JPWO2014013705A1 - 半導体モジュール - Google Patents
半導体モジュール Download PDFInfo
- Publication number
- JPWO2014013705A1 JPWO2014013705A1 JP2014525710A JP2014525710A JPWO2014013705A1 JP WO2014013705 A1 JPWO2014013705 A1 JP WO2014013705A1 JP 2014525710 A JP2014525710 A JP 2014525710A JP 2014525710 A JP2014525710 A JP 2014525710A JP WO2014013705 A1 JPWO2014013705 A1 JP WO2014013705A1
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- Prior art keywords
- insulating layer
- relay electrode
- semiconductor module
- metal block
- heat
- Prior art date
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Abstract
Description
プリンド基板を加熱してしまうと、プリント基板を収納している例えばインバータなど電力変換機器のケース内の温度が上昇してしまい、使用している部材の耐熱温度を超えてしまう。このような温度上昇に対しては、空冷もしくは水冷方式で冷却する対策も可能であるが、電力変換機器の寸法増大やコスト増大に繋がってしまう。このため、電力変換機器の寸法増大やコスト増大なしに上述のような電力変換機器のケース内の温度上昇を効果的に抑制可能な対策が必要となっており、そのような対策の一つとして、半導体モジュールから外部リード端子を介して外部のプリント基板側に流れ出す熱を効果的に抑制することが求められている。
この構成によれば、回路素子からのボンディングワイヤまたはリードフレームを中継電極に接合するとともに、中継電極と外部リード端子とを接続していることにより、回路素子と外部リード端子とは上記中継電極を介して接続されている。
このため、パワー半導体素子などの回路素子が動作時に発生し、回路素子からのボンディングワイヤまたはリードフレームに沿って伝達される熱は、主に中継電極およびセラミックス材料からなる中継電極用絶縁層を介して熱容量が高く放熱性に優れた金属ブロックの方に伝わるので、外部リード端子の方に伝わる熱量は十分に抑制することができる。
このため、本発明による半導体モジュールでは、その外部リード端子から当該外部リード端子に接続された外部の例えばプリント基板などに流れ出す熱量を効果的に抑制することができるので、外部のプリント基板などに対する加熱を効果的に抑制することができる。
また、前記放熱用絶縁層および前記中継電極用絶縁層は、熱伝導率が1〜200W/m・Kであり、かつ厚さが10〜500μmである構成とすることができる(請求項3の発明)。
また、前記中継電極と外部リード端子とをボンディングワイヤまたはリードフレームを介して接続した構成とすることができる(請求項8の発明)。
したがって、本発明によれば、外部リード端子から当該外部リード端子に接続された外部の例えばプリント基板などに流れ出す熱量を効果的に抑制することができ、これにより、外部のプリント基板などに対する加熱を効果的に抑制することができる。
このため、本発明による半導体モジュールは、電力変換機器の寸法増大やコスト増大なしに電力変換機器のケース内の温度上昇を効果的に抑制する上で好適なものとなっている。
図1(a)の構成例では、図における下面すなわち第1面1aおよび図における上面すなわち第2面1bを有する金属ブロック1と、金属ブロック1の第1面1aおよびこれに連接する側面1cの一部を覆うように形成された放熱用絶縁層2と、金属ブロック1の第2面1bの一部分に形成された中継電極用絶縁層4と、中継電極用絶縁層4の上面に形成された中継電極3と、金属ブロック1の第2面1bにはんだ23により接合されたパワー半導体素子7と、外部接続用リードフレーム9とを備え、パワー半導体素子7からのボンディングワイヤ11aを中継電極3に接合するとともに、中継電極3と外部接続用リードフレーム9とをボンディングワイヤ11bで接続して、半導体モジュール51が構成されている。ここで、外部接続用リードフレーム9は半導体モジュール51の外部リード端子として機能するものである。また、図1では、説明の便宜上、パワー半導体素子7と中継電極3とを接続するボンディングワイヤを11aとし、中継電極3と外部接続用リードフレーム9とを接続するボンディングワイヤを11bとしている。
