JPWO2012090510A1 - 磁気ディスク用ガラス基板の製造方法、磁気ディスクの製造方法 - Google Patents

磁気ディスク用ガラス基板の製造方法、磁気ディスクの製造方法 Download PDF

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Publication number
JPWO2012090510A1
JPWO2012090510A1 JP2012550741A JP2012550741A JPWO2012090510A1 JP WO2012090510 A1 JPWO2012090510 A1 JP WO2012090510A1 JP 2012550741 A JP2012550741 A JP 2012550741A JP 2012550741 A JP2012550741 A JP 2012550741A JP WO2012090510 A1 JPWO2012090510 A1 JP WO2012090510A1
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JP
Japan
Prior art keywords
polishing
glass substrate
magnetic disk
additive
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2012550741A
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English (en)
Japanese (ja)
Inventor
京介 飯泉
京介 飯泉
俵　義浩
義浩 俵
剛太郎 吉丸
剛太郎 吉丸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of JPWO2012090510A1 publication Critical patent/JPWO2012090510A1/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Surface Treatment Of Glass (AREA)
JP2012550741A 2010-12-29 2011-12-29 磁気ディスク用ガラス基板の製造方法、磁気ディスクの製造方法 Pending JPWO2012090510A1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201061428027P 2010-12-29 2010-12-29
US61/428,027 2010-12-29
PCT/JP2011/007370 WO2012090510A1 (ja) 2010-12-29 2011-12-29 磁気ディスク用ガラス基板の製造方法、磁気ディスクの製造方法

Publications (1)

Publication Number Publication Date
JPWO2012090510A1 true JPWO2012090510A1 (ja) 2014-06-05

Family

ID=46382638

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012550741A Pending JPWO2012090510A1 (ja) 2010-12-29 2011-12-29 磁気ディスク用ガラス基板の製造方法、磁気ディスクの製造方法

Country Status (4)

Country Link
US (1) US20130260027A1 (zh)
JP (1) JPWO2012090510A1 (zh)
CN (1) CN103282160A (zh)
WO (1) WO2012090510A1 (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5671735B2 (ja) * 2011-01-18 2015-02-18 不二越機械工業株式会社 両面研磨装置
US11098224B2 (en) * 2016-11-23 2021-08-24 Hoya Corporation Method for polishing glass substrate, method for manufacturing glass substrate, method for manufacturing magnetic-disk glass substrate, method for manufacturing magnetic disk, polishing liquid, and method for reducing cerium oxide
CN106590440A (zh) * 2016-12-07 2017-04-26 大连圣洁热处理科技发展有限公司 一种抛光剂及其制备方法
JP6635088B2 (ja) * 2017-04-24 2020-01-22 信越半導体株式会社 シリコンウエーハの研磨方法
CN108148507B (zh) * 2017-12-18 2020-12-04 清华大学 一种用于熔石英的抛光组合物
JP7307053B2 (ja) * 2018-04-11 2023-07-11 日揮触媒化成株式会社 研磨組成物
US11192822B2 (en) * 2018-11-08 2021-12-07 Western Digital Technologies, Inc. Enhanced nickel plating process
CN112658976B (zh) * 2019-12-17 2022-07-22 深圳硅基仿生科技有限公司 用于对陶瓷的表面进行研磨的方法
JP7318146B1 (ja) * 2023-02-01 2023-07-31 古河電気工業株式会社 磁気ディスク用基板
CN116276607B (zh) * 2023-05-04 2024-05-10 浙江湖磨抛光磨具制造有限公司 一种曲轴抛光设备

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56147880A (en) * 1980-04-19 1981-11-17 Akira Suzuki Additive for abrasive material
JP2000273444A (ja) * 1999-03-26 2000-10-03 Ohara Inc 情報記憶媒体用ガラスセラミックス基板の研磨加工方法
WO2002031079A1 (fr) * 2000-10-06 2002-04-18 Mitsui Mining & Smelting Co.,Ltd. Matière abrasive
JP2009006423A (ja) * 2007-06-27 2009-01-15 Hoya Corp 磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法並びに研磨装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6132843A (en) * 1996-11-14 2000-10-17 Nippon Sheet Glass Do., Ltd. Glass substrate for magnetic disks
JPH10204416A (ja) * 1997-01-21 1998-08-04 Fujimi Inkooporeetetsudo:Kk 研磨用組成物
US6248143B1 (en) * 1998-01-27 2001-06-19 Showa Denko Kabushiki Kaisha Composition for polishing glass and polishing method
JP4003116B2 (ja) * 2001-11-28 2007-11-07 株式会社フジミインコーポレーテッド 磁気ディスク用基板の研磨用組成物及びそれを用いた研磨方法
US6811467B1 (en) * 2002-09-09 2004-11-02 Seagate Technology Llc Methods and apparatus for polishing glass substrates
JP2004331852A (ja) * 2003-05-09 2004-11-25 Tama Kagaku Kogyo Kk 分散安定性に優れた研磨剤スラリー及び基板の製造方法
JP4339034B2 (ja) * 2003-07-01 2009-10-07 花王株式会社 研磨液組成物
JP4785406B2 (ja) * 2004-08-30 2011-10-05 昭和電工株式会社 研磨スラリー、情報記録媒体用ガラス基板の製造方法、及び情報記録媒体の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56147880A (en) * 1980-04-19 1981-11-17 Akira Suzuki Additive for abrasive material
JP2000273444A (ja) * 1999-03-26 2000-10-03 Ohara Inc 情報記憶媒体用ガラスセラミックス基板の研磨加工方法
WO2002031079A1 (fr) * 2000-10-06 2002-04-18 Mitsui Mining & Smelting Co.,Ltd. Matière abrasive
JP2009006423A (ja) * 2007-06-27 2009-01-15 Hoya Corp 磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法並びに研磨装置

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Publication number Publication date
CN103282160A (zh) 2013-09-04
US20130260027A1 (en) 2013-10-03
WO2012090510A1 (ja) 2012-07-05

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