚6μm、L/S=50μm/50μmで、残渣や剥がれはなかったが、基板の一部に歪みや気泡の発生と見られる斑点が観測され、実用的でなかった。
Claims (19)
- 導電性粒子A及び有機化合物Bを含む、基板上の膜又はパターンを、ブロードスペクトラムを有する光で露光して、導電膜又は導電パターンを得る、露光工程を備える、導電パターンの製造方法。
- 前記膜を現像して、導電パターンを得る、現像工程と、を備える、請求項1記載の導電パターンの製造方法。
- 前記導電パターンを、さらにブロードスペクトラムを有する光で露光する、第2の露光工程と、を備える、請求項1又は2記載の導電パターンの製造方法。
- 前記ブロードスペクトラムを有する光は、その最小波長及び最大波長が200nm〜3000nmの範囲内にある、請求項1〜3のいずれか一項記載の導電パターンの製造方法。
- 前記ブロードスペクトラムを有する光は、キセノンランプの光、キセノンフラッシュランプの光及びハロゲンランプの光からなる群から選ばれる光である、請求項1〜4のいずれか一項記載の導電パターンの製造方法。
- 前記露光工程は、400nm未満の波長の光を遮光する、請求項1〜5のいずれか一項記載の導電パターンの製造方法。
- 前記導電性粒子Aの体積平均粒子径は、0.05〜5μmである、請求項1〜6のいずれか一項記載の導電パターンの製造方法。
- 前記導電性粒子Aの体積平均粒子径は、1〜5μmである、請求項1〜7のいずれか一項記載の導電パターンの製造方法。
- 前記有機化合物Bは、不飽和二重結合、グリシジル基又はカルボキシル基を有する、請求項1〜8のいずれか一項記載の導電パターンの製造方法。
- 前記膜又はパターンは、400nm以上の波長域に吸収帯を有する、請求項1〜9のいずれか一項記載の導電パターンの製造方法。
- 前記露光工程は、ブロードスペクトラムを有する光をパルス照射する、請求項1〜10のいずれか一項記載の導電パターンの製造方法。
- 前記基板は、ガラス板又はフィルムである、請求項1〜11のいずれか一項記載の導電パターンの製造方法。
- 前記基板の表面は、透明導電膜加飾膜及び絶縁膜からなる群から選ばれる膜で被覆されている、請求項1〜12のいずれか一項記載の導電パターンの製造方法。
- 前記導電パターンは、膜厚が1〜30μmである、請求項1〜13のいずれか一項記載の導電パターンの製造方法。
- 前記導電パターンは、ライン幅が10〜100μmである、請求項1〜14のいずれか一項記載の導電パターンの製造方法。
- 前記導電パターンは、有機成分の含有量が5質量%以上40質量%未満である、請求項1〜15のいずれか一項記載の導電パターンの製造方法。
- 請求項1〜16のいずれか一項記載の導電パターンの製造方法により製造された導電パターンを具備する、タッチセンサー。
- 請求項17記載のタッチセンサーを具備する、タッチパネル。
- 請求項18記載のタッチセンサーを具備する、ディスプレイパネル。
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CN101873768B (zh) * | 2010-05-28 | 2012-07-11 | 中山大学 | 一种采用催化型纳米颗粒制备印制电子的方法 |
CN102446576B (zh) * | 2010-10-14 | 2014-04-23 | 远东新世纪股份有限公司 | 具有高光穿透度的透明导电膜和其制备方法 |
CN102608688B (zh) * | 2012-04-06 | 2014-07-23 | 上海理工大学 | 一种纳米金属掺杂的聚合物分散液晶材料电控高效全息光栅及其制备方法 |
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TWI603374B (zh) | 2017-10-21 |
US20150248058A1 (en) | 2015-09-03 |
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