図2は、本発明の実施形態にかかる半導体モジュールにおける熱の流れを模式的に示す図であって、特に半導体モジュール51を電力変換機器101に組み込んだ場合について説明するものである。
また、図2において、半導体モジュール51におけるパワー半導体素子7として例えばIGBT(Insulated Gate
Bipolar Transistor)を実装した構成では、IGBTの下面のコレクタ電極が金属ブロック1の第2面1bに接合され、IGBTの上面に形成されているエミッタ電極とゲート電極とがそれぞれボンディングワイヤ11aにより中継電極3に接続される。
図2において、半導体モジュール51内のパワー半導体素子7が動作時に発生する熱は、パワー半導体素子7からはんだ層23、金属ブロック1および放熱用絶縁層2を介して冷却用ヒートシンク102に伝達されるとともに、パワー半導体素子7からボンディングワイヤ11aを介して外部接続用リードフレーム9側にも伝達される。しかしながら、本発明による半導体モジュール51では、金属ブロック1上に中継電極用絶縁層4を介して形成された中継電極3を備え、パワー半導体素子7からのボンディングワイヤ11aを中継電極3に接合した上で、中継電極3から別のボンディングワイヤ11bを介して外部接続用リードフレーム9に接続するようにしている。このため、半導体モジュール51では、パワー半導体素子7からボンディングワイヤ11aを経由して流れてくる熱は大部分が中継電極3、熱伝導性に優れたセラミックス材料からなる中継電極用絶縁層4および金属ブロック1を介して冷却用ヒートシンク102に伝達され、中継電極3からボンディングワイヤ11bを介して外部接続用リードフレーム9側に伝達される熱量は十分に小さく抑制されたものとなる。これにより、半導体モジュール51の外部接続用リードフレーム9と接続されるプリント配線板部111側に伝わる熱量を抑制することができ、プリント配線板部111を形成するプリント配線板114に対する加熱を効果的に抑制することができる。
なお、上述のような半導体モジュール51は、図2に示されるように、パワー半導体素子7が動作時に発生する熱を、パワー半導体素子7→はんだ層23→金属ブロック1といいう第1の伝熱経路と、パワー半導体素子7→ボンディングワイヤ11a→中継電極3→中継電極用絶縁層4→金属ブロック1という第2伝熱経路との2つの伝熱経路で効率良く金属ブロック1に伝達できるので、熱容量が高く放熱性に優れた金属ブロック1の機能をより有効に生かしたものとなっている。
図11において、半導体モジュール151内のパワー半導体素子7が動作時に発生する熱は、パワー半導体素子7からはんだ層23、金属ブロック1および放熱用絶縁層2を介して冷却用ヒートシンク202に伝達されるとともに、パワー半導体素子7からボンディングワイヤ11を介して外部接続用リードフレーム9側にも伝達される。
従来技術による半導体モジュール151では、パワー半導体素子7からのボンディングワイヤ11を直接外部接続用リードフレーム9に接続するようにしているので、パワー半導体素子7からボンディングワイヤ11を経由して流れてくる熱はそのまま外部接続用リードフレーム9を流れていく。これにより、半導体モジュール151では、半導体モジュール151の外部接続用リードフレーム9と接続されるプリント配線板部111A側に伝わる熱量を抑制することができないため、プリント配線板部111Aを形成するプリント配線板114Aに対する加熱を抑制することができない。
図1(b)に示す半導体モジュール51Aは、上述の図1(a)に示した半導体モジュール51に対して、中継電極3と外部接続リードフレーム9とをボンディングワイヤ11bで接続する代わりに、外部接続リードフレーム9Aを中継電極3に直接接合するようにした点が異なるものであり、それ以外の点は同様である。
次に、マスク21をあてて、溶射法もしくはエアロゾルデポジション法により例えば酸化アルミニウム粉などのセラミックス粉末22を積層することにより、金属ブロック1の第1面1a側に放熱用絶縁層2を形成する。
次に、中継電極用絶縁層4の上に銅製の中継電極3を積層する。銅を堆積させる方法は、絶縁層と同様にプラズマ溶射法を用いる。すなわち、金属ブロック1の第2面1bに形成されている中継電極用絶縁層4にマスク21Bをあてて、銅粒子24を溶射し、中継電極3を形成する(図4(b)〜(c))。
これにより、金属ブロック1の第1面1a側に放熱用絶縁層2が形成されるとともに、第2面1bの一部には中継電極3が中継電極用絶縁層4を介して形成された絶縁金属ブロック5が完成する(図4(d))。
次に、絶縁金属ブロック5における金属ブロック1の第2面1bにパワー半導体素子7をはんだ23での接合により接合する(図5(a))。はんだ付けは、ペレット状のはんだを利用し、水素還元が可能な炉において行なう。水素還元が可能な炉を使うのは、金属ブロック1の表面の酸化膜を水素還元により除去し、活性化させることにより、はんだとの濡れ性を向上させるためである。はんだ材料には例えば、SnPbAgからなる高温はんだ、SnAgCu系からなる鉛フリーはんだを用いる。はんだ付けの温度は、はんだの融点に応じて設定される。
パワー半導体素子7と金属ブロック1との間のはんだ層23にボイドが残留すると、熱抵抗が高くなり、パワー半導体素子7から生じる熱を効率よく放熱することができない。そこで、ボイドを発生しないように、はんだが溶融している状態で、1.3kPa(10Torr)以下の真空引きを行なう。
次に、ボンディングワイヤ11aによりパワー半導体素子7と中継電極3との接続を行なう(図5(b))。ボンディングワイヤ11aは、線径が125〜500μmのAlワイヤを使用して超音波接合する。なお、パワー半導体素子7と中継電極3との接続には、ボンディングワイヤ11aの代わりに、図1(c)に示したようにリードフレーム13を使用しても良い。
さらに、ボンディングワイヤ11bにより中継電極3と外部リード端子9との接続を行なう(図5(c))。ボンディングワイヤ11bは、上述のボンディングワイヤ11aと同様に線径が125〜500μmのAlワイヤを使用して超音波接合する。なお、中継電極3と外部接続用リードフレーム9との接続には、ボンディングワイヤ11bの代わりに、図1(c)に示したリードフレーム13と同様なリードフレームを使用しても良く、さらには、図1(b)〜(c)に示したように中継電極3に外部接続用リードフレーム9を直接接合しても良い。
次に、図5(c)に示した組立体を、トランスファー成形機に取り付けられた金型にセットする。金型は170〜180℃程度に保温されており、予熱後にタブレット状のエポキシ樹脂14をプランジャーにて金型内に流し込む。エポキシ樹脂14は、酸化珪素、酸化アルミニウム、窒化珪素、窒化アルミニウム、窒化ホウ素からなるフィラー群の1種類以上を含むエポキシ樹脂からなり、熱伝導率は0.5〜5W/m・Kの樹脂を用いる。
図6は本発明の実施形態にかかる半導体モジュールの異なる構成例を示す断面図である。本発明による半導体モジュールは、金属ブロック1と図示しない外部の冷却用ヒートシンクとの間に生じ得る電位差など絶縁設計条件との関係で問題のない場合には、図6(a)〜図6(c)に示す半導体モジュール51C、51D、51Eのように、放熱用絶縁層2が第1面にのみ形成された構成であってもよい。半導体モジュール51C、51D、51Eの各構成は、上記以外の点では、図1(a)〜図1(c)に示した半導体モジュール51、51A、51Bの各構成にそれぞれ対応している。
以上説明した本発明による半導体モジュールでは、特に、金属ブロックの第2面に接合されたパワー半導体素子など回路素子からのボンディングワイヤまたはリードフレームを中継電極に接合した上で、この中継電極と外部リード端子とを接続していることにより、回路素子が動作時に発生し、回路素子からのボンディングワイヤまたはリードフレームに沿って伝達される熱は、主に中継電極および熱伝導性に優れたセラミックス材料からなる中継電極用絶縁層を介して熱容量が高く放熱性に優れた金属ブロックの方に伝わるので、外部リード端子の方に伝わる熱量は十分に抑制することができる。
これにより、本発明による半導体モジュールでは、その外部リード端子から当該外部リード端子に接続された外部の例えばプリント基板などに流れ出す熱量を効果的に抑制することができるため、外部のプリント基板などに対する加熱を効果的に抑制することができるので、このような半導体モジュールを用いることによって、電力変換機器の寸法増大やコスト増大なしに電力変換機器のケース内の温度上昇を効果的に抑制することができる。
1a:第1面
1b:第2面
1c:側面
2:放熱用絶縁層
2a:第1面部絶縁層
2b:側面部絶縁層
3:中継電極
4:中継電極用絶縁層
5:絶縁金属ブロック
7:パワー半導体素子
9,9A,9B,9C,9D,9E,9F:外部接続用リードフレーム
11,11a,11b:ボンディングワイヤ
12:IC用ボンディングワイヤ
13:リードフレーム
14:成形樹脂(エポキシ樹脂)
21,21A,21B:マスク
22,22A:セラミックス粒子
23:はんだ
24:銅粒子
31:駆動IC
32:ヒートシンク
33:絶縁基板
34:金属板
35:銅箔
36:絶縁層
37:絶縁金属ブロック
51,51A,51B,51C,51D,51E:半導体モジュール
101:電力変換機器
102:冷却用ヒートシンク
111,111A:プリント配線板部
112,112A:プリント基板本体
113,113A:回路パターン
114,114A:プリント配線板
115a,115b,115c:電子回路部品
116:はんだ
117:はんだ
118:挿入孔
151:半導体モジュール
201:電力変換機器
202:冷却用ヒートシンク
h1,h2,h3,h4,h5,h11,h12,h13:熱の流れ
この構成によれば、回路素子からのボンディングワイヤまたはリードフレームを中継電極に接合するとともに、中継電極と外部リード端子とを接続していることにより、回路素子と外部リード端子とは上記中継電極を介して接続されている。
このため、パワー半導体素子などの回路素子が動作時に発生し、回路素子からのボンディングワイヤまたはリードフレームに沿って伝達される熱は、主に中継電極およびセラミックス材料からなる中継電極用絶縁層を介して熱容量が高く放熱性に優れた金属ブロックの方に伝わるので、外部リード端子の方に伝わる熱量は十分に抑制することができる。
このため、本発明による半導体モジュールでは、その外部リード端子から当該外部リード端子に接続された外部の例えばプリント基板などに流れ出す熱量を効果的に抑制することができるので、外部のプリント基板などに対する加熱を効果的に抑制することができる。
また、前記放熱用絶縁層および前記中継電極用絶縁層は、熱伝導率が1〜200W/m・Kであり、かつ厚さが10〜500μmである構成とすることができる(請求項4の発明)。
Claims (9)
- 第1面および第2面を有する金属ブロックと、
前記金属ブロックの少なくとも第1面に直接セラミックス材料を積層して形成された放熱用絶縁層と、
前記金属ブロックの第2面の一部分に直接セラミックス材料を積層して形成された中継電極用絶縁層と、
前記中継電極用絶縁層の上面に金属材料を積層して形成された中継電極と、
前記金属ブロックの第2面に接合された回路素子と、
外部リード端子とを備え、
前記回路素子からのボンディングワイヤまたはリードフレームを前記中継電極に接合するとともに、
前記中継電極と前記外部リード端子とを接続した
ことを特徴とする半導体モジュール。 - 請求項1に記載の半導体モジュールにおいて、
前記放熱用絶縁層は、前記金属ブロックの第1面に連接する側面の少なくとも一部を覆うことを特徴とする半導体モジュール。 - 請求項1に記載の半導体モジュールにおいて、
前記放熱用絶縁層および前記中継電極用絶縁層は、熱伝導率が1〜200W/m・Kであり、かつ厚さが10〜500μmであることを特徴とする半導体モジュール。 - 請求項1に記載の半導体モジュールにおいて、
前記放熱用絶縁層および前記中継電極用絶縁層は、酸化珪素、酸化アルミニウム、窒化珪素、窒化アルミニウム、窒化ホウ素からなるフィラー群の少なくとも1種類からなることを特徴とする半導体モジュール。 - 請求項4に記載の半導体モジュールにおいて、
前記放熱用絶縁層および前記中継電極用絶縁層は、前記フィラー群の少なくとも1種によるセラミックス微粒子をプラズマ溶射法にて堆積させることにより形成したことを特徴とする半導体モジュール。 - 請求項4に記載の半導体モジュールにおいて、
前記放熱用絶縁層および前記中継電極用絶縁層は、前記フィラー群の少なくとも1種によるセラミックス微粒子をエアロゾルデポジション法にて堆積させることにより形成したことを特徴とする半導体モジュール。 - 請求項1から6のいずれか1項に記載の半導体モジュールにおいて、
前記中継電極は、金属材料として銅粒子を溶射して形成したことを特徴とする半導体モジュール。 - 請求項1から6のいずれか1項に記載の半導体モジュールにおいて、
前記中継電極と外部リード端子とをボンディングワイヤまたはリードフレームを介して接続したことを特徴とする半導体モジュール。 - 請求項1から6のいずれか1項に記載の半導体モジュールにおいて、
前記回路素子は、パワー半導体素子であることを特徴とする半導体モジュール。
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